• Search Research Projects
  • Search Researchers
  • How to Use
  1. Back to previous page

Multi-axial analysis of strain states introduced in nano area on Ge and SiGe super-thin films by Raman spectroscopy

Research Project

Project/Area Number 24360125
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypePartial Multi-year Fund
Section一般
Research Field Electronic materials/Electric materials
Research InstitutionMeiji University

Principal Investigator

OGURA ATSUSHI  明治大学, 理工学部, 教授 (00386418)

Co-Investigator(Kenkyū-buntansha) 廣沢 一郎 (廣澤 一郎)  公益財団法人高輝度光科学研究センター, その他部局等, 研究員 (00360834)
小瀬村 大亮  明治大学, 公私立大学の部局等, 研究員 (00608284)
Co-Investigator(Renkei-kenkyūsha) NUMASAWA Youichiro  明治大学, 研究・知財戦略機構, 研究推進員(客員研究員) (50569837)
SAWAMOTO Naomi  明治大学, 研究・知財戦略機構, 研究推進員(客員研究員) (20595087)
Research Collaborator USUDA Koji  (株)東芝
Project Period (FY) 2012-04-01 – 2017-03-31
Project Status Completed (Fiscal Year 2016)
Budget Amount *help
¥18,460,000 (Direct Cost: ¥14,200,000、Indirect Cost: ¥4,260,000)
Fiscal Year 2016: ¥3,640,000 (Direct Cost: ¥2,800,000、Indirect Cost: ¥840,000)
Fiscal Year 2015: ¥3,900,000 (Direct Cost: ¥3,000,000、Indirect Cost: ¥900,000)
Fiscal Year 2014: ¥3,510,000 (Direct Cost: ¥2,700,000、Indirect Cost: ¥810,000)
Fiscal Year 2013: ¥3,640,000 (Direct Cost: ¥2,800,000、Indirect Cost: ¥840,000)
Fiscal Year 2012: ¥3,770,000 (Direct Cost: ¥2,900,000、Indirect Cost: ¥870,000)
KeywordsSiGe / 応力・歪 / 液浸ラマン分光法 / フォノン変形ポテンシャル(PDPs) / 有限要素法(FEM) / 第一原理計算(ab initio) / 電子・電気材料 / 表面増強ラマン分光法 / 有限要素法(FEM / 有限差分時間領域法(FDTD) / 国際情報交換 / 電気・電子材料 / 応力 / 歪 / 有限要素法 / 異方性歪 / フォノン変形ポテンシャル
Outline of Final Research Achievements

Both the longitudinal optical (LO) and transverse optical (TO) phonons are indispensable for multiaxial strain analysis in ultra-thin Ge and SiGe films by Raman spectroscopy. The TO phonon, however, is hardly excited under (001) backscattering geometry due to the kimitted z-polarized component. We achieved excitation of both LO and TO phonons by oil-immersion Raman spectroscopy, which can excite the z-polarized component effectively because of high numerical aperture lens. Then, the phonon deformation potentials (PDPs) of SiGe for the whole Ge concentration range were extracted for the first time. Thus, the derived PDPs of SiGe allows us to measure complex strain states in SiGe promised as next-generation channel material.

Report

(6 results)
  • 2016 Annual Research Report   Final Research Report ( PDF )
  • 2015 Annual Research Report
  • 2014 Annual Research Report
  • 2013 Annual Research Report
  • 2012 Annual Research Report
  • Research Products

    (74 results)

All 2017 2016 2015 2014 2013 2012 Other

All Journal Article (16 results) (of which Peer Reviewed: 16 results,  Acknowledgement Compliant: 5 results,  Open Access: 3 results) Presentation (51 results) (of which Int'l Joint Research: 3 results,  Invited: 3 results) Book (1 results) Remarks (6 results)

  • [Journal Article] Examination of phonon deformation potentials for accurate strain measurements in silicon-germanium alloys with the whole composition range by Raman spectroscopy2016

    • Author(s)
      D. Kosemura, S. Yamamoto, K. Takeuchi, K. Usuda, and A. Ogura
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 55 Issue: 2 Pages: 026602-026602

    • DOI

      10.7567/jjap.55.026602

    • NAID

      210000146043

    • Related Report
      2016 Annual Research Report 2015 Annual Research Report
    • Peer Reviewed / Acknowledgement Compliant
  • [Journal Article] Origin of additional broad peaks in Raman spectra from thin germanium-rich silicon-germanium films2016

    • Author(s)
      Kazuma Takeuchi、Daisuke Kosemura, Ryo Yokogawa, Koji Usuda, and Atsushi Ogura
    • Journal Title

      Applied Physics Express

      Volume: 9 Issue: 7 Pages: 071301-071301

    • DOI

      10.7567/apex.9.071301

    • NAID

      210000137963

    • Related Report
      2016 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Biaxial stress evaluation in GeSn film epitaxially grown on Ge substrate by oil-immersion Raman spectroscopy2016

    • Author(s)
      Kazuma Takeuchi, Kohei Suda, Ryo Yokogawa, Koji Usuda, Naomi Sawamoto and Atsushi Ogura
    • Journal Title

      Jpn. J. App. Phys.

