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Investigation of new-domain-structure-induced functionalities in BiFeO_3 thin films.

Research Project

Project/Area Number 23760290
Research Category

Grant-in-Aid for Young Scientists (B)

Allocation TypeMulti-year Fund
Research Field Electronic materials/Electric materials
Research InstitutionUniversity of Hyogo

Principal Investigator

NAKASHIMA Seiji  兵庫県立大学, 大学院・工学研究科, 助教 (80552702)

Project Period (FY) 2011 – 2012
Project Status Completed (Fiscal Year 2012)
Budget Amount *help
¥4,160,000 (Direct Cost: ¥3,200,000、Indirect Cost: ¥960,000)
Fiscal Year 2012: ¥1,170,000 (Direct Cost: ¥900,000、Indirect Cost: ¥270,000)
Fiscal Year 2011: ¥2,990,000 (Direct Cost: ¥2,300,000、Indirect Cost: ¥690,000)
Keywordsマルチフェロイック / 強誘電性 / ドメイン構造 / ビスマスフェライト / 薄膜 / BiFeO3 / スパッタリング / イオンビームスパッタ / 高周波スパッタ
Research Abstract

In this study, we focused on BiFeO_3with giant c/a ratio which is attracted much attention because of its giant remanent polarization of ~150 μC/cm2predicted by first-principles calculation. Rhombohedral BFO, giant c/aBFO and their mixed phase thin films have been prepared. The giant c/a BFO can be obtained on SrRuO_3/SrTiO_3substrate, and 80odomain can be observed by TEM. The high quality giant c/aBFO films can be obtained on LaAlO_3(001) substrate, and photovoltaic effect have been confirmed.

Report

(3 results)
  • 2012 Annual Research Report   Final Research Report ( PDF )
  • 2011 Research-status Report
  • Research Products

    (40 results)

All 2013 2012 2011

All Journal Article (8 results) (of which Peer Reviewed: 8 results) Presentation (32 results)

  • [Journal Article] Structural and Ferroelectric Properties of Domain-Structure- Controlled BiFeO_3 Thin Films Prepared by Dual-Ion-Beam Sputtering2012

    • Author(s)
      S. Nakashima, H. Fujisawa, Y. Tsujita, S. Seto, M. Kobune, and M. Shimizu
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 51

    • Related Report
      2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Preparation and Characterization of High Quality Lead-free BiFeO_3 Thin Films by Sputtering Process2012

    • Author(s)
      S. Nakashima, Y. Takada, T. Ito, S. Seto, H. Fujisawa, M. Kobune, and M. Shimizu
    • Journal Title

      IEEE Proc. of ICETET2012

      Volume: 128

    • Related Report
      2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Structural and Ferroelectric Properties of Domain-Structure-Controlled BiFeO3 Thin Films Prepared by Dual-Ion-Beam Sputtering2012

    • Author(s)
      Seiji Nakashima
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 51 Issue: 9S1 Pages: 09LB02-09LB02

    • DOI

      10.1143/jjap.51.09lb02

    • NAID

      210000141239

    • Related Report
      2012 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Preparation and Characterization of High Quality Lead-free BiFeO3 Thin Films by Sputtering Process2012

    • Author(s)
      Seiji Nakashima
    • Journal Title

      IEEE Proceedings of 2012 Fifth International Conference on Emerging Trends in Engineering and Technology (ICETET)

      Volume: - Pages: 128-131

    • DOI

      10.1109/icetet.2012.12

    • Related Report
      2012 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Preparation of BiFeO_3Thin Films on SrRuO_3/SrTiO_3(001) Substrate by Dual Ion Beam Sputtering2011

    • Author(s)
      S. Nakashima, H. Fujisawa, H. Suminaga, J. M. Park, H. Nishioka, M. Kobune, T. Kanashima, M. Okuyama, and M Shimizu
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 50

    • Related Report
      2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Growth of High Quality BiFeO3Thin Films by Dual Ion Beam Sputtering2011

    • Author(s)
      S. Nakashima, Y. Tsujita, S. Seto, H. Fujisawa, H. Nishioka, M. Kobune, M. Shimizu, J. M. Park, T. Kanashima, and M. Okuyama
    • Journal Title

      IEEE Proc. of ISAF-PFM2011

      Volume: 168

    • Related Report
      2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Preparation of BiFeO_3 Thin Films on SrRuO_3/SrTiO_3(001) Substrate by Dual Ion Beam Sputtering Process2011

