Investigation of new-domain-structure-induced functionalities in BiFeO_3 thin films.

• Project/Area Number: 23760290
• Research Category: Grant-in-Aid for Young Scientists (B)
• Allocation Type: Multi-year Fund
• Research Field: Electronic materials/Electric materials
• Research Institution: University of Hyogo
• Principal Investigator: NAKASHIMA Seiji 兵庫県立大学, 大学院・工学研究科, 助教 (80552702)
• Project Period (FY): 2011 – 2012
• Project Status: Completed (Fiscal Year 2012)
• Budget Amount: ¥4,160,000 (Direct Cost: ¥3,200,000、Indirect Cost: ¥960,000); Fiscal Year 2012: ¥1,170,000 (Direct Cost: ¥900,000、Indirect Cost: ¥270,000); Fiscal Year 2011: ¥2,990,000 (Direct Cost: ¥2,300,000、Indirect Cost: ¥690,000)
• Keywords: マルチフェロイック / 強誘電性 / ドメイン構造 / ビスマスフェライト / 薄膜 / BiFeO3 / スパッタリング / イオンビームスパッタ / 高周波スパッタ

Research Abstract

In this study, we focused on BiFeO_3with giant c/a ratio which is attracted much attention because of its giant remanent polarization of ~150 μC/cm2predicted by first-principles calculation. Rhombohedral BFO, giant c/aBFO and their mixed phase thin films have been prepared. The giant c/a BFO can be obtained on SrRuO_3/SrTiO_3substrate, and 80odomain can be observed by TEM. The high quality giant c/aBFO films can be obtained on LaAlO_3(001) substrate, and photovoltaic effect have been confirmed.

Research Products

• [Journal Article] Structural and Ferroelectric Properties of Domain-Structure- Controlled BiFeO_3 Thin Films Prepared by Dual-Ion-Beam Sputtering (2012)
  • Author(s): S. Nakashima, H. Fujisawa, Y. Tsujita, S. Seto, M. Kobune, and M. Shimizu
  • Journal Title: Jpn. J. Appl. Phys. Volume: 51
  • Peer Reviewed
• [Journal Article] Preparation and Characterization of High Quality Lead-free BiFeO_3 Thin Films by Sputtering Process (2012)
  • Author(s): S. Nakashima, Y. Takada, T. Ito, S. Seto, H. Fujisawa, M. Kobune, and M. Shimizu
  • Journal Title: IEEE Proc. of ICETET2012 Volume: 128
  • Peer Reviewed
• [Journal Article] Structural and Ferroelectric Properties of Domain-Structure-Controlled BiFeO3 Thin Films Prepared by Dual-Ion-Beam Sputtering (2012)
  • Author(s): Seiji Nakashima
  • Journal Title: Japanese Journal of Applied Physics Volume: 51 Issue: 9S1 Pages: 09LB02-09LB02
  • DOI: 10.1143/jjap.51.09lb02
  • NAID: 210000141239
  • Peer Reviewed
• [Journal Article] Preparation and Characterization of High Quality Lead-free BiFeO3 Thin Films by Sputtering Process (2012)
  • Author(s): Seiji Nakashima
  • Journal Title: IEEE Proceedings of 2012 Fifth International Conference on Emerging Trends in Engineering and Technology (ICETET) Volume: - Pages: 128-131
  • DOI: 10.1109/icetet.2012.12
  • Peer Reviewed
• [Journal Article] Preparation of BiFeO_3Thin Films on SrRuO_3/SrTiO_3(001) Substrate by Dual Ion Beam Sputtering (2011)
  • Author(s): S. Nakashima, H. Fujisawa, H. Suminaga, J. M. Park, H. Nishioka, M. Kobune, T. Kanashima, M. Okuyama, and M Shimizu
  • Journal Title: Jpn. J. Appl. Phys. Volume: 50
  • Peer Reviewed