      Volume: 55 Issue: 9 Pages: 095502-095502

    • DOI

      10.7567/jjap.55.095502

    • NAID

      210000147055

    • Related Report
      2016 Annual Research Report
    • Peer Reviewed
  • [Journal Article] In-Plane Biaxial Strain Evaluation Induced in Ge1-XSnx Films Using Oil-Immersion Raman Spectroscopy2016

    • Author(s)
      K. Takeuchi, K. Suda, R. Suzuki, R. Yokogawa, N. Sawamoto, K. Usuda, and A. Ogura
    • Journal Title

      ECS Transactions

      Volume: 75 Issue: 8 Pages: 589-597

    • DOI

      10.1149/07508.0589ecst

    • Related Report
      2016 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Evaluation of Anisotropic Biaxial Stress in Si1-xGex/Ge Mesa-Structure by Oil-immersion Raman Spectroscopy2015

    • Author(s)
      S. Yamamoto, K. Takeuchi, R. Yokogawa, M. Tomita, D. Kosemura, K. Usuda, and A. Ogura
    • Journal Title

      ECS Transaction

      Volume: 66 Issue: 4 Pages: 39-45

    • DOI

      10.1149/06604.0039ecst

    • Related Report
      2015 Annual Research Report
    • Peer Reviewed / Open Access / Acknowledgement Compliant
  • [Journal Article] Biaxial Stress Evaluation in SiGe Epitaxially Grown on Ge Substrate by oil-immersion Raman Spectroscopy2015

    • Author(s)
      K. Takeuchi, D. Kosemura, S. Yamamoto, M. Tomita, K. Usuda, N. Sawamoto, and A. Ogura
    • Journal Title

      ECS Transaction

      Volume: 69 Issue: 10 Pages: 81-87

    • DOI

      10.1149/06910.0081ecst

    • Related Report
      2015 Annual Research Report
    • Peer Reviewed / Open Access / Acknowledgement Compliant
  • [Journal Article] Electrical field analysis of metal-surface plasmon resonance using a biaxially strained Si substrate2014

    • Author(s)
      Daisuke Kosemura,Siti Norhidayah binti CheMohd Yusoff and Atsushi Ogura
    • Journal Title

      J. Raman Spectrosc.

      Volume: 45 Issue: 6 Pages: 414-417

    • DOI

      10.1002/jrs.4478

    • Related Report
      2014 Annual Research Report
    • Peer Reviewed / Open Access / Acknowledgement Compliant
  • [Journal Article] Evaluation of Anisotropic Biaxial Stress in Thin Strained-SiGe Layer Using Surface Enhanced Raman Spectroscopy2014

    • Author(s)
      S. Yamamoto, D. Kosemura, M. Tomita, S. Che Mohd Yusoff, T. Kijima, R. Imai, K. Takeuchi, R. Yokogawa, K. Usuda, and A. Ogura
    • Journal Title

      ECS Transactions

      Volume: 64 Issue: 6 Pages: 841-847

    • DOI

      10.1149/06406.0841ecst

    • Related Report
      2014 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Anisotropic strain evaluation in the finite Si area by surface plasmon enhanced Raman spectroscopy2014

    • Author(s)
      A. Ogura and D. Kosemura
    • Journal Title

      ECS Transactions

      Volume: 64 Issue: 6 Pages: 67-77

    • DOI

      10.1149/06406.0067ecst

    • Related Report
      2014 Annual Research Report
    • Peer Reviewed / Acknowledgement Compliant
  • [Journal Article] Measurement of Anisotropic Biaxial Stresses in Sil-xGex /Si Mesa Structures bu Oil-Immersion Raman Spectroscopy2013

    • Author(s)
      D. Kosenura, M. Tonita. K. Usuda, T. Tezuka, and A. Ogura
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 52 Issue: 4S Pages: 04CA05-04CA05

