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Research of ultra-low power switching devices based on ferroelectric kappa-Ga2O3

Research Project

Project/Area Number 23K22797
Project/Area Number (Other) 22H01527 (2022-2023)
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeMulti-year Fund (2024)
Single-year Grants (2022-2023)
Section一般
Review Section Basic Section 21050:Electric and electronic materials-related
Research InstitutionKyoto Institute of Technology

Principal Investigator

西中 浩之  京都工芸繊維大学, 電気電子工学系, 准教授 (70754399)

Co-Investigator(Kenkyū-buntansha) 池永 訓昭  金沢工業大学, 工学部, 准教授 (30512371)
蓮池 紀幸  京都工芸繊維大学, 電気電子工学系, 助教 (40452370)
上田 修  明治大学, 研究・知財戦略機構(生田), 研究推進員(客員研究員) (50418076)
宮戸 祐治  龍谷大学, 先端理工学部, 准教授 (80512780)
Project Period (FY) 2022-04-01 – 2025-03-31
Project Status Granted (Fiscal Year 2024)
Budget Amount *help
¥17,680,000 (Direct Cost: ¥13,600,000、Indirect Cost: ¥4,080,000)
Fiscal Year 2024: ¥4,290,000 (Direct Cost: ¥3,300,000、Indirect Cost: ¥990,000)
Fiscal Year 2023: ¥4,290,000 (Direct Cost: ¥3,300,000、Indirect Cost: ¥990,000)
Fiscal Year 2022: ¥9,100,000 (Direct Cost: ¥7,000,000、Indirect Cost: ¥2,100,000)
Keywords酸化ガリウム / ミストCVD法 / 強誘電体 / 混晶 / 結晶成長 / ミストCVD / 高移動度トランジスタ / 単一ドメイン
Outline of Research at the Start

本研究は超低消費電力の高周波スイッチングデバイスの確立に向けて、酸化ガリウムの結晶多形の一つであるκ型の開拓を行う。このκ型は酸化ガリウムの中で唯一強誘電性を持ち、大きな自発分極を有する。この強誘電性を利用した新構造の低消費スイッチングデバイスの検討をする。本研究期間で大きな自発分極を利用した高濃度の二次元電子ガスの形成の実証と、強誘電性を利用したノーマリーオフ型のヘテロ接合型のデバイスの実証を行う。また、このκ型の酸化ガリウムの基礎物性を解明して、デバイス/材料の両面から半導体材料としての可能性を開拓する。

Outline of Annual Research Achievements

本研究では、酸化ガリウム(Ga2O3)の中で唯一分極をもつ強誘電体のκ-Ga2O3の高電子移動度トランジスタ(HEMT)を形成して、GaNを超える高周波デバイスが実現できるかどうかを明らかにする。その検討では、GaNを超える大きな分極を利用した高濃度の二次元電子ガスの実証、その二次元電子ガスを用いたHEMT動作の実証、強誘電体特性を利用したノーマリーオフ動作の実証、κ-Ga2O3の基礎物性の解明の検討を進める。
二次元電子ガスの実証に向けて、κ-Ga2O3/κ-(InxGa1-x)2O3とκ-(AlxGa1-x)2O3/κ-Ga2O3の積層構造を形成し、コヒーレント成長することに成功した。コヒーレント成長したものの電気特性評価がまだできていない。これは電極のオーミック特性などが十分でないためである。また、ε-GaFeO3基板からのFeの拡散の影響を低減するために格子整合するκ-(InxGa1-x)2O3の厚膜化の検討を行った。格子整合するため厚膜化してもクラックなどが導入されないことが分かった。現在はこの厚膜化したκ-(InxGa1-x)2O3の電気特性の評価や積層膜の形成の検討を行っている。
また、κ-Ga2O3はGa2O3の準安定相の一つであるが、他の準安定相のδ-Ga2O3の形成を行い、その物性評価を進めている。そのバンドギャップは4.9~5.0 eV程度であることがPLE測定などから明らかにした。また、フォトディテクタ動作の検討を行い、このδ-Ga2O3が半導体であることを初めて実証した。

Current Status of Research Progress
Current Status of Research Progress

3: Progress in research has been slightly delayed.

