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Study of High-Spatial Resolution Strain Measurements in Semiconductor Devices Using Tip-Enhanced Raman Spectroscopy

Research Project

Project/Area Number 23860051
Research Category

Grant-in-Aid for Research Activity Start-up

Allocation TypeSingle-year Grants
Research Field Applied materials science/Crystal engineering
Research InstitutionMeiji University

Principal Investigator

KOSEMURA Daisuke  明治大学, 理工学部, 助教 (00608284)

Project Period (FY) 2011 – 2012
Project Status Completed (Fiscal Year 2012)
Budget Amount *help
¥2,990,000 (Direct Cost: ¥2,300,000、Indirect Cost: ¥690,000)
Fiscal Year 2012: ¥1,430,000 (Direct Cost: ¥1,100,000、Indirect Cost: ¥330,000)
Fiscal Year 2011: ¥1,560,000 (Direct Cost: ¥1,200,000、Indirect Cost: ¥360,000)
Keywordstip-enhanced Raman / AFM Raman / Si, SiGe / strain / stress / polarized-Raman / ラマン分光法 / 原子間力顕微鏡 / 近接場 / 歪Si / SiGe / 偏光ラマン / 結晶工学 / 半導体物性 / 光物性 / シリコン / 応力 / ラマン散乱
Research Abstract

Tip-enhanced Raman spectroscopy (TERS) was realized by combining Raman spectroscopy and atomic force microscopy (AFM). Far-field signal (background) frequently interrupts us to derive the TERS signal from obtained spectra. To suppress the background, the polarization properties of both TERS signal and background were examined in detail. As a result, high-intensity ratio of the TERS signal to background was obtained in the conditions of [110] incidence and p and s polarizations of the incident and scattered lights, respectively. Anenhancement factor of approximately 1.6 〓 105 was obtained by comparing the experimental results and calculations based on the tip-enhanced modeling with the “tip-amplification tensor.” The obtained value of the enhancement factor was higher than the previously reported value of about104. The reason for the high enhancement factor is considered to be the tip apex remaining in the vicinity of the sample surface in the shear-force AFM measurements.

Report

(3 results)
  • 2012 Annual Research Report   Final Research Report ( PDF )
  • 2011 Annual Research Report
  • Research Products

    (45 results)

All 2013 2012 2011

All Journal Article (8 results) (of which Peer Reviewed: 8 results) Presentation (36 results) (of which Invited: 1 results) Book (1 results)

  • [Journal Article] Measurement of Anisotropic Biaxial Stresses in Sil-xGex /Si Mesa Structures bu Oil-Immersion Raman Spectroscopy2013

    • Author(s)
      D. Kosenura, M. Tonita. K. Usuda, T. Tezuka, and A. Ogura
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 52 Issue: 4S Pages: 04CA05-04CA05

    • DOI

      10.7567/jjap.52.04ca05

    • Related Report
      2012 Annual Research Report 2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Characterization of anisotropic strain relaxation after isolation for strained SGOI and SiGe/Si structure with newly developed high-NA and oil-immersion Raman method2013

    • Author(s)
      K. Usuda, T. Tezuka, D. Kosemura, M. Tomita, and A. Ogura
    • Journal Title

      Solid-State Electronics

      Volume: Vol.83 Pages: 46-49

    • DOI

      10.1016/j.sse.2013.01.042

    • Related Report
      2012 Annual Research Report 2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Iensor Evaluation of Anisotropic stress Relaxation in Mesa-shaped Sige Layer on Si Substpate by Electron Back Scattering Pattern Measureaent : Comparison between Raman Measurement and Finite Element Method Simulation2013

    • Author(s)
      M, Tomita, M. Nagasaka, D. Kosemura, K. Usuda, T. Tezuka, and A. Ogura
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 52 Issue: 4S Pages: 04CA06-04CA06

    • DOI

      10.7567/jjap.52.04ca06

    • Related Report
      2012 Annual Research Report 2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Super-Resolution Raman Spectroscopy by Digital Image Processing2013

    • Author(s)
      M. Tomita. H. Hashiguchi, T. Yaiiaguchi, D. Kosemura, M. Takei, and A. Ogura
    • Journal Title

