| Budget Amount *help |
¥14,430,000 (Direct Cost: ¥11,100,000、Indirect Cost: ¥3,330,000)
Fiscal Year 2014: ¥2,730,000 (Direct Cost: ¥2,100,000、Indirect Cost: ¥630,000)
Fiscal Year 2013: ¥2,600,000 (Direct Cost: ¥2,000,000、Indirect Cost: ¥600,000)
Fiscal Year 2012: ¥9,100,000 (Direct Cost: ¥7,000,000、Indirect Cost: ¥2,100,000)
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| Outline of Final Research Achievements |
The amorphous carbon film deposition was investigated during plasma-enhanced chemical vapor deposition with a deuterated benzene as a source, by using in situ and real-time infrared absorption spectroscopy. A prominent peak attributed to the deuterated phenyl group was observed, indicating that the benzene ring structure is retained during the adsorption. The evolution of peaks observed during the plasma exposure suggested that the addition reaction occurs during the adsorption. The addition reaction occurs, even with applying negative bias to the substrate, while a lot of the benzene ring structures in the film were disrupted and the amount of alkane components increased, with the negative bias applied.
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