Reason

ヘテロ接合の形成まで達成したものの、まだ電気特性評価ができていない。電気特性評価を妨げているのは、十分なオーミック特性が取れていないことなとが考えられるため、今後RTAによるオーミック特性の改善などを行い、二次元電子ガスの検証を進めていく。
一方でκ-Ga2O3の基礎物性評価は順調に進んでいる。単一ドメインのラマン測定やPL/PLE測定などを国外の研究機関と共同研究しており、従来の回転ドメインがある結晶では得られなかった結果が得られてきている。また、ε-GaFeO3上のGa2O3の欠陥評価も進めており、臨界膜厚の評価や転位評価も進めている。これらの結果は単一ドメインのκ-Ga2O3しか行うことができず、本研究によって明らかにできている。さらにε-GaFeO3上のMBE成長したGa2O3の検討なども国外の研究機関と共同研究で行っている。

Strategy for Future Research Activity

κ-(InxGa1-x)2O3の厚膜を形成することでFeの拡散の影響を低減することに成功しているため、このκ-(InxGa1-x)2O3を利用して、ヘテロ接合を形成し、まずは二次元電子ガスの実証を進めていく。二次元電子ガスが実証できれば、その後高電子移動度トランジスタの作製を行い、その動作実証、評価を進めていく。
また、κ-(InxGa1-x)2O3の厚膜化によって、単一ドメインのκ-Ga2O3の導電性の評価も可能となった。κ-Ga2O3系の物性評価としてドナー添加による導電性の制御の検討も進め、その電気的特性評価を
また、基礎物性の解明について、転位評価では平面TEM評価を行うことで転位の同定を進めていく。また、ε-GaFeO3上のκ-Ga2O3の臨界膜厚の評価、ラマン分光評価、PL/PLE評価なども継続評価していく。

Report

(2 results)
  • 2023 Annual Research Report
  • 2022 Annual Research Report
  • Research Products

    (61 results)

All 2024 2023 2022 Other

All Int'l Joint Research (7 results) Journal Article (15 results) (of which Int'l Joint Research: 1 results,  Peer Reviewed: 15 results,  Open Access: 7 results) Presentation (37 results) (of which Int'l Joint Research: 15 results,  Invited: 4 results) Patent(Industrial Property Rights) (2 results)

  • [Int'l Joint Research] パルマ大学(イタリア)

    • Related Report
      2023 Annual Research Report
  • [Int'l Joint Research] ポールドルーデ研究所/ベルリン工科大学(ドイツ)

    • Related Report
      2023 Annual Research Report
  • [Int'l Joint Research] バレンシア大学(スペイン)

    • Related Report
      2023 Annual Research Report
  • [Int'l Joint Research] パルマ大学(イタリア)

    • Related Report
      2022 Annual Research Report
  • [Int'l Joint Research] ポールドルーデ研究所(ドイツ)

    • Related Report
      2022 Annual Research Report
  • [Int'l Joint Research] ベルリン工科大学(ドイツ)

    • Related Report
      2022 Annual Research Report
  • [Int'l Joint Research] バレンシア大学(スペイン)

    • Related Report
      2022 Annual Research Report
  • [Journal Article] Crystallographic and band structure analysis of β-(AlxGa1-x)2O3/β-(InyGa1-y)2O3 thin film grown on β-Ga2O3 substrate via mist CVD2024

    • Author(s)
      Kaneko Masahiro、Nishinaka Hiroyuki、Yoshimoto Masahiro
    • Journal Title

      AIP Advances

      Volume: 14 Issue: 4 Pages: 045102-045102

    • DOI

      10.1063/5.0190684

    • Related Report
      2023 Annual Research Report
    • Peer Reviewed / Open Access
  • [Journal Article] Demonstration of vertical schottky barrier diodes based on α-Ga2O3 thin films enabled by corundum structured rh-ITO bottom electrodes2024

    • Author(s)
      Shimazoe Kazuki、Nishinaka Hiroyuki、Yoshimoto Masahiro
    • Journal Title

      MRS Advances

      Volume: - Issue: 9 Pages: 646-650

    • DOI

      10.1557/s43580-024-00785-5

    • Related Report
      2023 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Heteroepitaxial growth of a-, m-, and r-plane α-Ga2O3 thin films on rh-ITO electrodes for vertical device applications2024

