Structural characterization and creation of square-shaped ultrafine nanopatterns for POSS-containing block copolymers

• Project/Area Number: 24550131
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Multi-year Fund
• Section: 一般
• Research Field: Polymer chemistry
• Research Institution: Tokyo Institute of Technology
• Principal Investigator: HAYAKAWA Teruaki 東京工業大学, 理工学研究科, 准教授 (60357803)
• Project Period (FY): 2012-04-01 – 2015-03-31
• Project Status: Completed (Fiscal Year 2014)
• Budget Amount: ¥5,590,000 (Direct Cost: ¥4,300,000、Indirect Cost: ¥1,290,000); Fiscal Year 2014: ¥780,000 (Direct Cost: ¥600,000、Indirect Cost: ¥180,000); Fiscal Year 2013: ¥2,470,000 (Direct Cost: ¥1,900,000、Indirect Cost: ¥570,000); Fiscal Year 2012: ¥2,340,000 (Direct Cost: ¥1,800,000、Indirect Cost: ¥540,000)
• Keywords: ブロック共重合体 / ナノパターン / 階層構造 / シルセスキオキサン / 微細加工 / 自己組織化 / 方形

Outline of Final Research Achievements

A new series of polyhedral oligomeric silsesquioxane (POSS)-containing block copolymers have been synthesized and their higher-order structures have been also characterized in detail. By considering the design of molecular structures and hierarchical structures with intermolecular interactions and by using precision polymerization techniques, the fundamental study of creating the square-shaped ultrafine nanopatterns has been established for the designed POSS-containing block copolymers and its hierarchical structures.

