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Study on voltage control of interface anisotropy energy at ferromagnetic - oxide interfaces

Research Project

Project/Area Number 24360287
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypePartial Multi-year Fund
Section一般
Research Field Structural/Functional materials
Research InstitutionThe University of Tokyo

Principal Investigator

KITA Koji  東京大学, 工学(系)研究科(研究院), 准教授 (00343145)

Project Period (FY) 2012-04-01 – 2015-03-31
Project Status Completed (Fiscal Year 2014)
Budget Amount *help
¥18,070,000 (Direct Cost: ¥13,900,000、Indirect Cost: ¥4,170,000)
Fiscal Year 2014: ¥1,690,000 (Direct Cost: ¥1,300,000、Indirect Cost: ¥390,000)
Fiscal Year 2013: ¥3,770,000 (Direct Cost: ¥2,900,000、Indirect Cost: ¥870,000)
Fiscal Year 2012: ¥12,610,000 (Direct Cost: ¥9,700,000、Indirect Cost: ¥2,910,000)
Keywords強磁性体 / 界面磁気異方性 / 垂直磁化 / 印加電圧 / 不揮発性メモリ / 絶縁膜 / 電界応答 / 界面制御 / 電界効果 / 酸化物 / 表面・界面物性 / 磁性 / 先端機能デバイス / 垂直磁気異方性
Outline of Final Research Achievements

Electric-field-induced manipulations of interface magnetic anisotropy energy have been reported for the interfaces between ferromagnetic CoFeB nanometer-thick-layers and oxides. In this study we investigated the impacts of both constituent elements and their chemical states of CoFeB/oxide interfaces. The magnitude of response to the applied electric-field was found to be sensitive to the degree of CoFeB surface oxidations and maximized when the oxidation was limited and the oxygen atoms do not cover the whole surface. Since the reactivity with CoFeB depends on the employed oxide, the response to the applied electric-field was enhanced when we selected an oxide with less reactivity with CoFeB. In addition, we also found an emergence of non-volatile change of magnetic anisotropy energy only by electric-field application by employing TiOx as the oxide layer, which is attributable to the variable chemical states of Ti allowed in the oxide.

Report

(4 results)
  • 2014 Annual Research Report   Final Research Report ( PDF )
  • 2013 Annual Research Report
  • 2012 Annual Research Report
  • Research Products

    (27 results)

All 2015 2014 2013 2012 Other

All Journal Article (6 results) (of which Peer Reviewed: 6 results,  Acknowledgement Compliant: 2 results) Presentation (18 results) (of which Invited: 1 results) Remarks (3 results)

  • [Journal Article] Control of 4H-SiC (0001) Thermal Oxidation Process for Reduction of Interface State Density2014

    • Author(s)
      Koji Kita, Richard Heihachiro Kikuchi, Hirohisa Hirai, and Yuki Fujino
    • Journal Title

      ECS Transactions

      Volume: 64 Issue: 8 Pages: 23-28

    • DOI

      10.1149/06408.0023ecst

    • Related Report
      2014 Annual Research Report
    • Peer Reviewed / Acknowledgement Compliant
  • [Journal Article] Fabrication of SiO2/4H-SiC (0001) Interface with Nearly-Ideal Capacitance-Voltage Characteristics by Thermal Oxidation2014

    • Author(s)
      Richard Heihachiro Kikuchi and Koji Kita
    • Journal Title

      Applied Physics Letters

      Volume: 105 Issue: 3 Pages: 032106-032106

    • DOI

      10.1063/1.4891166

    • NAID

      120005537750

    • Related Report
      2014 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Understanding of Growth Kinetics of Thermal Oxides on 4H-SiC (0001) for Control of MOS Characteristics2014

    • Author(s)
      Koji Kita, Richard Heihachiro Kikuchi, and Hirohisa Hirai
    • Journal Title

      ECS Transactions

      Volume: 61 Issue: 2 Pages: 135-142

    • DOI

      10.1149/06102.0135ecst

    • Related Report
      2014 Annual Research Report
    • Peer Reviewed / Acknowledgement Compliant
  • [Journal Article] Voltage-Induced Nonvolatile Change of Magnetic Anisotropy of CoFeB Ultrathin Films Stacked With Multivalent Oxides2013

    • Author(s)
      Jiro Koba and Koji Kita
    • Journal Title

      ECS Transactions

      Volume: 58 (5) Issue: 5 Pages: 127-133

    • DOI

      10.1149/05805.0127ecst

    • Related Report
      2013 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Impact of Ta Diffusion on the Perpendicular Magnetic Anisotropy of Ta/CoFeB/MgO2013

    • Author(s)
      Naruto Miyakawa, D. C. Woriedge, and Koji Kita
    • Journal Title