    • Author(s)
      Shimazoe Kazuki、Nishinaka Hiroyuki、Yoshimoto Masahiro
    • Journal Title

      Journal of Crystal Growth

      Volume: 630 Pages: 127596-127596

    • DOI

      10.1016/j.jcrysgro.2024.127596

    • Related Report
      2023 Annual Research Report
    • Peer Reviewed
  • [Journal Article] High conductivity of n-type β-Ga2O3(010) thin films achieved through Si doping by mist chemical vapor deposition2024

    • Author(s)
      Hosaka Shoma、Nishinaka Hiroyuki、Ogawa Temma、Miyake Hiroki、Yoshimoto Masahiro
    • Journal Title

      AIP Advances

      Volume: 14 Issue: 1 Pages: 015040-015040

    • DOI

      10.1063/5.0182448

    • Related Report
      2023 Annual Research Report
    • Peer Reviewed / Open Access
  • [Journal Article] Electronic Materials Accelerating the Development of Ubiquitous Devices2023

    • Author(s)
      NISHINAKA Hiroyuki
    • Journal Title

      Journal of the Society of Materials Science, Japan

      Volume: 72 Issue: 10 Pages: 750-756

    • DOI

      10.2472/jsms.72.750

    • ISSN
      0514-5163, 1880-7488
    • Year and Date
      2023-10-15
    • Related Report
      2023 Annual Research Report
    • Peer Reviewed / Open Access
  • [Journal Article] TEM characterization of defects in κ-(InxGa1-x)2O3 thin film grown on (001) FZ-grown ε-GaFeO3 substrate by mist CVD2023

    • Author(s)
      Ueda Osamu、Nishinaka Hiroyuki、Ikenaga Noriaki、Hasuike Noriyuki、Yoshimoto Masahiro
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 62 Issue: 12 Pages: 125501-125501

    • DOI

      10.35848/1347-4065/ad07fb

    • Related Report
      2023 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Epitaxial Growth of δ‐Ga2O3 Thin Films Grown on YSZ and Sapphire Substrates Using β‐Fe2O3 Buffer Layers via Mist Chemical Vapor Deposition2023

    • Author(s)
      Kato Takahiro、Nishinaka Hiroyuki、Shimazoe Kazuki、Yoshimoto Masahiro
    • Journal Title

      physica status solidi (a)

      Volume: - Issue: 13 Pages: 2300582-2300582

    • DOI

      10.1002/pssa.202300582

    • Related Report
      2023 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Vertical self-powered ultraviolet photodetector using α-Ga2O3 thin films on corundum structured rh-ITO electrodes2023

    • Author(s)
      Shimazoe Kazuki、Nishinaka Hiroyuki、Taniguchi Yoko、Kato Takahiro、Kanegae Kazutaka、Yoshimoto Masahiro
    • Journal Title

      Materials Letters

      Volume: 341 Pages: 134282-134282

    • DOI

      10.1016/j.matlet.2023.134282

    • Related Report
      2023 Annual Research Report 2022 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Corundum-structured α-Fe2O3 substrates for α-Ga2O3 epitaxial growth2023

    • Author(s)
      Nishinaka Hiroyuki、Shimazoe Kazuki、Kanegae Kazutaka、Yoshimoto Masahiro
    • Journal Title

      Materials Letters

      Volume: 336 Pages: 133784-133784

    • DOI

      10.1016/j.matlet.2022.133784

    • Related Report
      2022 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Coherent growth of β-(AlxGa1-x)2O3 alloy thin films on (010) β-Ga2O3 substrates using mist CVD2023

    • Author(s)
      Kaneko Masahiro、Nishinaka Hiroyuki、Kanegae Kazutaka、Yoshimoto Masahiro
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 62 Issue: SF Pages: SF1002-SF1002

    • DOI

      10.35848/1347-4065/acb065

    • Related Report
      2022 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Homoepitaxial growth of Ge doped β-gallium oxide thin films by mist chemical vapor deposition2023

    • Author(s)
      Ogawa Temma、Nishinaka Hiroyuki、Shimazoe Kazuki、Nagaoka Tatsuji、Miyake Hiroki、Kanegae Kazutaka、Yoshimoto Masahiro
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 62 Issue: SF Pages: SF1016-SF1016

