Strain and valence band structure in the subsurface region of strained semiconductors
Project/Area Number |
24360018
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Research Category |
Grant-in-Aid for Scientific Research (B)
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Allocation Type | Partial Multi-year Fund |
Section | 一般 |
Research Field |
Thin film/Surface and interfacial physical properties
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Research Institution | Nara Institute of Science and Technology |
Principal Investigator |
TAKEDA SAKURA 奈良先端科学技術大学院大学, 物質創成科学研究科, 助教 (30314537)
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Co-Investigator(Kenkyū-buntansha) |
TAKAHASHI Toshio 東京大学, 物性研究所, 教授 (20107395)
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Co-Investigator(Renkei-kenkyūsha) |
SHIRASAWA Tetsutoh 東京大学, 物性研究所, 助教 (80451889)
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Project Period (FY) |
2012-04-01 – 2015-03-31
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Project Status |
Completed (Fiscal Year 2014)
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Budget Amount *help |
¥15,730,000 (Direct Cost: ¥12,100,000、Indirect Cost: ¥3,630,000)
Fiscal Year 2014: ¥2,080,000 (Direct Cost: ¥1,600,000、Indirect Cost: ¥480,000)
Fiscal Year 2013: ¥2,860,000 (Direct Cost: ¥2,200,000、Indirect Cost: ¥660,000)
Fiscal Year 2012: ¥10,790,000 (Direct Cost: ¥8,300,000、Indirect Cost: ¥2,490,000)
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Keywords | 歪みシリコン / ARPES / XRD / LEED I-V / ラマン / 1軸歪み / 2軸歪み / 歪み効果 / 歪み半導体 / バンド構造 / 角度分解光電子分光 / ラマン分光 / 超高真空 / Raman / バンド分散 / 価電子帯 / 二軸引っ張り歪みシリコン / 一軸引っ張り歪みシリコン / X線回折法 / 角度分解光電子分光法 |
Outline of Final Research Achievements |
Strained Si is widely used in modern MOSFET to enhance carrier mobility. Theoretical studies attribute the mechanism of the mobility enhancement to band deformation by strain. We experimentally investigated the relationship between the strain and the band deformation by measuring strain and the band dispersion precisely. In the case of biaxially strained Si on SiGe alloy, we found that the epitaxial strain is retained through the strained Si layer to the very surface by XRD and LEED I-V measurements. For the strain evaluation of uniaxially strained Si by mechanical stress application in UHV, we developed UHV Raman system. Using the system, we found that the mechanically applied uniaxial stress is distributed inhomogeneously in the sample. The band structure of uni- and bi-axial strained Si was investigated by ARPES, and deformation of the band structure was observed.
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Report
(4 results)
Research Products
(60 results)
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[Journal Article] Lattice distortion of porous Si by Li absorption using two-dimensional photoelectron diffraction2013
Author(s)
E. S. Nouh, S. N. Takeda, F. Matsui, K. Hattori, T. Sakata, N. Maejima, H. Matsui, H. Matuda, T. Matsushita. L. Toth, M. Morita, S. Kitagawa, R. Ishii, M. Fujita, K. Yasuda, H. Daimon
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Journal Title
Journal of Materials Science
Volume: 49
Issue: 1
Pages: 35-42
DOI
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Peer Reviewed
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[Presentation] 半導体表面での構造振動現象2014
Author(s)
武田さくら、田中友惟、大門寛
Organizer
非線形反応と協同現象研究会
Place of Presentation
東京電機大学東京千住キャンパス(東京都足立区)
Year and Date
2014-12-06
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[Presentation] Raman spectroscopy on Uni-axially Strained Silicon2014
Author(s)
S. N. Takeda, H. Kumeda, K. Maeda, H. Momono, K. Takeuchi, H. Nakao, K. Kitagawa, T. Sakata, A. K. R. Ang, H. Daimon
Organizer
Symposium on Surface and Nano Science 2014
Place of Presentation
New Furano Prince Hotel, (Hokkaido・Furano)
Related Report
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[Presentation] Electronic Structure on Pb-Adsorbed Ge(001)2014
Author(s)
T. Sakata, S. N. Takeda, Artoni Kevin Roquero Ang, K. Kitagawa, H. Kumeda, K. Koku1, H. Nakao, K. Takeuchi, H. Momono, K. Maeda, H. Daimon
Organizer
Symposium on Surface and Nano Science 2014
Place of Presentation
New Furano Prince Hotel, (Hokkaido・Furano)
Related Report
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[Presentation] 歪み印加マニピュレータの開発2013
Author(s)
武田さくら, 坂田智裕, 山谷寛, Nur Idayu Ayob, 北川幸祐, 小久井一樹, 久米田晴香, 谷川洋平, 大門寛
Organizer
日本物理学会
Place of Presentation
広島大学東広島キャンパス
Year and Date
2013-03-28
Related Report
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[Presentation] ARPES measurement of valence band structure in strained silicon2012
Author(s)
S. N. Takeda, H. Tabata, T. Sakata, N. I. Ayob, N. Maejima, H. Matsuoka, H. Daimon, T. Inaoka, T. Tezuka, T. Katayama, M. Yoshimaru
Organizer
12th International Conference on Electron Spectro scopy andStructure
Place of Presentation
Saint Malo, France
Year and Date
2012-09-20
Related Report
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[Presentation] Effect of biaxial tensile strain on silicon valence band dispersion2012
Author(s)
S. N. Takeda, H. Tabata, T. Sakata, N. I. Ayob, N. Maejima, H. Matsuoka, T. Inaoka, K. Arima, T. Tezuka, T. Katayama, M. Yoshimaru, T. Imamura, H. Daimon
Organizer
31st International Conference on the Physics of Semiconductors
Place of Presentation
Zurich, Switzerland
Year and Date
2012-08-02
Related Report
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