    • DOI

      10.7567/jjap.52.04ca05

    • Related Report
      2013 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Iensor Evaluation of Anisotropic stress Relaxation in Mesa-shaped Sige Layer on Si Substpate by Electron Back Scattering Pattern Measureaent : Comparison between Raman Measurement and Finite Element Method Simulation2013

    • Author(s)
      M, Tomita, M. Nagasaka, D. Kosemura, K. Usuda, T. Tezuka, and A. Ogura
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 52 Issue: 4S Pages: 04CA06-04CA06

    • DOI

      10.7567/jjap.52.04ca06

    • Related Report
      2013 Annual Research Report
    • Peer Reviewed
  • [Journal Article] 高分解能ラマン分光測定による最先端LSIのひずみ評価2013

    • Author(s)
      小椋厚志、小瀬村大亮
    • Journal Title

      応用物理

      Volume: 82 Pages: 317-321

    • NAID

      10031159922

    • Related Report
      2013 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Channel Strain Measurement in 32-nm-Node Complementary Metal-Oxide-Semiconductor Field-Effect Transistor by Raman Spectroscopy2012

    • Author(s)
      Munehisa Takei
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 51 Issue: 4S Pages: 04DA04-04DA04

    • DOI

      10.1143/jjap.51.04da04

    • Related Report
      2012 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Investigation of Phonon DeformationPotentials in Si_<1_x>Ge_x by Oil-ImmersionRaman Spectroscopy2012

    • Author(s)
      D. Kosemura, K. Usuda, and A. Ogura
    • Journal Title

      Appl. Phys. Express

      Volume: 5 Issue: 11 Pages: 111301-111301

    • DOI

      10.1143/apex.5.111301

    • Related Report
      2012 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Evaluation of Anisotropic StrainRelaxation in Strained Silicon-on-Insulator Nanostructure by Oil-Immersion Raman Spectroscopy2012

    • Author(s)
      D. Kosemura, M. Tomita, K. Usuda, and A.Ogura
    • Journal Title

      Japanese Journal of AppliedPhysics

      Volume: 51 Issue: 2S Pages: 02BA03-02BA03

    • DOI

      10.1143/jjap.51.02ba03

    • NAID

      210000140194

    • Related Report
      2012 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Stress evaluation in thin strained-Si film by polarized Raman spectroscopy using localized surface plasmon resonance2012

    • Author(s)
      Hiroki Hashiguchi, Munehisa Takei
    • Journal Title

      Applied Physics Letters

      Volume: 101 Issue: 17

    • DOI

      10.1063/1.4761959

    • Related Report
      2012 Annual Research Report
    • Peer Reviewed
  • [Presentation] X線回折によるGe1-xSnx薄膜の組成深さ分布非破壊測定2017

    • Author(s)
      廣沢一郎、須田耕平, 澤本直美, 町田英明, 石川真人, 須藤弘, 大下祥雄, 小椋厚志
    • Organizer
      第30回日本放射光学会年会・放射光科学合同シンポジウム
    • Place of Presentation
      柏
    • Year and Date
      2017-01-08
    • Related Report
      2016 Annual Research Report
  • [Presentation] In-Plane Biaxial Strain Evaluation Induced in Ge1-XSnx Films Using Oil-Immersion Raman Spectroscopy2016

    • Author(s)
      K. Takeuchi, K. Suda, R. Suzuki, R. Yokogawa, N. Sawamoto, K. Usuda, and A. Ogura
    • Organizer
      230th ECS Meeting/Passific Rim Meeting 2016
    • Place of Presentation
      Honolulu, HI
    • Year and Date
      2016-10-06
    • Related Report
      2016 Annual Research Report
    • Invited
  • [Presentation] 用いたGe1-xSnxメサ構造における異方性2軸応力評価2016

    • Author(s)
      村上 達海、武内 一真、横川 凌、須田 耕平、石原 聖也、小椋 厚志
    • Organizer
      第77回応用物理学会秋季学術講演会
    • Place of Presentation
      新潟
    • Year and Date
      2016-09-16
    • Related Report
      2016 Annual Research Report
  • [Presentation] SiGe薄膜のラマンスペクトルに見られるブロードピークの起源の検討2016

    • Author(s)
      武内 一真、小瀬村 大亮、横川 凌、澤本 直美、臼田 宏治、小椋 厚志
    • Organizer
      第77回応用物理学会秋季学術講演会
    • Place of Presentation
      新潟
    • Year and Date
      2016-09-15
    • Related Report
      2016 Annual Research Report
  • [Presentation] Anisotropic Strain Evaluation Induced in Group IV Materials using Liquid-Immersion Raman Spectroscopy2016