    • DOI

      10.35848/1347-4065/acba25

    • Related Report
      2022 Annual Research Report
    • Peer Reviewed / Open Access
  • [Journal Article] Demonstration of Bixbyite-Structured δ-Ga2O3 Thin Films Using β-Fe2O3 Buffer Layers by Mist Chemical Vapor Deposition2023

    • Author(s)
      Kato Takahiro、Nishinaka Hiroyuki、Shimazoe Kazuki、Kanegae Kazutaka、Yoshimoto Masahiro
    • Journal Title

      ACS Applied Electronic Materials

      Volume: 5 Issue: 3 Pages: 1715-1720

    • DOI

      10.1021/acsaelm.2c01750

    • Related Report
      2022 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Impact of α-Fe<sub>2</sub>O<sub>3</sub> Buffer Layer Growth Time on the α-Ga<sub>2</sub>O<sub>3</sub> Grown on LiTaO<sub>3</sub> Substrates2022

    • Author(s)
      SHIMAZOE Kazuki、NISHINAKA Hiroyuki、ARATA Yuta、YOSHIMOTO Masahiro
    • Journal Title

      Journal of the Society of Materials Science, Japan

      Volume: 71 Issue: 10 Pages: 830-834

    • DOI

      10.2472/jsms.71.830

    • ISSN
      0514-5163, 1880-7488
    • Year and Date
      2022-10-15
    • Related Report
      2022 Annual Research Report
    • Peer Reviewed / Open Access
  • [Journal Article] Growth of indium-incorporated κ-Ga2O3 thin film lattice-matched to the ε-GaFeO3 substrate2022

    • Author(s)
      Nishinaka Hiroyuki、Ueda Osamu、Ikenaga Noriaki、Hasuike Noriyuki、Yoshimoto Masahiro
    • Journal Title

      Materials Letters: X

      Volume: 14 Pages: 100149-100149

    • DOI

      10.1016/j.mlblux.2022.100149

    • Related Report
      2022 Annual Research Report
    • Peer Reviewed / Open Access
  • [Journal Article] Thermodynamically metastable α-, ε- (or κ-), and γ-Ga2O3: From material growth to device applications2022

    • Author(s)
      Biswas Mahitosh、Nishinaka Hiroyuki
    • Journal Title

      APL Materials

      Volume: 10 Issue: 6 Pages: 060701-060701

    • DOI

      10.1063/5.0085360

    • Related Report
      2022 Annual Research Report
    • Peer Reviewed / Open Access / Int'l Joint Research
  • [Presentation] Mist CVD for tailoring five polymorphs via epitaxial techniques2024

    • Author(s)
      H. Nishinaka,
    • Organizer
      SPIE Photonics West
    • Related Report
      2023 Annual Research Report
    • Int'l Joint Research / Invited
  • [Presentation] 可視光応答型光触媒応用に向けた Bi 添加In2O3 薄膜およびナノロッドの作製とその光学特性評価2024

    • Author(s)
      谷口陽子,西中浩之,島添和樹,川原村敏幸,鐘ケ江一孝,吉本昌広
    • Organizer
      材料学会半導体エレクロトニクス部門委員会第3回研究会
    • Related Report
      2023 Annual Research Report
  • [Presentation] Vertical α-Ga2O3 Device Applications Enabled by Same Crystal Structured Indium Tin Oxide Electrode via Mist Chemical Vapor Deposition2023

    • Author(s)
      K. Shimazoe, H. Nishinaka, T. Ogawa, and M. Yoshimoto
    • Organizer
      2023 MRS Fall Meeting
    • Related Report
      2023 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Comparative Study of Temperature-Dependent Bandgap Transitions in Ga2O3 Polymorphs2023

    • Author(s)
      Benjamin M. Janzen, N. Hajizadeh, M. Meiner, M, Marggraf, C. Hartung, Z. Galazka, P. Mazzolini, A. Sacchi, R. Fornari, C. Petersen, H. von Wenckstern, M. Grundmann, E. Kluth, M. Feneberg, R. Goldhahn, T. Oshima, T. Kato, H. Nishinaka, J. Varley, M. Wagner
    • Organizer
      The 6th U.S. Galium Oxide Workshop
    • Related Report
      2023 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Mist chemical vapor deposition of α-Ga2O3 and α-Fe2O3 thin films on corundum-structured rh-ITO electrode2023

