Development of porous hyroxide thin films for smart windows

• Project/Area Number: 24550228
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Multi-year Fund
• Section: 一般
• Research Field: Inorganic industrial materials
• Research Institution: Kitami Institute of Technology
• Principal Investigator: ABE Yoshio 北見工業大学, 工学部, 教授 (20261399)
• Co-Investigator(Kenkyū-buntansha): KAWAMURA Midori 北見工業大学, 工学部, 教授 (70261401) ; KIM Kyung Ho 北見工業大学, 工学部, 助教 (70608471)
• Project Period (FY): 2012-04-01 – 2015-03-31
• Project Status: Completed (Fiscal Year 2014)
• Budget Amount: ¥5,330,000 (Direct Cost: ¥4,100,000、Indirect Cost: ¥1,230,000); Fiscal Year 2014: ¥1,430,000 (Direct Cost: ¥1,100,000、Indirect Cost: ¥330,000); Fiscal Year 2013: ¥1,430,000 (Direct Cost: ¥1,100,000、Indirect Cost: ¥330,000); Fiscal Year 2012: ¥2,470,000 (Direct Cost: ¥1,900,000、Indirect Cost: ¥570,000)
• Keywords: スマートウィンドウ / エレクトロクロミック / 薄膜 / 水酸化物 / スパッタ法 / 酸化物薄膜 / スパッタ成膜技術 / 水酸化物薄膜 / スパッタ製膜技術

Outline of Final Research Achievements

Smart windows are considered to be a promising energy-saving technology for houses and office buildings. In this research project, we investigated the formation technology of hydroxide thin films, which show electrochromic properties and change colors by electrochemical oxidation and reduction. Hydroxide thin films prepared by sputtering in water vapor atmosphere on a substrate cooled below room temperature had a porous structure with low film-density and showed good electrochromic properties.

Research Products

• [Journal Article] Formation of hydrated yttrium oxide and titanium oxide thin films by reactive sputtering in H2O atmosphere and their electrical properties (2014)
  • Author(s): Yoshio Abe, Ning Li, Kosuke Nishimoto, Midori Kawamura, Kyung Ho Kim, Tsutomu Suzuki
  • Journal Title: Japanese Journal of Applied Physics Volume: 53 Issue: 6 Pages: 068002-068002
  • DOI: 10.7567/jjap.53.068002
  • NAID: 210000144052
  • Peer Reviewed / Open Access / Acknowledgement Compliant
• [Journal Article] スマートウィンドウ用電極材料のスパッタ成膜技術 (2013)
  • Author(s): 阿部良夫、川村みどり、金敬鎬、李慶武
  • Journal Title: ケミカルエンジニアリング Volume: 58 Pages: 811-817
• [Presentation] Electrochromic properties of IrOx films prepared by reactive sputtering in O2 and H2O atmosphere (2014)
  • Author(s): Satoshi Ito, Yoshio Abe, Midori Kawamura, Kyung Ho Kim
  • Organizer: 7th Vacuum and Surface Science Conference of Asia and Australia (VASSCAA-7)
  • Place of Presentation: 国立精華大学、台湾
  • Year and Date: 2014-10-05 – 2014-10-09
• [Presentation] H2Oガスを用いた反応性スパッタ法によるIrOxHy薄膜の作製とその評価 (2014)
  • Author(s): 伊藤敏、阿部良夫、川村みどり、金敬鎬
  • Organizer: 第75回応用物理学会秋季学術講演会
  • Place of Presentation: 北海道大学
  • Year and Date: 2014-09-17 – 2014-09-20
• [Presentation] ZrO2を添加したNiOOH薄膜とそのエレクトロクロミック特性の評価 (2013)
  • Author(s): 聶宏鵬、東藤亮佑、阿部良夫、川村みどり、金敬鎬
  • Organizer: 第7４回応用物理学会学術講演会
  • Place of Presentation: 同志社大学（京田辺市）
• [Presentation] Formation of hydrated oxide thin films by reactive sputtering in H2O atmosphere and their electrical properties (2013)
  • Author(s): Y. Abe, N. Li, K. Nishimoto, M. Kawamura, K.H. Kim, T. Suzuki
  • Organizer: 19th International Vacuum Congress
  • Place of Presentation: Paris Palais des Congres（フランス、パリ市）
• [Presentation] Effects of electrolyte solutions and their pH on the electrochromic cycling stability of reactively sputtered WO3 thin fims (2013)
  • Author(s): R. Todo, Y. Abe, M. Kawamura, K.H. Kim
  • Organizer: 224th Electrochemical Society Meeting
  • Place of Presentation: The Hilton San Francisco Hotel（アメリカ、サンフランシスコ市））
• [Presentation] Zr添加NiOOH薄膜の酸性電解質中におけるエレクトロクロミック特性
  • Author(s): Nie Hongpeng, 東藤亮佑、阿部良夫、川村みどり、金敬鎬
  • Organizer: 日本化学会北海道支部２０１３年夏季研究発表会
  • Place of Presentation: 北見工業大学（北見市）
• [Presentation] Zrを添加した水酸化Co薄膜の作製とそのエレクトロクロミック特性の評価
  • Author(s): 鯉野翔伍、李慶武、阿部良夫、川村みどり、金敬鎬
  • Organizer: 2012年秋季 第73回応用物理学会学術講演会
  • Place of Presentation: 愛媛大学
• [Patent(Industrial Property Rights)] 薄膜製造装置 (2014)
  • Inventor(s): 阿部良夫、川村みどり、金敬鎬
  • Industrial Property Rights Holder: 阿部良夫、川村みどり、金敬鎬
  • Industrial Property Rights Type: 特許
  • Industrial Property Number: 2014-213146
  • Filing Date: 2014-10-01