Development of micro filtered-arc-deposition system for preparation of metal nitride film with heat resistance
| Project/Area Number |
23760258
|
|---|
| Research Category |
Grant-in-Aid for Young Scientists (B)
|
| Allocation Type | Multi-year Fund |
|---|
| Research Field |
Power engineering/Power conversion/Electric machinery
|
|---|
| Research Institution | Toyohashi University of Technology |
|---|
Principal Investigator |
TANOUE HIDETO 豊橋技術科学大学, 工学(系)研究科(研究院), 助教 (50580578)
|
|---|
| Project Period (FY) |
2011 – 2013
|
| Project Status |
Completed (Fiscal Year 2013)
|
| Budget Amount *help |
¥4,290,000 (Direct Cost: ¥3,300,000、Indirect Cost: ¥990,000)
Fiscal Year 2013: ¥780,000 (Direct Cost: ¥600,000、Indirect Cost: ¥180,000)
Fiscal Year 2012: ¥2,470,000 (Direct Cost: ¥1,900,000、Indirect Cost: ¥570,000)
Fiscal Year 2011: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000)
|
|---|
| Keywords | 電気機器 / 真空アーク蒸着 / フィルタードアーク蒸着 / 金属窒化物膜 / 電気機器工学 / 電力工学 / 真空アーク放電 / 元素分析 / 薄膜形成 |
|---|
| Research Abstract |
In this study, micro filtered-arc-deposition (FAD) system was developed for the preparation of multi-element metal nitride film. However, problems which electric discharge duration was short, and heating using the metal cathode were occurred. These problems were solved The problem was solved by design and developing of new arc source.
In the film preparation, chromium and nitride (CrN) aluminium-chromium nitride (AlCrN) films were prepared using new arc-source. In the results, the properties of CrN film prepared FAD with new arc-source was same using conventional FAD. Though, AlCrN film was not included nitrogen into the film. So, the film prepared using FAD with new arc-source was not nitrided.
|
Report
(4 results)
Research Products
(47 results)
-
-
-
-
-
-
-
-
-
-
-
-
[Presentation] Siウエハ上への水素フリーDLC膜の均一形成と微細パターン加工2013
Author(s)
細尾倫成,田上英人,須田善行,滝川浩史,川島貴弘,柴田隆行,神谷雅男,瀧真,長谷川祐史,サーレアブスアイリキ,辻信広
Organizer
第60回応用物理学会春季学術講演会
Year and Date
2013-03-27
Related Report
-
-
[Presentation] Development of Uniform Coating Technique of Tetrahedral Amorphous-Carbon Film by T-shape Filtered-Arc-Deposition with Deflected Plasma beam and Multi-Motion Substrate Holder for Semispherical Object2013
Author(s)
H.Tanoue, H.Okuda, M.Hosoo, Y.Suda, H.Takikawa, M.Kamiya, M.Taki, Y.Hasegawa, N.Tsuji, A.Saleh
Organizer
ICMCTF2013
Place of Presentation
Town and Country Hotel, San diego, CA
Related Report
-
-
-
-
-
-
-
-
-
-
[Presentation] 水素含有および水素フリーDLC膜の加熱に伴う構造変化2012
Author(s)
田上英人,柏木大幸,奥田浩史,須田善行,滝川浩史,川島貴弘,柴田隆行,清原修二,田口佳男,杉山嘉也,小俣有紀子,神谷雅男,瀧真,長谷川祐史,辻信広,石川剛史
Organizer
第59回応用物理学関係連合講演会
Year and Date
2012-03-17
Related Report
-
[Presentation] 水素フリー高密度DLC膜のパターニング,単離およびハンドリング2012
Author(s)
角口公章,奥田浩史,柏木大幸,田上英人,須田善行,滝川浩史,神谷雅男,瀧真,長谷川祐史,石川剛史,辻信広
Organizer
第59回応用物理学関係連合講演会
Year and Date
2012-03-17
Related Report
-
[Presentation] Patterning of Tetrahedral Amorphous-Carbon Film by Electron Beam Lithography and Pick Up fromSi-Wafer in Focused Ion Beam System2012
Author(s)
H. Tanoue, T. Kashiwagi, H. Okuda, Y. Suda, H.Takikawa, M. Kamiya, S. Kiyohara, T. Kawashima, T. Shibata, Y. Taguchi, Y. Sugiyama, Y. Omata, M. Taki, Y. Hasegawa, N. Tsuji, T. Ishikawa
Organizer
ISPlasma2012
Year and Date
2012-03-05
Related Report
-
-
-
-
-
-
[Presentation] Patterning of Tetrahedral Amorphous-Carbon Film by Electron Beam Lithography and Pick Up from Si-Wafer in Focused Ion Beam System2012
Author(s)
H. Tanoue, T. Kashiwagi, H. Okuda, Y. Suda, H. Takikawa, M. Kamiya, S. Kiyohara, T. Kawashima, T. Shibata, Y. Taguchi, Y. Sugiyama, Y. Omata, M. Taki, Y. Hasegawa, N. Tsuji, T. Ishikawa
Organizer
ISPlasma 2012
Place of Presentation
Chubu University
Related Report
-
-
[Presentation] Pattering of Tetrahedral Amorphous Carbon Film by Electron Beam Lithography2011
Author(s)
T. Kashiwagi, H. Okuda, H. Tanoue, Y. Suda, H.Takikawa, M. Kamiya, S. Kiyohara, T. Kawashima, T. Shibata, Y. Taguchi, Y. Sugiyama, Y. Omata, M. Taki, Y. Hasegawa, N. Tsuji and T. Ishikawa
Organizer
The Asia-Pacific Interdisciplinary Research Conference 2011
Year and Date
2011-11-18
Related Report
-
-
[Presentation] 水素含有ダイヤモンドライクカーボン膜の昇温脱離質量分析と熱処理による特性変化2011
Author(s)
角口公章,柏木大幸,奥田浩史,田上英人,須田善行,滝川浩史,神谷雅男,瀧真,長谷川裕史,辻信広,石川剛史
Organizer
平成23年度電気関係学会東海支部連合大会
Year and Date
2011-09-26
Related Report
-
[Presentation] フィルタードアーク蒸着で形成したDLC膜の酸素イオンエッチング2011
Author(s)
柏木大幸,奥田浩史,角口公章,田上英人,須田善行,滝川浩史,神谷雅男,瀧真,長谷川裕史,辻信広,石川剛史,清原修二,田口佳男,杉山嘉也,小俣有紀子
Organizer
平成23年度電気関係学会東海支部連合大会
Year and Date
2011-09-26
Related Report
-
[Presentation] 水素フリーダイヤモンドライクカーボン膜の半導体性評価2011
Author(s)
田上英人,柏木大幸,奥田浩史,角口公章,須田善行,滝川浩史,神谷雅男,瀧真,長谷川裕史,辻信広,石川剛史
Organizer
平成23年度電気関係学会東海支部連合大会
Year and Date
2011-09-26
Related Report
-
[Presentation] Pattering of Tetrahedral Amorphous Carbon Film by Electron Beam Lithography2011
Author(s)
T. Kashiwagi, H. Okuda, H. Tanoue, Y. Suda, H. Takikawa, M. Kamiya, S. Kiyohara, T. Kawashima, T. Shibata, Y. Taguchi, Y. Sugiyama, Y. Omata, M. Taki, Y. Hasegawa, N. Tsuji and T. Ishikawa
Organizer
The Asia-Pacific Interdisciplinary Research Conference 2011
Place of Presentation
豊橋技術科学大学，愛知県
Related Report
-
-
-
-
-
-
-
-