    • Author(s)
      A. Ogura, and D. Kosemura
    • Organizer
      16th International Workshop on Junction Technology
    • Place of Presentation
      Shanghai, China
    • Year and Date
      2016-05-10
    • Related Report
      2016 Annual Research Report
    • Int'l Joint Research / Invited
  • [Presentation] 液浸ラマン分光法によるSi基板上歪Si:C薄膜に印加された応力評価2016

    • Author(s)
      山本 章太郎、武内 一真、石原 聖也、小椋 厚志
    • Organizer
      第63回応用物理学会春季学術講演会
    • Place of Presentation
      東京工業大学、東京
    • Year and Date
      2016-03-20
    • Related Report
      2015 Annual Research Report
  • [Presentation] 液浸ラマン分光法による歪Ge1-xSnxのフォノン変形ポテンシャル導出2016

    • Author(s)
      武内 一真、須田 耕平、山本 章太郎、横川 凌、小椋 厚志
    • Organizer
      第63回応用物理学会春季学術講演会
    • Place of Presentation
      東京工業大学、東京
    • Year and Date
      2016-03-20
    • Related Report
      2015 Annual Research Report
  • [Presentation] 分子動力学法および分子軌道法を用いたSiGe混晶内のフォノン再現に関する考察2016

    • Author(s)
      富田 基裕、小椋 厚志、渡邉 孝信
    • Organizer
      第63回応用物理学会春季学術講演
    • Place of Presentation
      東京工業大学、東京
    • Year and Date
      2016-03-20
    • Related Report
      2015 Annual Research Report
  • [Presentation] 選択的イオン注入法で作製した一軸性歪Geの異方性応力評価2016

    • Author(s)
      山本 章太郎、武内 一真、小瀬村 大亮、此島 詩織、澤野 憲太郎、小椋 厚志
    • Organizer
      第63回応用物理学会春季学術講演
    • Place of Presentation
      東京工業大学、東京
    • Year and Date
      2016-03-20
    • Related Report
      2015 Annual Research Report
  • [Presentation] Biaxial Stress Evaluation in SiGe Epitaxially Grown on Ge Substrate by oil-immersion Raman Spectroscopy2015

    • Author(s)
      K. Takeuchi, D. Kosemura, S. Yamamoto, M. Tomita, K. Usuda, N. Sawamoto, and A. Ogura
    • Organizer
      228th ECS Meeting
    • Place of Presentation
      Phoenix, Arizona
    • Year and Date
      2015-10-13
    • Related Report
      2015 Annual Research Report
    • Int'l Joint Research
  • [Presentation] EBSP法を用いたSiGe/Geナノワイヤー構造に生じる応力緩和分布の高空間分解能測定2015

    • Author(s)
      富田 基裕、武内 一真、山本 章太郎、小瀬村 大亮、臼田 宏治、小椋 厚志
    • Organizer
      第76回応用物理学会秋季学術講演会
    • Place of Presentation
      名古屋国際会議場、愛知
    • Year and Date
      2015-09-16
    • Related Report
      2015 Annual Research Report
  • [Presentation] 分子動力学法および分子軌道法を用いたSiGe混晶内の原子間ポテンシャルに関する考察2015

    • Author(s)
      富田 基裕、小椋 厚志、渡邉 孝信
    • Organizer
      第76回応用物理学会秋季学術講演会
    • Place of Presentation
      名古屋国際会議場、愛知
    • Year and Date
      2015-09-16
    • Related Report
      2015 Annual Research Report
  • [Presentation] 液浸ラマン分光法によるGe基板上Ge1-xSnx薄膜の応力評価2015

    • Author(s)
      武内 一真、山本 章太郎、横川 凌、澤本 直美、須田 耕平、 石原 聖也、小椋 厚志
    • Organizer
      第76回応用物理学会秋季学術講演会
    • Place of Presentation
      名古屋国際会議場、愛知
    • Year and Date
      2015-09-13
    • Related Report
      2015 Annual Research Report
  • [Presentation] Evaluation of Anisotropic Biaxial Stress in Si1-xGex/Ge Mesa-Structure by Oil-immersion Raman Spectroscopy2015

    • Author(s)
      S. Yamamoto, K. Takeuchi, R. Yokogawa, M. Tomita, D. Kosemura, K. Usuda, and A. Ogura
    • Organizer
      227th ECS Meeting
    • Place of Presentation
      Chicago, Illinois
    • Year and Date
      2015-05-25
    • Related Report
      2015 Annual Research Report
    • Int'l Joint Research
  • [Presentation] 高Ge濃度SiGeにおけるフォノン変形ポテンシャルの導出2015