    • Author(s)
      K. Shimazoe, H. Nishinaka, T. Kato, Y. Taniguchi, and M. Yoshimoto
    • Organizer
      International Conference on Crystal Growth and Epitaxy 20th
    • Related Report
      2023 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Tailoring Five Polymorphs of Ga2O3 using Mist CVD"2023

    • Author(s)
      H. Nishinaka, K. Shimazoe, M. Kaneko, T. Ogawa, T. Kato, Y. Taniguchi, and M. Yoshimoto
    • Organizer
      Ultra-wide bandgap oxides 2023
    • Related Report
      2023 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Incorporation of Bismuth into In2O3 and Ga2O3 thin films to introduce intermediate levels2023

    • Author(s)
      Y. Taniguchi, H. Nishinaka, K. Shimazoe, T. Kawaharamura, and M. Yoshimoto
    • Organizer
      Ultra-wide bandgap oxides 2023,
    • Related Report
      2023 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Epitaxial growth of δ-Ga2O3 thin films using β-Fe2O3 buffer layers grown on YSZ and sapphire substrates by mist CVD2023

    • Author(s)
      T. Kato, H. Nishinaka, K. Shimazoe, and M. Yoshimoto
    • Organizer
      Compound Semiconductor Week 2023
    • Related Report
      2023 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Visible-light absorption of In2O3 thin films and nanorods by incorporation of Bismuth for visible light-responsive photocatalyst2023

    • Author(s)
      Y. Taniguchi, H. Nishinaka, K. Shimazoe, T. Kawaharamura, K. Kanegae, and M. Yoshimoto
    • Organizer
      European Materials Research Society 2023 Spring Meeting
    • Related Report
      2023 Annual Research Report
    • Int'l Joint Research
  • [Presentation] α-(Ga,Fe)2O3光電極のミストCVD成長とその評価2023

    • Author(s)
      近藤良,島添和樹, 西中浩之,吉本昌広
    • Organizer
      第52回結晶成長国内会議(JCCG-52)
    • Related Report
      2023 Annual Research Report
  • [Presentation] コランダム構造酸化物ヘテロ構造のミストCVD成長とデバイス応用2023

    • Author(s)
      島添和樹, 西中浩之,吉本昌広
    • Organizer
      第52回結晶成長国内会議(JCCG-52)
    • Related Report
      2023 Annual Research Report
  • [Presentation] ミスト CVD 法によるビックスバイト構造 δ-Ga2O3 薄膜を用いた紫外光検出器2023

    • Author(s)
      加藤貴大, 西中浩之, 島添和樹,吉本昌広
    • Organizer
      第20回薄膜材料デバイス研究会
    • Related Report
      2023 Annual Research Report
  • [Presentation] Realizing Vertical Corundum-Structured Oxide Devices with Rhombohedral Indium Tin Oxide Bottom Electrode2023

    • Author(s)
      島添和樹,西中浩之, 吉本昌広
    • Organizer
      The 42th Electronic Materials Symposium
    • Related Report
      2023 Annual Research Report
  • [Presentation] ミストCVDによるSiドープβ-Ga2O3薄膜のホモエピタキシャル成長2023

    • Author(s)
      保坂祥馬,西中浩之,小川典真,三宅裕樹,吉本昌広
    • Organizer
      第84回応用物理学会秋季学術講演会
    • Related Report
      2023 Annual Research Report
  • [Presentation] (001) FZ成長ε-GaFeO3基板上にミストCVD成長したκ-(InxGa1-x)2O3薄膜中の欠陥のTEM評価2023

    • Author(s)
      上田修, 西中浩之,池永訓昭, 蓮池紀幸,吉本昌広
    • Organizer
      第70回応用物理学会春季学術講演会
    • Related Report
      2022 Annual Research Report
  • [Presentation] ミストCVD法による(001) β-Ga2O3薄膜のホモエピタキシャル成長2023

    • Author(s)
      上田遼, 西中浩之,永岡達司, 三宅裕樹,吉本昌広
    • Organizer
      第70回応用物理学会春季学術講演会
    • Related Report
      2022 Annual Research Report
  • [Presentation] α-Ga2O3/rh-ITO構造のヘテロエピタキシャル成長と深紫外フォトディテクタの試作2023