      IEEE Magnetic Letters

      Volume: 4 Pages: 1000104-1000104

    • DOI

      10.1109/lmag.2013.2240266

    • Related Report
      2012 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Electrci-field-control of magnetic anisotropy of Co_<0.6>Fe_<0.2>B_<0.2>/oxide stacks using reduced voltage2012

    • Author(s)
      Koji Kita, David W. Abraham, Martin J. Gajek, and D. C. Worledge
    • Journal Title

      Journal of Applied Physics

      Volume: 112 Issue: 3 Pages: 33919-33919

    • DOI

      10.1063/1.4745901

    • Related Report
      2012 Annual Research Report
    • Peer Reviewed
  • [Presentation] CoFeB と遷移金属酸化物MOx の界面磁気異方性の電界応答性に遷移金属元素M の性質が与える影響2015

    • Author(s)
      大石竜輔,喜多浩之
    • Organizer
      第62回応用物理学会春季学術講演会
    • Place of Presentation
      東海大学湘南キャンパス(平塚市)
    • Year and Date
      2015-03-11 – 2015-03-14
    • Related Report
      2014 Annual Research Report
  • [Presentation] 種々の温度における容量の過渡応答(C-t特性)に基づくSiC MOS界面近傍の膜中トラップ密度の定量化2015

    • Author(s)
      藤野雄貴,菊地リチャード平八郎,喜多浩之
    • Organizer
      第62回応用物理学会春季学術講演会
    • Place of Presentation
      東海大学湘南キャンパス(平塚市)
    • Year and Date
      2015-03-11 – 2015-03-14
    • Related Report
      2014 Annual Research Report
  • [Presentation] CoFeB/MOx界面磁気異方性とその電界応答性の変化に与える金属元素Mの選択の効果2014

    • Author(s)
      大石竜輔,喜多浩之
    • Organizer
      第75回応用物理学会秋季学術講演会
    • Place of Presentation
      北海道大学(札幌市)
    • Year and Date
      2014-09-17 – 2014-09-20
    • Related Report
      2014 Annual Research Report
  • [Presentation] SiC MOS界面近傍の膜中欠陥モデルを用いた容量の過渡応答による遅い準位の定量的解析手法の提案2014

    • Author(s)
      藤野雄貴,菊地リチャード平八郎,平井悠久,喜多浩之
    • Organizer
      第75回応用物理学会秋季学術講演会
    • Place of Presentation
      北海道大学(札幌市)
    • Year and Date
      2014-09-17 – 2014-09-20
    • Related Report
      2014 Annual Research Report
  • [Presentation] Quantitative Characterization of Border Traps with Widely-Spread Time Constant in SiC MOS Capacitors by Transient Capacitance Measurements2014

    • Author(s)
      Yuki Fujino, Richard Heihachiro Kikuchi, Hirohisa Hirai and Koji Kita
    • Organizer
      2014 Int. Conf. on Solid State Devices and Materials (SSDM2014)
    • Place of Presentation
      つくば国際会議場(つくば市)
    • Year and Date
      2014-09-09 – 2014-09-11
    • Related Report
      2014 Annual Research Report
  • [Presentation] Understanding of Growth Kinetics of Thermal Oxides on 4H-SiC (0001) for Control of MOS Characteristics2014

    • Author(s)
      Koji Kita, Richard Heihachiro Kikuchi, and Hirohisa Hirai
    • Organizer
      225th ECS Meeting
    • Place of Presentation
      Orlando, USA
    • Year and Date
      2014-05-11 – 2014-05-16
    • Related Report
      2014 Annual Research Report
    • Invited
  • [Presentation] MOX/COFeB界面磁気異方性の様々なMに対して普遍的な電圧応答2013

    • Author(s)
      栗原隆帆, 古場治朗, 宮川成人, 喜多浩之
    • Organizer
      第60回春季応用物理学会学術講演会
    • Place of Presentation
      神奈川工科大学, 厚木
    • Year and Date
      2013-03-29
    • Related Report
      2012 Annual Research Report
  • [Presentation] 誘電体/COFeB界面の磁気異方性とその電圧応答に与える誘電体中アニオン種の効果2013

    • Author(s)
      宮川成人, 栗原隆帆, 喜多浩之
    • Organizer
      第60回春季応用物理学会学術講演会
    • Place of Presentation
      神奈川工科大学, 厚木
    • Year and Date
      2013-03-29
    • Related Report
      2012 Annual Research Report
  • [Presentation] Enhanced Voltage Control of Magnetic Anisotropy of Ta/CoFeB/MgO by Suppression of Ta Diffusion and CoFeB Surface Oxidation2013