• [Journal Article] Growth of High Quality BiFeO3Thin Films by Dual Ion Beam Sputtering (2011)
  • Author(s): S. Nakashima, Y. Tsujita, S. Seto, H. Fujisawa, H. Nishioka, M. Kobune, M. Shimizu, J. M. Park, T. Kanashima, and M. Okuyama
  • Journal Title: IEEE Proc. of ISAF-PFM2011 Volume: 168
  • Peer Reviewed
• [Journal Article] Preparation of BiFeO_3 Thin Films on SrRuO_3/SrTiO_3(001) Substrate by Dual Ion Beam Sputtering Process (2011)
  • Author(s): S.Nakashima, H.Fujisawa, H.Suminaga, J.M.Park, H.Nishioka, M.Kobune, T.Kanashima, M.Okuyama, M.Shimizu
  • Journal Title: Japanese Journal of Applied Physics Volume: 50 Issue: 9S2 Pages: 09NB01-09NB01
  • DOI: 10.1143/jjap.50.09nb01
  • Peer Reviewed
• [Journal Article] Growth of High Quality BiFeO_3 Thin Films by Dual Ion Beam Sputtering (2011)
  • Author(s): S. Nakashima, Y. Tsujita, S. Seto, H. Fujisawa, H. Nishioka, M. Kobune, M. Shimizu, J. M. Park, T. Kanashima, and M. Okuyama
  • Journal Title: IEEE Proc. ISAF/PFM 2011 Volume: - Pages: 168-171
  • DOI: 10.1109/isaf.2011.6014140
  • Peer Reviewed
• [Presentation] 論文No. 28a-D3-5 (2013)
  • Author(s): 内田智久, 高田祐介, 中嶋誠二, 藤沢浩訓, 小舟正文, 坂田修身, 勝矢良雄, 清水勝
  • Organizer: 2013年(第60回)応用物理学会春季学術講演会
  • Place of Presentation: 神奈川工科大学
• [Presentation] 論文No. 28p-D3-17 (2013)
  • Author(s): 瀬戸翔太,高田祐介, 中嶋誠二, 藤沢浩訓, 清水勝
  • Organizer: 2013年(第60回)応用物理学会春季学術講演会
  • Place of Presentation: 神奈川工科大学
• [Presentation] 論文No. 25-T-22 (2013)
  • Author(s): 中嶋誠二, 高田祐介, 瀬戸翔太, 坂田修身, 勝矢良雄, 藤沢浩訓, 小舟正文, 清水勝
  • Organizer: 第30回強誘電体応用会議(FMA-30)
  • Place of Presentation: コープイン京都
• [Presentation] RFプレーナマグネトロンスパッタ法を用いたエピタキシャルBiFeO3薄膜の作製(III) (2013)
  • Author(s): 内田 智久
  • Organizer: 第60回応用物理学会春季学術講演会
  • Place of Presentation: 神奈川工科大学（神奈川県）
• [Presentation] FMを用いた強誘電体薄膜の面内および鉛直方向の圧電性評価 (2013)
  • Author(s): 瀬戸 翔太
  • Organizer: 第60回応用物理学会春季学術講演会
  • Place of Presentation: 神奈川工科大学（神奈川県）
• [Presentation] RFスパッタ法による単一ドメインBiFeO3薄膜の作製と評価 (2013)
  • Author(s): 中嶋 誠二
  • Organizer: 第30回強誘電体応用会議
  • Place of Presentation: コープイン京都（京都府）
• [Presentation] (2012)
  • Author(s): Y. Takada, S. Seto, S. Nakashima, H. Fujisawa, M. Kobune and M. Shimizu
  • Organizer: Abs. of 9th Korea-Japan Conference on Ferroelectrics (KJCFE09)
  • Place of Presentation: Ulsan, Korea
• [Presentation] (2012)
  • Author(s): S. Nakashima, Y. Takada, S. Seto, H. Fujisawa, M. Kobune, and M. Shimizu
  • Organizer: Abs. of International Conference on Electronic Materials (IUMRSICEM2012)
  • Place of Presentation: Yokohama, Japan
• [Presentation] (2012)
  • Author(s): S. Nakashima, Y. Takada, T. Ito, S. Seto, H. Fujisawa, M. Kobune, and M. Shimizu
  • Organizer: Abs. of 2012 5th International Conference on Emerging Trends in Engineering and Technology (ICETET)
  • Place of Presentation: Himeji, Japan
• [Presentation] (2012)
  • Author(s): S. Nakashima, Y. Takada, S. Seto, H. Fujisawa, M. Kobune and M. Shimizu
  • Organizer: Abs. of Mater. Res. Soc. 2012 Fall Meeting
  • Place of Presentation: Boston, Massachusetts, U.S.A.