    • Author(s)
      島添和樹, 西中浩之,加藤貴大, 谷口陽子,鐘ケ江一孝,吉本昌広
    • Organizer
      第70回応用物理学会春季学術講演会
    • Related Report
      2022 Annual Research Report
  • [Presentation] Ga2O3の結晶成長とその特性評価:HEMT応用が期待される新規相のκ-Ga2O32023

    • Author(s)
      西中浩之
    • Organizer
      (独)日本学術振興会第R032委員会 第11 回研究会「パワー関連半導体の将来展望」
    • Related Report
      2022 Annual Research Report
    • Invited
  • [Presentation] Alloying β-(AlxGa1-x)2O3 thin films grown on (010) β-Ga2O3 substrates by mist CVD2022

    • Author(s)
      K. Kaneko, H. Nishinaka, Y. Kajita, K. Kanegae, and M. Yoshimoto
    • Organizer
      The 2022 International Meeting for Future of Electron Decives, Kansai
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] TEM characterization of defects in κ-(Ga1-xInx)2O3 thin film grown on (001) FZ-grown ε-GaFeO3 substrate by Mist CVD2022

    • Author(s)
      O. Ueda, H. Nishinaka, N. Ikenaga, N. Hasuike, and M. Yoshimoto
    • Organizer
      The 4th International Workshop on Gallium Oxide and Related Materials
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Epitaxial growth of β-(AlxGa1-x)2O3 and β-(InxGa1-x)2O3 alloy thin films on (010) β-Ga2O3 substrates via mist chemical vapor deposition2022

    • Author(s)
      M. Kaneko, H. Nishinaka, Y. Kajita, and M. Yoshimoto
    • Organizer
      The 4th International Workshop on Gallium Oxide and Related Materials
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Demonstration of δ-Ga2O3 epitaxial thin films using β-Fe2O3 buffer layers by mist CVD2022

    • Author(s)
      T. Kato, H. Nishinaka, K.Shimazoe, and M. Yoshimoto
    • Organizer
      The 4th International Workshop on Gallium Oxide and Related Materials
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Homoepitaxial growth of Ge-doped β-Ga2O3 films by mist chemical vapor deposition2022

    • Author(s)
      T. Ogawa, H. Nishinaka, K.Shimazoe, T. Nagaoka, H. Miyake, and M. Yoshimoto
    • Organizer
      The 4th International Workshop on Gallium Oxide and Related Materials
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Single-domain κ-Ga2O3 thin films grown on ε-GaFeO3 substrates by mist CVD2022

    • Author(s)
      H. Nishinaka, O. Ueda, N. Ikenaga, N. Hasuike, and M. Yoshimoto
    • Organizer
      The 4th International Workshop on Gallium Oxide and Related Materials
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research / Invited
  • [Presentation] Epitaxial growth of Mo-doped Indium Oxide (IMO) thin film on (111)YSZ by mist chemical vapor deposition.2022

    • Author(s)
      T. Ishino, K. Shimazoe, H. Nishinaka, and M. Yoshimoto
    • Organizer
      8th International Symposium on Transparent Conductive Materials and 12th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics
    • Related Report
      2022 Annual Research Report
    • Int'l Joint Research
  • [Presentation] ミストCVD法によるYSZ基板上アンドープおよびSnドープhexagonal-InGaO3混晶薄膜のエピタキシャル成長2022

    • Author(s)
      小倉有莉, 新田悠汰, 池之上卓己, 鐘ケ江一孝 ,西中浩之, 吉本 昌広
    • Organizer
      第32回日本MRS年次大会
    • Related Report
      2022 Annual Research Report
  • [Presentation] ミストCVD法を用いた(010)β-Ga2O3基板上へのβ-(AlxGa1-x)2O3/β-(InxGa1-x)2O3薄膜の成長2022

    • Author(s)
      金子真大,西中浩之,鐘ケ江一孝,吉本昌広
    • Organizer
      2022年度材料学会半導体エレクロトニクス部門委員会第2回研究会, 2022年度第1回ナノ材料部門委員会第1回研究会
    • Related Report
      2022 Annual Research Report
  • [Presentation] 酸化ガリウムの薄膜形成技術とその開発動向2022

