| Budget Amount *help |
¥4,420,000 (Direct Cost: ¥3,400,000、Indirect Cost: ¥1,020,000)
Fiscal Year 2012: ¥1,560,000 (Direct Cost: ¥1,200,000、Indirect Cost: ¥360,000)
Fiscal Year 2011: ¥2,860,000 (Direct Cost: ¥2,200,000、Indirect Cost: ¥660,000)
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| Research Abstract |
In this study, the spatial density distribution and surface loss probability of hydrogen atoms have been investigated by using vacuum ultraviolet absorption spectroscopy. From the results, we clarified the spatial distribution of hydrogen atom between upper and bottom electrodes in capacitively coupled plasmas with pure H_2 gas or H_2 and N_2 mixture gas. Moreover, the surface loss probability of hydrogen atom on silicon thin films during plasma chemical vapor deposition with inductively coupled SiH_4/H_2 plasma was quantitatively clarified.
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