• [Presentation] 論文No. 18P-F5-4 (2012)
  • Author(s): 高田祐介, 瀬戸翔太, 中嶋誠二, 藤沢浩訓, 小舟正文, 朴正敏, 金島岳, 奥山雅則, 清水勝
  • Organizer: 2012年春季(第59回)応用物理学関係連合講演会
  • Place of Presentation: 早稲田大学
• [Presentation] 論文No. 26-M-02 (2012)
  • Author(s): 中嶋誠二,辻田陽介,瀬戸翔太, 藤沢浩訓,小舟正文,清水勝,朴正敏,金島岳,奥山雅則
  • Organizer: 第29回強誘電体応用会議(FMA-29)
  • Place of Presentation: コープイン京都
• [Presentation] 論文No. 14p-c10-4 (2012)
  • Author(s): 瀬戸翔太,中嶋誠二,藤沢浩訓,清水勝
  • Organizer: 2013年(第73回)応用物理学会学術講演会
  • Place of Presentation: 愛媛大学
• [Presentation] 論文No. 13p-c10-9 (2012)
  • Author(s): 高田祐介, 瀬戸翔太, 中嶋誠二, 藤沢浩訓, 小舟正文, 清水勝
  • Organizer: 2013年(第73回)応用物理学会学術講演会
  • Place of Presentation: 愛媛大学
• [Presentation] デュアルイオンビームスパッタにより作製したBiFeO3薄膜のドメイン構造と電気的特性 (2012)
  • Author(s): 中嶋 誠二
  • Organizer: 第29回強誘電体応用会議
  • Place of Presentation: コープイン京都（京都府）
• [Presentation] Structural and Ferroelectric Properties of Single Domain BiFeO3 Thin Films Prepared by RF Planar Magnetron Sputtering (2012)
  • Author(s): Seiji Nakashima
  • Organizer: International Conference on Electronic Materials (IUMRS-ICEM 2012)
  • Place of Presentation: パシフィコ横浜（神奈川県）
• [Presentation] Preparation and Characterization of High Quality Lead-free BiFeO3 Thin Films by Sputtering Process (2012)
  • Author(s): Seiji Nakashima
  • Organizer: 2012 Fifth International Conference on Emerging Trends in Engineering and Technology (ICETET),
  • Place of Presentation: イーグレ姫路（兵庫県）
• [Presentation] High Quality Single Domain BiFeO3 Thin Films Prepared by RF Planar Magnetron Sputtering (2012)
  • Author(s): Seiji Nakashima
  • Organizer: 2012 Material Research Society Fall Meeting
  • Place of Presentation: Hunes convention center (アメリカ合衆国）
• [Presentation] PFMを用いた強誘電体薄膜の圧電変位量の定量評価 (2012)
  • Author(s): 瀬戸 翔太
  • Organizer: 第73回応用物理学会学術講演会
  • Place of Presentation: 愛媛大学（愛媛県）
• [Presentation] RFプレーナマグネトロンスパッタ法を用いたエピタキシャルBiFeO3薄膜の作製(II) (2012)
  • Author(s): 高田 祐介
  • Organizer: 第73回応用物理学会学術講演会
  • Place of Presentation: 愛媛大学（愛媛県）
• [Presentation] Preparation of epitaxial BiFeO3 thin films by RF planar magnetron sputtering (2012)
  • Author(s): Yusuke Takada
  • Organizer: 9th Korea-Japan Conference on Ferroelectrics (KJCFE09)
  • Place of Presentation: University of Ulsan (韓国）
• [Presentation] RFプレーナマグネトロンスパッタ法を用いたエピタキシャルBiFeO3薄膜の作製 (2012)
  • Author(s): 高田 祐介
  • Organizer: 2012年春季（第59回）応用物理学関係連合講演会
  • Place of Presentation: 早稲田大学 （東京都）