      Journal of Spectroscopy

      Volume: 2013 Pages: 1-9

    • DOI

      10.1155/2013/459032

    • Related Report
      2012 Annual Research Report 2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Investigation of Phonon DeformationPotentials in Si_<1_x>Ge_x by Oil-ImmersionRaman Spectroscopy2012

    • Author(s)
      D. Kosemura, K. Usuda, and A. Ogura
    • Journal Title

      Appl. Phys. Express

      Volume: 5 Issue: 11 Pages: 111301-111301

    • DOI

      10.1143/apex.5.111301

    • Related Report
      2012 Annual Research Report 2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Stress evaluation in thin strained-Si film by polarized Raman spectroscopy using localized surface plasmon resonance2012

    • Author(s)
      Hiroki Hashiguchi, Munehisa Takei
    • Journal Title

      Applied Physics Letters

      Volume: 101 Issue: 17

    • DOI

      10.1063/1.4761959

    • Related Report
      2012 Annual Research Report 2012 Final Research Report
    • Peer Reviewed
  • [Journal Article] Evaluation of Anisotropic StrainRelaxation in Strained Silicon-on-Insulator Nanostructure by Oil-Immersion Raman Spectroscopy2012

    • Author(s)
      D. Kosemura, M. Tomita, K. Usuda, and A.Ogura
    • Journal Title

      Japanese Journal of AppliedPhysics

      Volume: 51 Issue: 2S Pages: 02BA03-02BA03

    • DOI

      10.1143/jjap.51.02ba03

    • NAID

      210000140194

    • Related Report
      2012 Final Research Report 2011 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Channel Strain Measurement in 32-nm-Node Complementary Metal-Oxide-Semiconductor Field-Effect Transistor by Raman Spectroscopy2012

    • Author(s)
      Munehisa Takei
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 51 Issue: 4S Pages: 04DA04-04DA04

    • DOI

      10.1143/jjap.51.04da04

    • Related Report
      2012 Final Research Report 2011 Annual Research Report
    • Peer Reviewed
  • [Presentation] Characterization of anisotropic strain relaxation after mesa isolation for strained SGOI and SiGe/Si structure with newly developed high-NA and oil-immersion Raman method and NBD2012

    • Author(s)
      K. Usuda, D. Kosemura, M. Tomita, T. Tezuka, and A. Ogura
    • Organizer
      The 6th International Symposium on Advanced Science and Technology of Silicon Materials
    • Place of Presentation
      Kona, Hawaii
    • Year and Date
      2012-11-22
    • Related Report
      2012 Final Research Report
  • [Presentation] TO Phonon Excitation Using Surface Enhanced Raman Scattering for Stress Evaluation2012

    • Author(s)
      H. Hashiguchi, M. Takei, D. Kosemura, A.Ogura
    • Organizer
      The 6th InternationalSymposium on Advanced Science andTechnology of Silicon Materials
    • Place of Presentation
      Kona, Hawaii
    • Year and Date
      2012-11-20
    • Related Report
      2012 Final Research Report
  • [Presentation] Measurements ofAnisotropic Biaxial Stresses in x=0.15 and0.30 Si1〓xGex Nanostructures by Oil-Immersion Raman Spectroscopy2012

    • Author(s)
      D. Kosemura, M. Tomita, K. Usuda, T.Tezuka, and A. Ogura
    • Organizer
      International Conference on Solid State Devices and Materials
    • Place of Presentation
      Kyoto
    • Year and Date
      2012-09-27
    • Related Report
      2012 Final Research Report
  • [Presentation] Raman spectroscopy for strain measurement in state-of-the-art LSI2012

    • Author(s)
      A. Ogura, D. Kosemura, M. Takei, and M.Tomita
    • Organizer
      International Conference on Solid StateDevices and Materials
    • Place of Presentation
      Kyoto
    • Year and Date
      2012-09-25
    • Related Report
      2012 Final Research Report
  • [Presentation] 異方的SSOI層の軸分解ラマン測定2012