    • Author(s)
      N. Miyakawa, D. C. Worledge, and K. Kita
    • Organizer
      12th Joint MMM/Intermag Conference
    • Place of Presentation
      シカゴ, 米国
    • Year and Date
      2013-01-15
    • Related Report
      2012 Annual Research Report
  • [Presentation] Characterization of Voltage Control of Magnetic Anisotropy Up to 8 MV/cm by Using Substrate Bias Structure2013

    • Author(s)
      J. Koba, N. Miyakawa, and K. Kita
    • Organizer
      12th Joint MMM/Intermag Conference
    • Place of Presentation
      シカゴ, 米国
    • Year and Date
      2013-01-15
    • Related Report
      2012 Annual Research Report
  • [Presentation] Voltage-Induced Nonvolatile Change of Magnetic Anisotropy of CoFeB Ultrathin Films Stacked With Multivalent Oxides2013

    • Author(s)
      Jiro Koba and Koji Kita
    • Organizer
      224th ECS Meeting
    • Place of Presentation
      San Francisco, USA
    • Related Report
      2013 Annual Research Report
  • [Presentation] Voltage-Induced Nonvolatile Change of Magnetic Anisotropy in TiOx/CoFeB/Ta2013

    • Author(s)
      Jiro Koba and Koji Kita
    • Organizer
      2013 International Conference on Solid State Device and Materials
    • Place of Presentation
      ヒルトン福岡シーホーク,福岡県福岡市
    • Related Report
      2013 Annual Research Report
  • [Presentation] TiOx/CoFeB/Taスタックの磁気異方性の電界による不揮発な制御の実証2013

    • Author(s)
      古場治朗,喜多浩之
    • Organizer
      第74回 応用物理学会秋季学術講演会
    • Place of Presentation
      同志社大学京田辺キャンパス,京都府京田辺市
    • Related Report
      2013 Annual Research Report
  • [Presentation] Challenges and Opportunities in Voltage Control of Magnetic Anisotropy of Ultrathin Ferromagnetic Metals for Future Spintronics2012

    • Author(s)
      Koji Kita and D. C. Worledge
    • Organizer
      International Conference on Emerging Advanced Nanomaterials (ICEAN2012)
    • Place of Presentation
      ブリスベン, オーストラリア(招待講演)
    • Year and Date
      2012-10-22
    • Related Report
      2012 Annual Research Report
  • [Presentation] Voltage Control of Magnetic Anisotropy of CoFeB Thin Films Stacked with Various Oxides2012

    • Author(s)
      J. Koba, T. Kuribara, N. Miyakawa, and K. Kita
    • Organizer
      Int. Conf. of Asian Union of Magnetic Society 2012
    • Place of Presentation
      奈良県新公会堂, 奈良
    • Year and Date
      2012-10-05
    • Related Report
      2012 Annual Research Report
  • [Presentation] Study on Interface Magnetic Anisotropy Deterioration Mechanisms in Ta/CoFeB/MgO stacks2012

    • Author(s)
      Naruto Miyakawa, D. C. Worledge, and Koji Kita
    • Organizer
      2012 Int. Conf. on Solid State Device and Physics
    • Place of Presentation
      京都国際会館, 京都
    • Year and Date
      2012-09-27
    • Related Report
      2012 Annual Research Report
  • [Presentation] CoFeB表面酸化量による磁気異方性エネルギーの電界応答性の違い2012

    • Author(s)
      宮川成人, D.C. Worledge, 喜多浩之
    • Organizer
      第73回秋季応用物理学会学術講演会
    • Place of Presentation
      松山大学, 松山
    • Year and Date
      2012-09-13
    • Related Report
      2012 Annual Research Report
  • [Presentation] CoFeB薄膜の磁気異方性およびその電界制御性の酸化物による違い2012

    • Author(s)
      古場治朗, 栗原隆帆, 宮川成人, 喜多浩之
    • Organizer
      第73回秋季応用物理学会学術講演会
    • Place of Presentation
      松山大学, 松山
    • Year and Date
      2012-09-13
    • Related Report
      2012 Annual Research Report
  • [Remarks] 東京大学大学院工学系研究科マテリアル工学専攻 喜多研究室

    • URL

      http://www.scio.t.u-tokyo.ac.jp/index.html

    • Related Report
      2014 Annual Research Report
  • [Remarks] 喜多研究室 (研究成果・発表)

    • URL

      http://www.scio.t.u-tokyo.ac.jp/publication.html

    • Related Report
      2013 Annual Research Report
  • [Remarks]

    • URL

      http://www.scio.t.u-tokyo.ac.jp/publication.html

    • Related Report
      2012 Annual Research Report

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Published: 2012-04-24   Modified: 2019-07-29  

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