    • Author(s)
      武内 一真、小瀬村 大亮, 山本 章太郎, 富田 基裕, 臼田 宏治, 小椋 厚志
    • Organizer
      第62回応用物理学会春季学術講演会
    • Place of Presentation
      東海大学
    • Year and Date
      2015-03-11
    • Related Report
      2014 Annual Research Report
  • [Presentation] 高Ge濃度歪SiGeメサ構造に印加された異方性2軸応力評価2015

    • Author(s)
      山本 章太郎、武内 一真, 富田 基裕, 小瀬村 大亮, 臼田 宏冶, 小椋 厚志
    • Organizer
      第62回応用物理学会春季学術講演会
    • Place of Presentation
      東海大学
    • Year and Date
      2015-03-11
    • Related Report
      2014 Annual Research Report
  • [Presentation] EBSP法を用いた微細な全Ge濃度域における歪SiGeメサ構造に生じる応力緩和分布の評価2015

    • Author(s)
      富田 基裕、小瀬村 大亮, 臼田 宏治, 小椋 厚志
    • Organizer
      第62回応用物理学会春季学術講演会
    • Place of Presentation
      東海大学
    • Year and Date
      2015-03-11
    • Related Report
      2014 Annual Research Report
  • [Presentation] Evaluation of Anisotropic Biaxial Stress in Thin Strained-SiGe Layer Using Surface Enhanced Raman Spectroscopy2014

    • Author(s)
      S. Yamamoto, D. Kosemura, S. N. C.M.Yusoff, T. Kijima, R. Imai, K. Takeuchi, R. Yokogawa, K. Usuda, and A. Ogura
    • Organizer
      2014 ECS and SMEQ Joint International Meeting
    • Place of Presentation
      Cancun, Mexico
    • Year and Date
      2014-10-09
    • Related Report
      2014 Annual Research Report
  • [Presentation] Anisotropoic Strain Evaluation in the Finite Si Area by Surface Plasmon Enhanced Raman Spectroscopy2014

    • Author(s)
      A. Ogura and D. Kosemura
    • Organizer
      2014 ECS and SMEQ Joint International Meeting
    • Place of Presentation
      Cancun, Mexico
    • Year and Date
      2014-10-06
    • Related Report
      2014 Annual Research Report
    • Invited
  • [Presentation] 液浸ラマン分光法を用いた TO/LOフォノンスペクトル励起による高 Ge濃度歪 SiGe メサ構造の異方性 2 軸応力緩和の観測2014

    • Author(s)
      山本章太郎、小瀬村大亮,富田基裕,武内一真,横川 凌,臼田宏冶,小椋厚志
    • Organizer
      第75回応用物理学会秋季学術講演会
    • Place of Presentation
      北海道大学
    • Year and Date
      2014-09-19
    • Related Report
      2014 Annual Research Report
  • [Presentation] EBSP 法を用いた微細な歪 SiGe メサ構造に生じる応力緩和分布の Ge 濃度依存性評価2014

    • Author(s)
      富田基裕、小瀬村大亮,臼田宏治,小椋厚志
    • Organizer
      第75回応用物理学会秋季学術講演会
    • Place of Presentation
      北海道大学
    • Year and Date
      2014-09-19
    • Related Report
      2014 Annual Research Report
  • [Presentation] 液浸ラマン分光法による選択的イオン注入により作製された一軸歪 SiGe/Siの異方性 2軸応力評価2014

    • Author(s)
      山本章太郎、小瀬村大亮,富田基裕,武内一真,横川 凌,米倉瑛介,澤野憲太郎,野平博司,小椋厚志
    • Organizer
      第75回応用物理学会秋季学術講演会
    • Place of Presentation
      北海道大学
    • Year and Date
      2014-09-19
    • Related Report
      2014 Annual Research Report
  • [Presentation] Evaluation of Stress Relaxation in Strained SiGe Wire by Two-dimensional Super-resolution Raman S2014

    • Author(s)
      Motohiro Tomita, Daisuke Kosemura, Koji Usuda, Tsutomu Tezuka, Atsushi Ogura
    • Organizer
      24nd International Conference on Raman Spectroscopy (23rd ICORS)
    • Place of Presentation
      Yena, Germany
    • Year and Date
      2014-08-11
    • Related Report
      2014 Annual Research Report
  • [Presentation] 舳構造歪SiGe層に生じる応力緩和分布のテンソル評価2013