    • Author(s)
      小瀬村大亮、富田基裕、臼田宏治、小椋厚志
    • Organizer
      秋季応用物理学会
    • Place of Presentation
      山形大学
    • Year and Date
      2012-09-02
    • Related Report
      2011 Annual Research Report
  • [Presentation] 液浸技術および超解像技術を用いたラマン分光法の高空間分解能化2012

    • Author(s)
      富田基裕、橋口祐樹、山口拓也、武井宗久、小瀬村大亮、小椋厚志
    • Organizer
      秋季応用物理学会
    • Place of Presentation
      山形大学
    • Year and Date
      2012-09-02
    • Related Report
      2011 Annual Research Report
  • [Presentation] Polarized Dependence of Intensity from Strained Si on Insulator in Tip-Enhanced RamanSpectroscopy2012

    • Author(s)
      D. kosemura, J. M. Atkin, S. Berweger, R. L.Olmon, M. B. Raschke, A. Ogura
    • Organizer
      International Conference on Raman Spectroscopy
    • Place of Presentation
      Bangalore, India
    • Year and Date
      2012-08-13
    • Related Report
      2012 Final Research Report
  • [Presentation] High-mobility and Low-parasitic Resistance Characteristics in Strained Ge Nanowire pMOSFETs with Metal Source/Drain Structure Formed by Doping-free Processes2012

    • Author(s)
      Keiji Ikeda, Mizuki Ono, Daisuke Kosemura, Koji Usuda, Minoru Oda, Yuuichi Kamimuta, Toshifumi Irisawa, Yoshihiko Moriyama, Atsushi Ogura, Tsutomu Tezuka
    • Organizer
      Symposium on VLSI Technology
    • Place of Presentation
      Hawai
    • Year and Date
      2012-06-14
    • Related Report
      2011 Annual Research Report
  • [Presentation] Characterization ofanisotropic strain relaxation after mesaisolation for strained SGOI and SiGe/Si structure with newly developed high-NAand oil-immersion Raman method2012

    • Author(s)
      K. Usuda, D. Kosemura, M. Tomita, A.Ogura, and T. Tezuka
    • Organizer
      2012 Intl.SiGe Technology and Device Meeting
    • Place of Presentation
      Berkley, USA
    • Year and Date
      2012-06-01
    • Related Report
      2012 Final Research Report
  • [Presentation] 液浸ラマン分光法による歪SiGeの異方性応力評価2012

    • Author(s)
      小瀬村大亮、富田基裕、臼田宏治、小椋厚志
    • Organizer
      春季応用物理学会
    • Place of Presentation
      早稲田大学
    • Year and Date
      2012-03-18
    • Related Report
      2011 Annual Research Report
  • [Presentation] 有限要素法による微細構造歪SiGe層の異方性応力緩和評価2012

    • Author(s)
      富田基裕、小瀬村大亮、臼田宏治、小椋厚志
    • Organizer
      春季応用物理学会
    • Place of Presentation
      早稲田大学
    • Year and Date
      2012-03-18
    • Related Report
      2011 Annual Research Report
  • [Presentation] Biaxial Stress Measurements in Mesa-shaped Strained Si Layers by Oil-Immersion Raman Spectroscopy2012

    • Author(s)
      Daisuke Kosemura, Motohiro Tomita, Koji Usuda, Atsushi Ogura
    • Organizer
      International Symposium on "Development of Core Technologies for Green Nanoelectronics"
    • Place of Presentation
      Tsukuba, Japna
    • Year and Date
      2012-03-14
    • Related Report
      2011 Annual Research Report
  • [Presentation] Evaluation of Anisotropic Stress Relaxation in Mesa-Shaped Strained Si Layers by FEM Simulation2012

    • Author(s)
      Motohiro Tomita, Daisuke Kosemura, Koji Usuda, Tsutomu Tezuka, Atsushi Ogura
    • Organizer
      International Symposium on "Development of Core Technologies for Green Nanoelectronics"
    • Place of Presentation
      Tsukuba, Japan
    • Year and Date
      2012-03-14
    • Related Report
      2011 Annual Research Report
  • [Presentation] Anisotropic Biaxial Stress Evaluation in SiGe/Si Mesa Structures by Oil-Immersion Raman Spectroscopy2012

