| Project/Area Number |
24550260
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Multi-year Fund |
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| Section | 一般 |
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| Research Field |
Polymer/Textile materials
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| Research Institution | Osaka Prefecture University |
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Principal Investigator |
OKAMURA Haruyuki 大阪府立大学, 工学(系)研究科(研究院), 准教授 (10316010)
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| Co-Investigator(Renkei-kenkyūsha) |
SHIRAI Masamitsu 大阪府立大学, 工学(系)研究科, 教授 (00081331)
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| Project Period (FY) |
2012-04-01 – 2015-03-31
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| Project Status |
Completed (Fiscal Year 2014)
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| Budget Amount *help |
¥5,590,000 (Direct Cost: ¥4,300,000、Indirect Cost: ¥1,290,000)
Fiscal Year 2014: ¥1,950,000 (Direct Cost: ¥1,500,000、Indirect Cost: ¥450,000)
Fiscal Year 2013: ¥1,820,000 (Direct Cost: ¥1,400,000、Indirect Cost: ¥420,000)
Fiscal Year 2012: ¥1,820,000 (Direct Cost: ¥1,400,000、Indirect Cost: ¥420,000)
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| Keywords | 光硬化樹脂 / 光重合 / 光分解 / 光開始剤 / デュアル硬化 / 樹脂モールド / デュアル光硬化系 / チオール/エン / 連鎖長 / レジスト / インプリント / 表面自由エネルギー / ハイブリッド光硬化系 / モールド |
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| Outline of Final Research Achievements |
We categorized photosensitive polymers as photodecomposable system after photopolymerization, photopolymerizable system after photolysis, and photocrosslinkable system after photopolymerization. Each of the systems was investigated for 3 years. In terms of photodecomposable system after photopolymerization, surface energies of resin molds were successfully controlled. In terms of photocrosslinkable system after photopolymerization, a novel methacrylate containing a chalcone unit was synthesized and the photopolymerization was controlled by the choice of photoinitiators and irradiation wavelength. In terms of photopolymerizable system after photolysis, photocrosslinkable system sensitive to 405 nm-light was successfully devised using a novel photoacid generator.
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