    • Author(s)
      富田基裕、小瀬村大亮、臼田宏治、小椋厚志
    • Organizer
      舳構造歪SiGe層に生じる応力緩和分布のテンソル評価
    • Place of Presentation
      神奈川県
    • Year and Date
      2013-03-29
    • Related Report
      2012 Annual Research Report
  • [Presentation] プラズマ励起ALD SiN 膜構造における応力評価2013

    • Author(s)
      長坂将也、永田晃基、山口拓也、小椋厚志、陰地宏、孫珍永、広沢一郎、渡部佳優、廣田良浩
    • Organizer
      応用物理学会春季学術講演会
    • Place of Presentation
      神奈川県
    • Year and Date
      2013-03-28
    • Related Report
      2012 Annual Research Report
  • [Presentation] Anisotropic Biaxial Stress Evaluation in SiGe/Si Mesa Structures by Oil-Immersion Raman Spectroscopy2012

    • Author(s)
      D. Kosemura, MダTomita, K. Usuda, T. Tezuka, and A. Ogura
    • Organizer
      International Symposium on Advanced Science and Technology of Silicon Materials
    • Place of Presentation
      Kona, Hawaii
    • Year and Date
      2012-11-22
    • Related Report
      2012 Annual Research Report
  • [Presentation] Evaluation of Anisotropic Stress Relaxation in Mesa-shaped Strained Si Layer by Super-resolution Raman Spectroscopy and FEM Simulation2012

    • Author(s)
      M. Tomita, D. Kosemura, K. Usuda, T. Tezuka, and A. Ogura
    • Organizer
      International Symposium on Advanced Science and Technology of Silicon Materials
    • Place of Presentation
      Kona, Hawaii
    • Year and Date
      2012-11-22
    • Related Report
      2012 Annual Research Report
  • [Presentation] Evaluation of Strain relaxation at mesa edge of strained SiGe layer on Si by oil-immersion Raman spectroscopy, NBD, and FEM simulation2012

    • Author(s)
      K. Usuda, D. Kosemura, M. Tomita, A. Ogura, and T. Tezuka
    • Organizer
      International Symposium on Advanced Science and Technology of Silicon Materials
    • Place of Presentation
      Kona, Hawaii
    • Year and Date
      2012-11-22
    • Related Report
      2012 Annual Research Report
  • [Presentation] TO phonon Excitation using Surface Enhanced Raman Scattering for Stress Evaluation2012

    • Author(s)
      H. Hashiguchi, M. Takei, D. Kosemura, and A. Ogura
    • Organizer
      International Symposium on Advanced Science and Technology of Silicon Materials
    • Place of Presentation
      Kona, Hawaii
    • Year and Date
      2012-11-20
    • Related Report
      2012 Annual Research Report
  • [Presentation] Strain Evaluation in the State-of-・the-art CMOS Devices2012

    • Author(s)
      A. Ogura
    • Organizer
      Annual World Congress ofNano-S&T 2012
    • Place of Presentation
      Qingdao, China(招待講演)
    • Year and Date
      2012-10-27
    • Related Report
      2012 Annual Research Report
  • [Presentation] Measurements of Anisotropic Biaxial Stresses in x=0.15 and 0.30 Si_<1-x>Ge_x Nanostructures by Oil-Immersion Raman Spectroscopy2012

    • Author(s)
      Kyoto, Japan
    • Organizer
      International Conference on Solid State Devices and Materials
    • Place of Presentation
      Kyoto, Japan
    • Year and Date
      2012-09-27
    • Related Report
      2012 Annual Research Report
  • [Presentation] Tensor Evaluation of Anisotropic Stress Relaxation in Mesa-shaped SiGe Layer on Si Substrate by EBSP2012

    • Author(s)
      M. Tomita, M. Nagasaka, D. Kosemura, K. Usuda, T. Tezuka。and A. Ogura
    • Organizer
      International conference on Solid State Devices and Material
    • Place of Presentation
      Kyoto, Japan
    • Year and Date
      2012-09-27
    • Related Report
      2012 Annual Research Report
  • [Presentation] Raman Spectroscopy for strain measurement in state-of-the-art LSI2012

    • Author(s)
      A. Ogura
    • Organizer
      International Conference on Solid State Devices and Materials
    • Place of Presentation
      Kyoto, Japan(招待講演)
    • Year and Date
      2012-09-25
    • Related Report
      2012 Annual Research Report
  • [Presentation] 有限要素法による微細構造歪SSOI層の応力緩和に対する膜厚依存性の評価2012