    • Author(s)
      D. Kosemura
    • Organizer
      International Symposium on Advanced Science and Technology of Silicon Materials
    • Place of Presentation
      Kona
    • Related Report
      2012 Annual Research Report
  • [Presentation] Evaluation of Stress Relaxation in Mesa-shaped Strained Si Layer by Super-resolution Raman Spectroscopy and FEM simulation2012

    • Author(s)
      M. Tomita
    • Organizer
      International Symposium on Advanced Science and Technology of Silicon Materials
    • Place of Presentation
      Kona
    • Related Report
      2012 Annual Research Report
  • [Presentation] Characterization of anisotropic strain relaxation after mesa isolation for strained SGOI and SiGe/Si structure with newly developed high-NA and oil-immersion Raman method and NBD2012

    • Author(s)
      K. Usuda
    • Organizer
      International Symposium on Advanced Science and Technology of Silicon Materials
    • Place of Presentation
      Kona
    • Related Report
      2012 Annual Research Report
  • [Presentation] TO Phonon Excitation Using Surface Enhanced Raman Scattering for Stress Evaluation2012

    • Author(s)
      H. Hashiguchi
    • Organizer
      International Symposium on Advanced Science and Technology of Silicon Materials
    • Place of Presentation
      Kona
    • Related Report
      2012 Annual Research Report
  • [Presentation] Thickness dependence of anisotropic strain relaxation in strained silicon-on-insulator nanostructure evaluated by oil-immersion Raman spectroscopy2012

    • Author(s)
      Siti Norhidayah Binti Che Mohd Yusoff
    • Organizer
      MALAYSIA-JAPAN ACADEMIC SCHOLAR SEMINAR (MJASS) 2012
    • Place of Presentation
      Tokyo
    • Related Report
      2012 Annual Research Report
  • [Presentation] Measurements of Anisotropic Biaxial Stresses in x=0.15 and 0.30 Si1-xGex Nanostructures by Oil-Immersion Raman Spectroscopy2012

    • Author(s)
      D. Kosemura
    • Organizer
      International Conference on Solid State Devices and Materials
    • Place of Presentation
      Kyoto
    • Related Report
      2012 Annual Research Report
  • [Presentation] Tensor Evaluation of Anisotropic Stress Relaxation in Mesa-shaped SiGe Layer on Si Substrate by EBSP2012

    • Author(s)
      M. Tomita
    • Organizer
      International Conference on Solid State Devices and Materials
    • Place of Presentation
      Kyoto
    • Related Report
      2012 Annual Research Report
  • [Presentation] Raman spectroscopy for strain measurement in state-of-the-art LSI2012

    • Author(s)
      A. Ogura
    • Organizer
      International Conference on Solid State Devices and Materials
    • Place of Presentation
      Kyoto
    • Related Report
      2012 Annual Research Report
    • Invited
  • [Presentation] Polarized Dependence of Intensity from Strained Si on Insulator in Tip-Enhanced Raman Spectroscopy2012

    • Author(s)
      D. Kosemura
    • Organizer
      International Conference on Raman Spectroscopy
    • Place of Presentation
      Bangalore
    • Related Report
      2012 Annual Research Report
  • [Presentation] Evaluation of Stress Relaxation in Mesa-shaped Strained Si Layer by Super-resolution Raman Spectroscopy2012

    • Author(s)
      M. Tomita
    • Organizer
      International Conference on Raman Spectroscopy
    • Place of Presentation
      Bangalore
    • Related Report
      2012 Annual Research Report
  • [Presentation] High-mobility and Low-parasitic Resistance Characteristics in Strained Ge Nanowire pMOSFETs with Metal Source/Drain Structure Formed by Doping-free Processes2012

    • Author(s)
      K. Ikeda
    • Organizer
      Symposium on VLSI Technology and circuit
    • Place of Presentation
      Hawaii
    • Related Report
      2012 Annual Research Report
  • [Presentation] Characterization of anisotropic strain relaxation after mesa isolation for strained SGOI and SiGe/Si structure with newly developed high-NA and oil-immersion Raman method2012

