| Project/Area Number |
23760698
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| Research Category |
Grant-in-Aid for Young Scientists (B)
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| Allocation Type | Multi-year Fund |
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| Research Field |
Material processing/treatments
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| Research Institution | Osaka University |
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Principal Investigator |
ENOMOTO Kazuyuki 大阪大学, 大学院・工学研究科, 特任助教 (50465978)
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| Project Period (FY) |
2011 – 2012
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| Project Status |
Completed (Fiscal Year 2012)
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| Budget Amount *help |
¥3,770,000 (Direct Cost: ¥2,900,000、Indirect Cost: ¥870,000)
Fiscal Year 2012: ¥1,170,000 (Direct Cost: ¥900,000、Indirect Cost: ¥270,000)
Fiscal Year 2011: ¥2,600,000 (Direct Cost: ¥2,000,000、Indirect Cost: ¥600,000)
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| Keywords | 微細加工 / レジスト / 極端紫外光 / 酸増殖反応 / パルスラジオリシス / 極端紫外光（EUV） |
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| Research Abstract |
Rate constants for the reaction of the electrons with triphenylsulfoniumtriflate (TPS-Tf) and pinanediol monosulfonates, which consist of tosylate (PiTs) or 4-trifluoromethylbenzenesulfonate (Pi3F), have been measured using pulse radiolysis in liquid tetrahydrofuran to evaluate the kinetic contribution to acid production for extreme ultraviolet (EUV) chemically amplified resists. The long-lived Pi3F・-radical anion efficiently undergoes the electron transfer to TPS-Tf with the rate constant of 6.3 × 10^10M^<-1>s^<-1> to form TPS-Tf・-, which subsequently decomposes to generate TfOH. The novel acid production pathway via the electron transfer from pinanediol monosulfonate radical anions to TPS-Tf is presented.
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