    • Author(s)
      富田基裕,小瀬村大亮,臼田宏治,手塚勉,小椋厚志
    • Organizer
      秋季応用物理学会
    • Place of Presentation
      愛媛県
    • Year and Date
      2012-09-13
    • Related Report
      2012 Annual Research Report
  • [Presentation] EBSP法を用いたSiGe/Siメサ構造における異方性応力緩和評価2012

    • Author(s)
      長坂将也,富田基裕,小瀬村大亮,臼田宏治,手塚勉,小椋厚志
    • Organizer
      秋季応用物理学会
    • Place of Presentation
      愛媛県
    • Year and Date
      2012-09-13
    • Related Report
      2012 Annual Research Report
  • [Presentation] SSOI微細構造における異方性応力緩和の膜羣依存性評価2012

    • Author(s)
      シテイノルヒダヤーチェモハマドユソフ,富田基裕,小瀬村大亮,臼田宏治,手塚勉,小椋厚志
    • Organizer
      秋季応用物理学会
    • Place of Presentation
      愛媛県
    • Year and Date
      2012-09-13
    • Related Report
      2012 Annual Research Report
  • [Presentation] 微細構造Sil-xGexに印加された異方性応力の加工形状およびGe濃度依存性2012

    • Author(s)
      小瀬村大亮,富田基裕,臼田宏治,手塚勉,小椋厚志
    • Organizer
      秋季応用物理学会
    • Place of Presentation
      愛媛県
    • Year and Date
      2012-09-13
    • Related Report
      2012 Annual Research Report
  • [Presentation] 高NA、油浸ラマン分光によるメサ分離ひずみSGOI層の異方性ひずみ評価2012

    • Author(s)
      臼田宏治,小瀬村大亮,富田基裕,小椋厚志,手塚勉
    • Organizer
      秋季応用物理学会
    • Place of Presentation
      愛媛県
    • Year and Date
      2012-09-13
    • Related Report
      2012 Annual Research Report
  • [Presentation] 局所表面プラズモン共鳴を用いたラマン分光法による歪Si基板の応力評価2012

    • Author(s)
      橋口裕樹,武井宗久,小瀬村大亮,小椋厚志
    • Organizer
      秋季応用物理学会
    • Place of Presentation
      愛媛県
    • Year and Date
      2012-09-13
    • Related Report
      2012 Annual Research Report
  • [Presentation] ラマン分光法による超薄膜SOIフォノン閉じ込めの評価2012

    • Author(s)
      武井宗久,橋口裕樹,小瀬村大亮,内藤大明。黒澤裕也,内田健,小椋厚志
    • Organizer
      秋季応用物理学会
    • Place of Presentation
      愛媛県
    • Year and Date
      2012-09-13
    • Related Report
      2012 Annual Research Report
  • [Presentation] Polarization Dependence of Intensity from Strained Si on Insulator in Tip-Enhanced Raman Spectroscopy2012

    • Author(s)
      D, Kosemura, J. M. Atkin, S. Berweger, R. L. Olmon, M. B. Raschke, and A. Ogura
    • Organizer
      International Conference on Raman Spectroscopy
    • Place of Presentation
      Bangalore, India
    • Year and Date
      2012-08-14
    • Related Report
      2012 Annual Research Report
  • [Presentation] Evaluation of Stress Relaxation in Mesa-shaped Strained Si Layer by Super-resolution Raman Spectroscopy2012

    • Author(s)
      M. Tomita, D. Kosemura, K. Usuda, T. Tezuka, and A. Ogura
    • Organizer
      nternational Conference on Raman Spectroscopy
    • Place of Presentation
      Bangalore, India
    • Year and Date
      2012-08-14
    • Related Report
      2012 Annual Research Report
  • [Presentation] High-mobility and Low-parasitic Resistance Characteristics in Strained Ge Nanowire pMOSFETs with Metal Source/Drain Structure Formed by Doping-free Processes2012

    • Author(s)
      K. Ikeda, M. Ono, D. Kosemura, K. Usuda, M. Oda, Y. Kamimuta, T. Irisawa, Y. Moriyama, A. Ogura, and T. Teuka
    • Organizer
      Symposium on VLSI Technology and Circuit
    • Place of Presentation
      Honolulu, Hawaii
    • Year and Date
      2012-06-14
    • Related Report
      2012 Annual Research Report
  • [Presentation] Characterization of anisotropic strain relaxation after mesa isolation for strained SGOI and SiGe/Si structure with newly developed high-NA and oil-immersion hman method2012