    • Author(s)
      K. Usuda
    • Organizer
      International SiGe Technology and Device Meeting
    • Place of Presentation
      Berkley
    • Related Report
      2012 Annual Research Report
  • [Presentation] 局所表面プラズモン共鳴を用いたラマン分光法による歪Si基板の応力評価2012

    • Author(s)
      橋口裕樹
    • Organizer
      応用物理学会学術会議
    • Place of Presentation
      愛媛
    • Related Report
      2012 Annual Research Report
  • [Presentation] EBSP法を用いたSiGe/Siメサ構造における異方性応力緩和評価2012

    • Author(s)
      長坂将也
    • Organizer
      応用物理学会学術会議
    • Place of Presentation
      愛媛
    • Related Report
      2012 Annual Research Report
  • [Presentation] ラマン分光法による超薄膜SOIフォノン閉じ込めの評価2012

    • Author(s)
      武井宗久
    • Organizer
      応用物理学会学術会議
    • Place of Presentation
      愛媛
    • Related Report
      2012 Annual Research Report
  • [Presentation] SSOI微細構造における異方性応力緩和の膜厚依存性評価2012

    • Author(s)
      シティノルヒダヤー チェモハマドユソフ
    • Organizer
      応用物理学会学術会議
    • Place of Presentation
      愛媛
    • Related Report
      2012 Annual Research Report
  • [Presentation] 有限要素法による微細構造歪SSOI層の応力緩和に対する膜厚依存性の評価2012

    • Author(s)
      富田基裕
    • Organizer
      応用物理学会学術会議
    • Place of Presentation
      愛媛
    • Related Report
      2012 Annual Research Report
  • [Presentation] 不純物注入レスプロセスにより形成したひずみGeナノワイヤ メタルソース・ドレインpMOSFET (I) -ひずみGeナノワイヤチャネルのホール移動度特性-2012

    • Author(s)
      池田圭司
    • Organizer
      応用物理学会学術会議
    • Place of Presentation
      愛媛
    • Related Report
      2012 Annual Research Report
  • [Presentation] 不純物注入レスプロセスにより形成したひずみGeナノワイヤ メタルソース・ドレインpMOSFET (II) -メタルソース・ドレインによる寄生抵抗低減効果と短チャネルデバイス特性評価-2012

    • Author(s)
      池田圭司
    • Organizer
      応用物理学会学術会議
    • Place of Presentation
      愛媛
    • Related Report
      2012 Annual Research Report
  • [Presentation] 微細構造Si1-xGexに印加された異方性応力の加工形状およびGe濃度依存性2012

    • Author(s)
      小瀬村大亮
    • Organizer
      応用物理学会学術会議
    • Place of Presentation
      愛媛
    • Related Report
      2012 Annual Research Report
  • [Presentation] 高NA、油浸ラマン分光によるメサ分離ひずみSGOI層の異方性ひずみ評価2012

    • Author(s)
      臼田宏治
    • Organizer
      応用物理学会学術会議
    • Place of Presentation
      愛媛
    • Related Report
      2012 Annual Research Report
  • [Presentation] Evaluation of Anisotropic Strain Relaxation in SSOI Nanostructure by Oil-Immersion Raman Spectroscopy2011

    • Author(s)
      Daisuke Kosemura, Motohiro Tomita, Koji Usuda, Atsushi Ogura
    • Organizer
      International Conference on Solid State Device and Materials
    • Place of Presentation
      Nagoya, Japan
    • Year and Date
      2011-09-29
    • Related Report
      2011 Annual Research Report
  • [Presentation] Channel Strain measurements in 32-nm-node CMOSFETs2011

    • Author(s)
      Munehisa Takei, Hiroki Hashiguchi, Takuya Yamaguchi, Daisuke Kosemura, Kohki Nagata, Atsushi Ogura
    • Organizer
      International Conference on Solid State Device and Materials
    • Place of Presentation
      Nagoya, Japan
    • Year and Date
      2011-09-29
    • Related Report
      2011 Annual Research Report
  • [Book] Advanced Aspects of Spectroscopy2012

    • Author(s)
      D. Kosemura
    • Total Pages
      32
    • Publisher
      InTech, Croatia
    • Related Report
      2012 Annual Research Report

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Published: 2011-09-05   Modified: 2019-07-29  

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