Research Products

• [Presentation] Cylindrical Nanostructuring of Polyhedral Pligomeric Silsesquioxane-containing Polymers in Block Copolymer Self-Assembly (2014)
  • Author(s): Fuminobu Kato, Rina Maeda, Teruaki Hayakawa
  • Organizer: Korea-Japan Joint Polymer Symposium 2014
  • Place of Presentation: KAIST, KOREA
  • Year and Date: 2014-10-29 – 2014-11-01
• [Presentation] Molecular Design and Synthesis of Side-chain Block Copolymers for Fabricating the Hierarchical Nanostructures (2014)
  • Author(s): Hiroyuki Shima, Chiharu Hirano, Haruka Mikami, Teruaki Hayakawa
  • Organizer: The 15th IUMRS-International Conference in Asia
  • Place of Presentation: Fukuoka University
  • Year and Date: 2014-08-24 – 2014-08-30
• [Presentation] Development of Silsesquioxane-containing Block Copolymers For DSA Materials (2014)
  • Author(s): Teruaki Hayakawa
  • Organizer: 応用物理学会 NGL 2014
  • Place of Presentation: 東京工業大学大岡山キャンパス
  • Year and Date: 2014-07-17
  • Invited
• [Presentation] Synthesis of New Block Copolymer for Creation of Rectangular-shaped Patterning on Substrate (2014)
  • Author(s): Hiroyuki Shima, Chiharu Hirano, Haruka MIkami, Rina Maeda, Teruaki Hayakawa
  • Organizer: IUPAC MACRO 2014
  • Place of Presentation: Chiang Mai, Thailand
  • Year and Date: 2014-07-06 – 2014-07-11
• [Presentation] 高分子の自己組織化によるナノリソグラフィーと分子技術 (2013)
  • Author(s): 吉田博史、早川晃鏡
  • Organizer: 日本化学会第９３春季年会
  • Place of Presentation: 立命館大学びわこ・くさつキャンパス
  • Invited
• [Presentation] 線端構造揺らぎの低減を目指したPOSS含有ブロック共重合体の界面構造制御 (2013)
  • Author(s): 杉本晋、前田利菜、早川晃鏡
  • Organizer: 第６２回高分子年次大会
  • Place of Presentation: 京都国際会館
• [Presentation] POSS含有トリブロック共重合体のミクロ相分離構造形成 (2013)
  • Author(s): 加藤史修、前田利菜、早川晃鏡
  • Organizer: 第６２回高分子年次大会
  • Place of Presentation: 京都国際会館
• [Presentation] ブロック共重合体を利用した超微細ナノ構造およびポーラス構造の創製 (2013)
  • Author(s): 早川晃鏡
  • Organizer: 高分子学会北海道支部会員増強セミナー
  • Place of Presentation: 北海道大学
  • Invited
• [Presentation] POSS-Containing Block Copolymers For Ultra-High Density Pattterns (2013)
  • Author(s): Teruaki Hayakawa
  • Organizer: The 24th Magnetic Recording Conference
  • Place of Presentation: 東京工業大学大岡山キャンパス
  • Invited
• [Presentation] 合成的視点から考えるブロック共重合体相分離界面制御とナノ構造の創成 (2013)
  • Author(s): 早川晃鏡、前田利菜、加藤史修、後関頼太
  • Organizer: 第６２回高分子討論会
  • Place of Presentation: 金沢大学角間キャンパス
• [Presentation] ブロック共重合体リソグラフィーを指向したPOSS含有トリブロック共重合体のナノ構造制御 (2013)
  • Author(s): 加藤史修、前田利菜、早川晃鏡
  • Organizer: 第６２回高分子討論会
  • Place of Presentation: 金沢大学角間キャンパス
• [Presentation] The Challenge of Making Nanostructures: From Molecular Design and Synthesis to Self-Assembly of Functional Block Copolymers (2013)
  • Author(s): Teruaki Hayakawa
  • Organizer: The 11th International Conference on Nano Science and Nano Technology
  • Place of Presentation: Chosun University, Korea
  • Invited
• [Presentation] ブロック共重合体を用いた微細加工用テンプレート材料 (2013)
  • Author(s): 早川晃鏡
  • Organizer: 高分子学会第２２回ポリマー材料フォーラム
  • Place of Presentation: 東京・船堀
  • Invited
• [Presentation] 工学的利用を目指した自己組織化高分子薄膜の開発 (2013)
  • Author(s): 早川晃鏡
  • Organizer: 高分子学会九州支部材料フォーラム
  • Place of Presentation: 九州大学（福岡）
  • Invited
• [Presentation] The Challenge of Lithography: Developing Next Generation Polymeric Materials and Making Patterns on the Size Scale of Molecules (2013)
  • Author(s): Teruaki Hayakawa
  • Organizer: The 2nd Green MAP Center International Symposium
  • Place of Presentation: 山形大学（米沢）
  • Invited
• [Presentation] 分子リソグラフィを指向した側鎖型ポリマー及びブロック共重合体の合成と階層構造形成 (2012)
  • Author(s): 三神悠、前田利菜、柿本雅明、早川晃鏡
  • Organizer: 第６１回高分子年次大会
  • Place of Presentation: パシフィコ横浜（横浜）
• [Presentation] 分子集合体リソグラフィを指向したシロキサン側鎖を有する液晶性ポリメタクリレートの合成と階層構造形成 (2012)
  • Author(s): 平野千春、三神悠、前田利菜、柿本雅明、早川晃鏡
  • Organizer: 第６１回高分子年次大会
  • Place of Presentation: パシフィコ横浜（横浜）
• [Presentation] POSS含有ブロック共重合体におけるFlory-Huggins相互作用パラメータの算定と超微細周期構造に向けた材料創製 (2012)
  • Author(s): 鈴木吉則、前田利菜、横山英明、早川晃鏡
  • Organizer: 第６１回高分子討論会
  • Place of Presentation: 名古屋工業大学（名古屋）
• [Presentation] ナノスケールパターニングにおけるブロック共重合体の利用と新規材料開発 (2012)
  • Author(s): 早川晃鏡
  • Organizer: 高分子学会東北支部会員増強対策講演会
  • Place of Presentation: 山形大学（米沢）
  • Invited
• [Presentation] 新しいブロック共重合体テンプレート材料の開発とDirected Self-Assemblyによる精密構造制御 (2012)
  • Author(s): 早川晃鏡
  • Organizer: 高分子学会茨城地区活動講演会
  • Place of Presentation: 日立製作所日立研究所（日立）
  • Invited
• [Presentation] Hierarchical Structures of Silicon-containing Materials for Single Nanoscale Lithography (2012)
  • Author(s): Teruaki Hayakawa
  • Organizer: Korea-Japan Joint Symposium
  • Place of Presentation: Seoul National University (Seoul)
  • Invited
• [Presentation] Cage Silsesquioxane-containing Side Chain Block Copolymers For Next Generation Lithographic Materials (2012)
  • Author(s): Teruaki Hayakawa
  • Organizer: 17th Mayasian Chemical Congress
  • Place of Presentation: Putra World Trade Centre (Kuala Lumpur)
  • Invited
• [Presentation] Challenge in Self-Assembling Lithography Materials (2012)
  • Author(s): Teruaki Hayakawa
  • Organizer: Kyoto DSA Workshop
  • Place of Presentation: 京都大学（京都）
  • Invited
• [Presentation] Silicon-containing Side Chain Polymers with 5 nm Features for Lithographic Materials (2012)
  • Author(s): Teruaki Hayakawa
  • Organizer: IUMRS-ICEM 2012
  • Place of Presentation: パシフィコ横浜（横浜）
  • Invited
• [Presentation] Cage Silsesquioxane-containing Block Copolymers For 10 nm Nanopatternable Materials (2012)
  • Author(s): Teruaki Hayakawa
  • Organizer: 12th Japan-Belgium Symposium on Polymer Science
  • Place of Presentation: Vrije Universiteit Brussel (Belgium)
  • Invited
• [Book] Anionic Polymerization: Principles, Practive, Strength, Consequences and Applications (Chapter 22, Block Copolymers For Self-assembling: Lithographic Materials) (2015)
  • Author(s): Teruaki Hayakawa
  • Publisher: Springer Japan