    • Author(s)
      西中浩之
    • Organizer
      薄膜材料デバイス研究会第19回研究集会
    • Related Report
      2022 Annual Research Report
    • Invited
  • [Presentation] Visible-light responsive photocatalyst of Bismuth incorporation into In2O3 thin films by mist CVD2022

    • Author(s)
      谷口陽子, 西中浩之,島添和樹,川原村敏幸,鐘ケ江一孝, 吉本昌広
    • Organizer
      The 41th Electronic Materials Symposium
    • Related Report
      2022 Annual Research Report
  • [Presentation] Epitaxial growth of bixbyite structured delta-Ga2O3 thin films using the same structured beta-Fe2O3 buffer layers by Mist CVD2022

    • Author(s)
      加藤貴大, 西中浩之,島添和樹,鐘ケ江一孝, 吉本昌広
    • Organizer
      The 41th Electronic Materials Symposium
    • Related Report
      2022 Annual Research Report
  • [Presentation] Epitaxial growth of β-(AlxGa1-x)2O3 thin films on (010) β-Ga2O3 substrates by mist CVD2022

    • Author(s)
      金子真大, 西中浩之, 鐘ケ江一孝, 吉本昌広
    • Organizer
      The 41th Electronic Materials Symposium
    • Related Report
      2022 Annual Research Report
  • [Presentation] ミストCVD法によるGeドープβ-Ga2O3薄膜のホモエピタキシャル成長2022

    • Author(s)
      小川典真, 西中浩之, 島添和樹, 鐘ケ江一孝, 吉本昌広
    • Organizer
      第83回応用物理学会秋季学術講演会
    • Related Report
      2022 Annual Research Report
  • [Presentation] ミストCVD法によるβ-Fe2O3バッファ層を用いたδ-Ga2O3のエピタキシャル成長2022

    • Author(s)
      加藤貴大, 西中浩之, 島添和樹, 鐘ケ江一孝, 吉本昌広
    • Organizer
      第83回応用物理学会秋季学術講演会
    • Related Report
      2022 Annual Research Report
  • [Presentation] ミストCVD法によるβ-(AlxGa1-x)2O3/β-(InxGa1-x)2O3/β-Ga2O3薄膜のヘテロエピタキシャル成長2022

    • Author(s)
      金子真大, 西中浩之, 鐘ケ江一孝, 吉本昌広
    • Organizer
      第83回応用物理学会秋季学術講演会
    • Related Report
      2022 Annual Research Report
  • [Presentation] ε-GaFeO3基板を用いた単一ドメインκ-Ga2O3の成長2022

    • Author(s)
      西中浩之, 上田修, 迫秀樹, 池永訓昭, 宮戸祐治, 蓮池紀幸, 鐘ケ江一孝, 吉本昌広
    • Organizer
      第83回応用物理学会秋季学術講演会
    • Related Report
      2022 Annual Research Report
  • [Presentation] Bi添加In2O3薄膜による可視光応答型光触媒反応の評価2022

    • Author(s)
      谷口陽子, 島添和樹, 西中浩之, 川原村敏幸, 鐘ケ江一孝, 吉本昌広
    • Organizer
      第83回応用物理学会秋季学術講演会
    • Related Report
      2022 Annual Research Report
  • [Presentation] コランダム構造を有するrh-ITO上へのHfxZr1-xO2薄膜のミストCVD成長とその評価2022

    • Author(s)
      島添和樹,藤原悠希,田中将,西中浩之,吉本 昌広,野田実
    • Organizer
      第39回強誘電体会議
    • Related Report
      2022 Annual Research Report
  • [Patent(Industrial Property Rights)] 複合基板、半導体装置および複合基板の製造方法2023

    • Inventor(s)
      西中浩之
    • Industrial Property Rights Holder
      西中浩之
    • Industrial Property Rights Type
      特許
    • Industrial Property Number
      2023-129326
    • Filing Date
      2023
    • Related Report
      2023 Annual Research Report
  • [Patent(Industrial Property Rights)] 基体および基体の製造方法2022

    • Inventor(s)
      西中浩之、加藤貴大、島添和樹
    • Industrial Property Rights Holder
      西中浩之、加藤貴大、島添和樹
    • Industrial Property Rights Type
      特許
    • Industrial Property Number
      2022-084916
    • Filing Date
      2022
    • Related Report
      2022 Annual Research Report

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Published: 2022-04-19   Modified: 2024-12-25  

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