| Project/Area Number |
23760258
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| Research Category |
Grant-in-Aid for Young Scientists (B)
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| Allocation Type | Multi-year Fund |
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| Research Field |
Power engineering/Power conversion/Electric machinery
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| Research Institution | Toyohashi University of Technology |
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Principal Investigator |
TANOUE HIDETO 豊橋技術科学大学, 工学(系)研究科(研究院), 助教 (50580578)
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| Project Period (FY) |
2011 – 2013
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| Project Status |
Completed (Fiscal Year 2013)
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| Budget Amount *help |
¥4,290,000 (Direct Cost: ¥3,300,000、Indirect Cost: ¥990,000)
Fiscal Year 2013: ¥780,000 (Direct Cost: ¥600,000、Indirect Cost: ¥180,000)
Fiscal Year 2012: ¥2,470,000 (Direct Cost: ¥1,900,000、Indirect Cost: ¥570,000)
Fiscal Year 2011: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000)
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| Keywords | 電気機器 / 真空アーク蒸着 / フィルタードアーク蒸着 / 金属窒化物膜 / 電気機器工学 / 電力工学 / 真空アーク放電 / 元素分析 / 薄膜形成 |
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| Research Abstract |
In this study, micro filtered-arc-deposition (FAD) system was developed for the preparation of multi-element metal nitride film. However, problems which electric discharge duration was short, and heating using the metal cathode were occurred. These problems were solved The problem was solved by design and developing of new arc source.
In the film preparation, chromium and nitride (CrN) aluminium-chromium nitride (AlCrN) films were prepared using new arc-source. In the results, the properties of CrN film prepared FAD with new arc-source was same using conventional FAD. Though, AlCrN film was not included nitrogen into the film. So, the film prepared using FAD with new arc-source was not nitrided.
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