    • Author(s)
      S.Nakashima, H.Fujisawa, H.Suminaga, J.M.Park, H.Nishioka, M.Kobune, T.Kanashima, M.Okuyama, M.Shimizu
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 50 Issue: 9S2 Pages: 09NB01-09NB01

    • DOI

      10.1143/jjap.50.09nb01

    • Related Report
      2011 Research-status Report
    • Peer Reviewed
  • [Journal Article] Growth of High Quality BiFeO_3 Thin Films by Dual Ion Beam Sputtering2011

    • Author(s)
      S. Nakashima, Y. Tsujita, S. Seto, H. Fujisawa, H. Nishioka, M. Kobune, M. Shimizu, J. M. Park, T. Kanashima, and M. Okuyama
    • Journal Title

      IEEE Proc. ISAF/PFM 2011

      Volume: - Pages: 168-171

    • DOI

      10.1109/isaf.2011.6014140

    • Related Report
      2011 Research-status Report
    • Peer Reviewed
  • [Presentation] 論文No. 28a-D3-52013

    • Author(s)
      内田智久, 高田祐介, 中嶋誠二, 藤沢浩訓, 小舟正文, 坂田修身, 勝矢良雄, 清水勝
    • Organizer
      2013年(第60回)応用物理学会春季学術講演会
    • Place of Presentation
      神奈川工科大学
    • Related Report
      2012 Final Research Report
  • [Presentation] 論文No. 28p-D3-172013

    • Author(s)
      瀬戸翔太,高田祐介, 中嶋誠二, 藤沢浩訓, 清水勝
    • Organizer
      2013年(第60回)応用物理学会春季学術講演会
    • Place of Presentation
      神奈川工科大学
    • Related Report
      2012 Final Research Report
  • [Presentation] 論文No. 25-T-222013

    • Author(s)
      中嶋誠二, 高田祐介, 瀬戸翔太, 坂田修身, 勝矢良雄, 藤沢浩訓, 小舟正文, 清水勝
    • Organizer
      第30回強誘電体応用会議(FMA-30)
    • Place of Presentation
      コープイン京都
    • Related Report
      2012 Final Research Report
  • [Presentation] RFプレーナマグネトロンスパッタ法を用いたエピタキシャルBiFeO3薄膜の作製(III)2013

    • Author(s)
      内田 智久
    • Organizer
      第60回応用物理学会春季学術講演会
    • Place of Presentation
      神奈川工科大学(神奈川県)
    • Related Report
      2012 Annual Research Report
  • [Presentation] FMを用いた強誘電体薄膜の面内および鉛直方向の圧電性評価2013

    • Author(s)
      瀬戸 翔太
    • Organizer
      第60回応用物理学会春季学術講演会
    • Place of Presentation
      神奈川工科大学(神奈川県)
    • Related Report
      2012 Annual Research Report
  • [Presentation] RFスパッタ法による単一ドメインBiFeO3薄膜の作製と評価2013

    • Author(s)
      中嶋 誠二
    • Organizer
      第30回強誘電体応用会議
    • Place of Presentation
      コープイン京都(京都府)
    • Related Report
      2012 Annual Research Report
  • [Presentation]2012

    • Author(s)
      Y. Takada, S. Seto, S. Nakashima, H. Fujisawa, M. Kobune and M. Shimizu
    • Organizer
      Abs. of 9th Korea-Japan Conference on Ferroelectrics (KJCFE09)
    • Place of Presentation
      Ulsan, Korea
    • Related Report
      2012 Final Research Report
  • [Presentation]2012

    • Author(s)
      S. Nakashima, Y. Takada, S. Seto, H. Fujisawa, M. Kobune, and M. Shimizu
    • Organizer
      Abs. of International Conference on Electronic Materials (IUMRSICEM2012)
    • Place of Presentation
      Yokohama, Japan
    • Related Report
      2012 Final Research Report
  • [Presentation]2012

    • Author(s)
      S. Nakashima, Y. Takada, T. Ito, S. Seto, H. Fujisawa, M. Kobune, and M. Shimizu
    • Organizer
      Abs. of 2012 5th International Conference on Emerging Trends in Engineering and Technology (ICETET)
    • Place of Presentation
      Himeji, Japan
    • Related Report
      2012 Final Research Report
  • [Presentation]2012