    • Author(s)
      K. Usuda, D. Kosemura, M. Tomita, A. Ogura, and T. Tezuka
    • Organizer
      International SiGe Technology and Deice Meeting
    • Place of Presentation
      Berkeley, CA
    • Year and Date
      2012-06-04
    • Related Report
      2012 Annual Research Report
  • [Presentation] Characterization of Anisotropic Strain Relaxation of Ge-Rich SGOI Nanowire Formed by the Two-Step Ge-Condensation Technique with High-NA and Oil-Immersion Raman Spectroscopy

    • Author(s)
      K. Usuda, D. Kosemura, K. Ikeda, H. Hashiguti, M. Tomita, A. Ogura, T. Tezuka
    • Organizer
      6th International Symposium on Control of Semiconductor Interfaces
    • Place of Presentation
      Fukuoka、Japan
    • Related Report
      2013 Annual Research Report
  • [Presentation] Tensor Evaluation of Stress Relaxation Profile in Strained SiGe Nanostructures on Si Substrate

    • Author(s)
      M. Tomita, D. Kosemura, K. Usuda, A. Ogura
    • Organizer
      223rd ECS Meeting
    • Place of Presentation
      Tront, Canada
    • Related Report
      2013 Annual Research Report
  • [Presentation] 高Ge濃度SGOIワイヤーの異方性ひずみ評価

    • Author(s)
      臼田宏治、池田圭司、小瀬村大亮、富田基裕、小椋厚志、手塚勉
    • Organizer
      第74回応用物理学会秋季学術講演会
    • Place of Presentation
      京都
    • Related Report
      2013 Annual Research Report
  • [Presentation] 液浸ラマン分光法による高Ge濃度圧縮歪SiGeメサ構造/Ge基板からのLO, TOフォノンスペクトルの観測

    • Author(s)
      小瀬村大亮、富田基裕、臼田宏治、手塚勉、小椋厚志
    • Organizer
      第74回応用物理学会秋季学術講演会
    • Place of Presentation
      京都
    • Related Report
      2013 Annual Research Report
  • [Presentation] 有限要素法による異種の構造から導入される重畳応力の評価

    • Author(s)
      富田基裕、小瀬村大亮、小椋厚志
    • Organizer
      第74回応用物理学会秋季学術講演会
    • Place of Presentation
      京都
    • Related Report
      2013 Annual Research Report
  • [Presentation] Analysis of Electrical Field in Surface Enhanced Raman Spectroscopy Using Strained-Si Substrate

    • Author(s)
      シティノルヒダヤーチェモハマドユソフ、小瀬村大亮、木嶋隆浩、小椋厚志
    • Organizer
      第74回応用物理学会秋季学術講演会
    • Place of Presentation
      京都
    • Related Report
      2013 Annual Research Report
  • [Presentation] 表面増強ラマン分光法による歪SiGe薄膜のLO/TOフォノン励起

    • Author(s)
      山本章太郎、小瀬村大亮、シティノルヒダヤーモハマドユソフ、木嶋隆浩、今井亮佑、臼田宏治、小椋厚志
    • Organizer
      第61回応用物理学会春季学術講演会
    • Place of Presentation
      神奈川
    • Related Report
      2013 Annual Research Report
  • [Book] Stress Measurements in Si and SiGe by Liquid-Immersion Raman Spectrosopy2012

    • Author(s)
      D. Kosemura, M. Tomita, K. Usuda, and A. Ogura
    • Publisher
      InTech, Croatia
    • Related Report
      2012 Annual Research Report
  • [Remarks] 半導体ナノテクノロジー研究室

    • URL

      http://www.isc.meiji.ac.jp/~nanotech/index.htm

    • Related Report
      2015 Annual Research Report 2014 Annual Research Report
  • [Remarks] 再生可能エネルギー研究クラスター

    • URL

      http://www.meiji.ac.jp/research/mrel/index.html

    • Related Report
      2014 Annual Research Report
  • [Remarks] 半導体ナノテクノロジー研究室

    • URL

      http://www.isc.meiji.ac.jp/~nanotech/index.htm

    • Related Report
      2013 Annual Research Report
  • [Remarks]

    • URL

      http://www.meiji.ac.jp/

    • Related Report
      2012 Annual Research Report
  • [Remarks]

    • URL

      http://www.meiji.ac.jp/sst/index.html

    • Related Report
      2012 Annual Research Report
  • [Remarks]

    • URL

      http://www.isc.meiji.ac.jp/~nanotech/index.htm

    • Related Report
      2012 Annual Research Report

URL: 

Published: 2012-04-24   Modified: 2019-07-29  

Information User Guide FAQ News Terms of Use Attribution of KAKENHI

Powered by NII kakenhi