| Budget Amount *help |
¥5,460,000 (Direct Cost: ¥4,200,000、Indirect Cost: ¥1,260,000)
Fiscal Year 2014: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000)
Fiscal Year 2013: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000)
Fiscal Year 2012: ¥3,380,000 (Direct Cost: ¥2,600,000、Indirect Cost: ¥780,000)
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| Outline of Final Research Achievements |
Control of formation of anomalous nano-structures on semiconductor surfaces, such as nano-porous structures on Ge and nano-cone structures on InSb surfaces, using focused ion beam (FIB) irradiations was studied in the present work. Knowledge that those structures are affected by FIB irradiation parameters was also obtained. On the other hand, we have proposed the oxidation process of metallic Ti thin films, which are formed by a sputtering method, using oxygen plasma. Using this plasma oxidation process to Ti films formed on nano-structured surfaces, we have obtained the results which suggest the improvement of the photocatalytic effects of such materials.
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