    • Author(s)
      S. Nakashima, Y. Takada, S. Seto, H. Fujisawa, M. Kobune and M. Shimizu
    • Organizer
      Abs. of Mater. Res. Soc. 2012 Fall Meeting
    • Place of Presentation
      Boston, Massachusetts, U.S.A.
    • Related Report
      2012 Final Research Report
  • [Presentation] 論文No. 18P-F5-42012

    • Author(s)
      高田祐介, 瀬戸翔太, 中嶋誠二, 藤沢浩訓, 小舟正文, 朴正敏, 金島岳, 奥山雅則, 清水勝
    • Organizer
      2012年春季(第59回)応用物理学関係連合講演会
    • Place of Presentation
      早稲田大学
    • Related Report
      2012 Final Research Report
  • [Presentation] 論文No. 26-M-022012

    • Author(s)
      中嶋誠二,辻田陽介,瀬戸翔太, 藤沢浩訓,小舟正文,清水勝,朴正敏,金島岳,奥山雅則
    • Organizer
      第29回強誘電体応用会議(FMA-29)
    • Place of Presentation
      コープイン京都
    • Related Report
      2012 Final Research Report
  • [Presentation] 論文No. 14p-c10-42012

    • Author(s)
      瀬戸翔太,中嶋誠二,藤沢浩訓,清水勝
    • Organizer
      2013年(第73回)応用物理学会学術講演会
    • Place of Presentation
      愛媛大学
    • Related Report
      2012 Final Research Report
  • [Presentation] 論文No. 13p-c10-92012

    • Author(s)
      高田祐介, 瀬戸翔太, 中嶋誠二, 藤沢浩訓, 小舟正文, 清水勝
    • Organizer
      2013年(第73回)応用物理学会学術講演会
    • Place of Presentation
      愛媛大学
    • Related Report
      2012 Final Research Report
  • [Presentation] デュアルイオンビームスパッタにより作製したBiFeO3薄膜のドメイン構造と電気的特性2012

    • Author(s)
      中嶋 誠二
    • Organizer
      第29回強誘電体応用会議
    • Place of Presentation
      コープイン京都(京都府)
    • Related Report
      2012 Annual Research Report
  • [Presentation] Structural and Ferroelectric Properties of Single Domain BiFeO3 Thin Films Prepared by RF Planar Magnetron Sputtering2012

    • Author(s)
      Seiji Nakashima
    • Organizer
      International Conference on Electronic Materials (IUMRS-ICEM 2012)
    • Place of Presentation
      パシフィコ横浜(神奈川県)
    • Related Report
      2012 Annual Research Report
  • [Presentation] Preparation and Characterization of High Quality Lead-free BiFeO3 Thin Films by Sputtering Process2012

    • Author(s)
      Seiji Nakashima
    • Organizer
      2012 Fifth International Conference on Emerging Trends in Engineering and Technology (ICETET),
    • Place of Presentation
      イーグレ姫路(兵庫県)
    • Related Report
      2012 Annual Research Report
  • [Presentation] High Quality Single Domain BiFeO3 Thin Films Prepared by RF Planar Magnetron Sputtering2012

    • Author(s)
      Seiji Nakashima
    • Organizer
      2012 Material Research Society Fall Meeting
    • Place of Presentation
      Hunes convention center (アメリカ合衆国)
    • Related Report
      2012 Annual Research Report
  • [Presentation] PFMを用いた強誘電体薄膜の圧電変位量の定量評価2012

    • Author(s)
      瀬戸 翔太
    • Organizer
      第73回応用物理学会学術講演会
    • Place of Presentation
      愛媛大学(愛媛県)
    • Related Report
      2012 Annual Research Report
  • [Presentation] RFプレーナマグネトロンスパッタ法を用いたエピタキシャルBiFeO3薄膜の作製(II)2012

    • Author(s)
      高田 祐介
    • Organizer
      第73回応用物理学会学術講演会
    • Place of Presentation
      愛媛大学(愛媛県)
    • Related Report
      2012 Annual Research Report
  • [Presentation] Preparation of epitaxial BiFeO3 thin films by RF planar magnetron sputtering2012

    • Author(s)
      Yusuke Takada
    • Organizer
      9th Korea-Japan Conference on Ferroelectrics (KJCFE09)
    • Place of Presentation
      University of Ulsan (韓国)
    • Related Report
      2012 Annual Research Report
  • [Presentation] RFプレーナマグネトロンスパッタ法を用いたエピタキシャルBiFeO3薄膜の作製2012