• [Presentation] (2011)
  • Author(s): S. Nakashima, H. Suminaga, Y. Tsujita, H. Fujisawa, M. Kobune, H. Nishioka , J. M. Park, T. Kanashima, M. Okuyama, and M. Shimizu
  • Organizer: Abs. of The 20th IEEE International Symposium on Applications of Ferroelectrics / International Symposium on Piezoresponse Force Microscopy & Nanoscale Phenomena in Polar Materials(ISAF-2011-PFM)
  • Place of Presentation: Joint Conference, Vancouver, Canada
• [Presentation] (2011)
  • Author(s): S. Nakashima, Y. Tsujita, H. Fujisawa, M. Kobune, H. Nishioka, J. M. Park, T. Kanashima, M. Okuyama, and M. Shimizu
  • Organizer: Abs. of Mater. Res. Soc. 2011 Fall Meeting
  • Place of Presentation: Boston, Massachusetts, U.S.A.
• [Presentation] 論文No. 27-M-03 (2011)
  • Author(s): 中嶋誠二,住永寛幸,辻田陽介,藤沢浩訓,小舟正文,清水勝,朴正敏,金島岳,奥山雅則
  • Organizer: 第28回強誘電体応用会(FMA-28)
  • Place of Presentation: コープイン京都
• [Presentation] 論文No. 31a-C-2 (2011)
  • Author(s): 辻田陽介,中嶋誠二,藤沢浩訓,西岡洋,小舟正文,朴正敏,金島岳,奥山雅則,清水勝
  • Organizer: 2011年秋季1(第72回)応用物理学会学術講演会
  • Place of Presentation: 山形大学
• [Presentation] 論文No. E-14 (2011)
  • Author(s): 中嶋誠二,辻田陽介,瀬戸翔太, 藤沢浩訓,小舟正文,清水勝,朴正敏,金島岳,奥山雅則
  • Organizer: 第21回日本MRS学術シンポジウム
  • Place of Presentation: 波止場会場
• [Presentation] デュアルイオンビームスパッタを用いたSrRuO3/SrTiO3 基板上へのBiFeO3薄膜の作製 (2011)
  • Author(s): 中嶋 誠二
  • Organizer: 第28回強誘電体応用会議
  • Place of Presentation: コープイン京都（京都府）
• [Presentation] Growth of High Quality BiFeO3 Thin Films by Dual Ion Beam Sputtering (2011)
  • Author(s): Seiji Nakashima
  • Organizer: 2011 International Symposium on Applications of Ferroelectrics (ISAF/PFM 2011) and 2011 International Symposium on Piezoresponse Force Microscopy and Nanoscale Phenomena in Polar Materials
  • Place of Presentation: The Westin Bayshore hotel (カナダ）
• [Presentation] デュアルイオンビームスパッタ法を用いたBiFeO3薄膜の作製(II) (2011)
  • Author(s): 辻田 陽介
  • Organizer: 2011年秋季1(第72回)応用物理学会学術講演会
  • Place of Presentation: 山形大学（山形県）
• [Presentation] デュアルイオンビームスパッタ法により作製したノンドープBiFeO3薄膜ドメイン構造と強誘電性ヒステリシスループ (2011)
  • Author(s): 中嶋 誠二
  • Organizer: 第21回日本ＭＲＳ学術シンポジウム
  • Place of Presentation: 波止場会館（神奈川県）
• [Presentation] Low Pressure Growth and Fully Saturated Hysteresis Loops of Epitaxial BiFeO3 Thin Films Prepared by Dual Ion Beam Sputtering (2011)
  • Author(s): Seiji Nakashima
  • Organizer: 2011 Material Research Society Fall Meeting
  • Place of Presentation: Hynes convention center (アメリカ)