コールドスプレー法による高品位可視光応答光触媒膜形成技術の確立

• Project/Area Number: 23K04437
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Multi-year Fund
• Section: 一般
• Review Section: Basic Section 26050:Material processing and microstructure control-related
• Research Institution: Toyohashi University of Technology
• Principal Investigator: 山田 基宏 豊橋技術科学大学, 工学(系)研究科(研究院), 助教 (00432295)
• Project Period (FY): 2023-04-01 – 2026-03-31
• Project Status: Declined (Fiscal Year 2023)
• Budget Amount: ¥4,680,000 (Direct Cost: ¥3,600,000、Indirect Cost: ¥1,080,000); Fiscal Year 2025: ¥1,170,000 (Direct Cost: ¥900,000、Indirect Cost: ¥270,000); Fiscal Year 2024: ¥1,690,000 (Direct Cost: ¥1,300,000、Indirect Cost: ¥390,000); Fiscal Year 2023: ¥1,820,000 (Direct Cost: ¥1,400,000、Indirect Cost: ¥420,000)