    • Author(s)
      高田 祐介
    • Organizer
      2012年春季(第59回)応用物理学関係連合講演会
    • Place of Presentation
      早稲田大学 (東京都)
    • Related Report
      2011 Research-status Report
  • [Presentation]2011

    • Author(s)
      S. Nakashima, H. Suminaga, Y. Tsujita, H. Fujisawa, M. Kobune, H. Nishioka , J. M. Park, T. Kanashima, M. Okuyama, and M. Shimizu
    • Organizer
      Abs. of The 20th IEEE International Symposium on Applications of Ferroelectrics / International Symposium on Piezoresponse Force Microscopy & Nanoscale Phenomena in Polar Materials(ISAF-2011-PFM)
    • Place of Presentation
      Joint Conference, Vancouver, Canada
    • Related Report
      2012 Final Research Report
  • [Presentation]2011

    • Author(s)
      S. Nakashima, Y. Tsujita, H. Fujisawa, M. Kobune, H. Nishioka, J. M. Park, T. Kanashima, M. Okuyama, and M. Shimizu
    • Organizer
      Abs. of Mater. Res. Soc. 2011 Fall Meeting
    • Place of Presentation
      Boston, Massachusetts, U.S.A.
    • Related Report
      2012 Final Research Report
  • [Presentation] 論文No. 27-M-032011

    • Author(s)
      中嶋誠二,住永寛幸,辻田陽介,藤沢浩訓,小舟正文,清水勝,朴正敏,金島岳,奥山雅則
    • Organizer
      第28回強誘電体応用会(FMA-28)
    • Place of Presentation
      コープイン京都
    • Related Report
      2012 Final Research Report
  • [Presentation] 論文No. 31a-C-22011

    • Author(s)
      辻田陽介,中嶋誠二,藤沢浩訓,西岡洋,小舟正文,朴正敏,金島岳,奥山雅則,清水勝
    • Organizer
      2011年秋季1(第72回)応用物理学会学術講演会
    • Place of Presentation
      山形大学
    • Related Report
      2012 Final Research Report
  • [Presentation] 論文No. E-142011

    • Author(s)
      中嶋誠二,辻田陽介,瀬戸翔太, 藤沢浩訓,小舟正文,清水勝,朴正敏,金島岳,奥山雅則
    • Organizer
      第21回日本MRS学術シンポジウム
    • Place of Presentation
      波止場会場
    • Related Report
      2012 Final Research Report
  • [Presentation] デュアルイオンビームスパッタを用いたSrRuO3/SrTiO3 基板上へのBiFeO3薄膜の作製2011

    • Author(s)
      中嶋 誠二
    • Organizer
      第28回強誘電体応用会議
    • Place of Presentation
      コープイン京都(京都府)
    • Related Report
      2011 Research-status Report
  • [Presentation] Growth of High Quality BiFeO3 Thin Films by Dual Ion Beam Sputtering2011

    • Author(s)
      Seiji Nakashima
    • Organizer
      2011 International Symposium on Applications of Ferroelectrics (ISAF/PFM 2011) and 2011 International Symposium on Piezoresponse Force Microscopy and Nanoscale Phenomena in Polar Materials
    • Place of Presentation
      The Westin Bayshore hotel (カナダ)
    • Related Report
      2011 Research-status Report
  • [Presentation] デュアルイオンビームスパッタ法を用いたBiFeO3薄膜の作製(II)2011

    • Author(s)
      辻田 陽介
    • Organizer
      2011年秋季1(第72回)応用物理学会学術講演会
    • Place of Presentation
      山形大学(山形県)
    • Related Report
      2011 Research-status Report
  • [Presentation] デュアルイオンビームスパッタ法により作製したノンドープBiFeO3薄膜ドメイン構造と強誘電性ヒステリシスループ2011

    • Author(s)
      中嶋 誠二
    • Organizer
      第21回日本MRS学術シンポジウム
    • Place of Presentation
      波止場会館(神奈川県)
    • Related Report
      2011 Research-status Report
  • [Presentation] Low Pressure Growth and Fully Saturated Hysteresis Loops of Epitaxial BiFeO3 Thin Films Prepared by Dual Ion Beam Sputtering2011

    • Author(s)
      Seiji Nakashima
    • Organizer
      2011 Material Research Society Fall Meeting
    • Place of Presentation
      Hynes convention center (アメリカ)
    • Related Report
      2011 Research-status Report

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Published: 2011-08-05   Modified: 2019-07-29  

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