Development of efficient water window x-ray band-emission source by high-Z highly ionized ions
Project/Area Number |
24560038
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Research Category |
Grant-in-Aid for Scientific Research (C)
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Allocation Type | Multi-year Fund |
Section | 一般 |
Research Field |
Applied optics/Quantum optical engineering
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Research Institution | Utsunomiya University |
Principal Investigator |
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Project Period (FY) |
2012-04-01 – 2015-03-31
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Project Status |
Completed (Fiscal Year 2014)
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Budget Amount *help |
¥5,330,000 (Direct Cost: ¥4,100,000、Indirect Cost: ¥1,230,000)
Fiscal Year 2014: ¥780,000 (Direct Cost: ¥600,000、Indirect Cost: ¥180,000)
Fiscal Year 2013: ¥780,000 (Direct Cost: ¥600,000、Indirect Cost: ¥180,000)
Fiscal Year 2012: ¥3,770,000 (Direct Cost: ¥2,900,000、Indirect Cost: ¥870,000)
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Keywords | 水の窓軟X線光源 / 重元素 / 多価イオン / レーザー生成プラズマ / 軟X線 / EUV / 水の窓 / レーザー / プラズマ / スペクトル / 高Z |
Outline of Final Research Achievements |
We study the efficient EUV & soft x-ray sources for lithography and bio-imaging applications based on laser-produced high-Z ions. In order to produce the high-power emission, the mid-IR laser pulse for high-Z plasmas is one of key technology. Recent progress has been showed the laser development and discuss the experimental data to achieve the lab-scale table-top, efficiency, high-brightness high-Z plasma EUV-soft x-ray sources for in vivo bio-imaging applications.
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Report
(4 results)
Research Products
(99 results)
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[Journal Article] Density and x-ray emission profile relationships in highly ionized high-Z laser-produced plasmas2015
Author(s)
K. Yoshida, S. Fujioka, T. Higashiguchi, T. Ugomori, N. Tanaka, M. Kawasaki, Y Suzuki, C. Suzuki, K. Tomita, R. Hirose, T. Ejima, H. Ohashi, M. Nishikino, A. Sunahara, B. Li, P. Dunne, G. O’sullivan, T. Yanagida, H. Azechi, and H. Nishimura
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Journal Title
Applied Physics Letters
Volume: 106
Issue: 12
Pages: 121109-121109
DOI
Related Report
Peer Reviewed
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[Journal Article] Quasi-Moseley’s law for strong narrow bandwidth soft x-ray sources containing higher charge-state ions2014
Author(s)
H. Ohashi, T. Higashiguchi, Y. Suzuki, G. Arai, Y. Otani, T. Yatagai, B. Li, P. Dunne, G. O’Sullivan, W. Jiang, A. Endo, H. Sakaue, D. Kato, I. Murakami, N. Tamura, S. Sudo, F. Koike, and C. Suzuki
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Journal Title
Applied Physics Letters
Volume: 104
Issue: 23
DOI
Related Report
Peer Reviewed
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[Journal Article] Evolution of laser-produced Sn extreme ultraviolet source diameter for high-brightness source2014
Author(s)
Amitava Roy, Goki Arai, Hiroyuki Hara, Takeshi Higashiguchi, Hayato Ohashi, Atsushi Sunahara, Bowen Li, Padraig Dunne, Gerry O'Sullivan, Taisuke Miura, Tomas Mocek, and Akira Endo
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Journal Title
Applied Physics Letters
Volume: 105
Issue: 7
Pages: 074103-074103
DOI
Related Report
Peer Reviewed / Acknowledgement Compliant
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[Journal Article] EUV spectroscopy of highly charged high Z ions in the Large Helical Device plasmas2014
Author(s)
Chihiro Suzuki, Fumihiro Koike, Izumi Murakami, Naoki Tamura, Shigeru Sudo, Hiroyuki Sakaue, Nobuyuki Nakamura, Shigeru Morita, Motoshi Goto, Daiji Kato, Tomohide Nakano, Takeshi Higashiguchi, Colm Harte, and Gerry O'Sullivan
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Journal Title
Physica Scripta
Volume: 89
Issue: 11
Pages: 114009-114009
DOI
Related Report
Peer Reviewed / Acknowledgement Compliant
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[Journal Article] Tuning extreme ultraviolet emission for optimum coupling with multilayer mirrors for future lithography through control of ionic charge states2014
Author(s)
H. Ohashi, T. Higashiguchi, B. Li, Y. Suzuki, M. Kawasaki, T. Kanehara, Y. Aida, S. Torii, T. Makimura, W. Jiang, P. Dunne, G. O’Sullivan, and N. Nakamura
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Journal Title
Journal of Applied Physics
Volume: 115
Issue: 3
Pages: 33302-33302
DOI
Related Report
Peer Reviewed
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[Journal Article] Recent progress in source development for lithography at 6.x nm2013
Author(s)
Gerry O’Sullivan, Thomas Cummins, Padraig Dunne, Akira Endo, Paddy Hayden, Takeshi Higashiguchi, Deirdre Kilbane, Bowen Li, Colm O’Gorman, Takamitsu Otsuka, Emma Sokell, and Noboru Yugami
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Journal Title
Physica Scripta
Volume: T156
Pages: 14105-14105
DOI
Related Report
Peer Reviewed
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[Journal Article] The effect of viewing angle on the spectral behavior of a Gd plasma source near 6.7 nm2012
Author(s)
Colm O’Gorman, Takamitsu Otsuka, Noboru Yugami, Weihua Jiang, Akira Endo, Bowen Li, Thomas Cummins, Padraig Dunne, Emma Sokell, Gerry OSullivan, and Takeshi Higashiguchi
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Journal Title
APPLIED PHYSICS LETTERS
Volume: 100
Issue: 14
Pages: 141108-141108
DOI
Related Report
Peer Reviewed
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[Presentation] Welcome and Overview of recent work on soft-ray emission spectroscopy2014
Author(s)
Gerry O’Sullivan, Padraig Dunne, Paddy Hayden, Bowen Li, Ragava Lokasani, Elaine Long, Hayato Ohashi, Fergal O’Reilly, John Sheil, Emma Sokell, Chihiro Suzuki, Elgiva White, and Takeshi Higashiguchi
Organizer
ISCA Japan-Ireland Workshop on extreme ultraviolet source development for lithography, surface morphology and biological imaging
Place of Presentation
University College Dublin
Year and Date
2014-11-06
Related Report
Invited
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[Presentation] Tunable extreme ultraviolet and soft x-ray narrowband sources with laser produced high-Z plasmas2014
Author(s)
Hayato Ohashi, Takeshi Higashiguchi, Yuhei Suzuki, Goki Arai, Nobuyuki Nakamura, Bowen Li, Padraig Dunne, Gerry O’Sullivan, Hiroyuki A. Sakaue, Daiji Kato, Izumi Murakami, Naoki Tamura, Shigeru Sudo, Fumihiro Koike, and Chihiro Suzuki
Organizer
ISCA Japan-Ireland Workshop on extreme ultraviolet source development for lithography, surface morphology and biological imaging
Place of Presentation
University College Dublin
Year and Date
2014-11-06
Related Report
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[Presentation] Sources for Water Window Imaging2014
Author(s)
Gerry O’Sullivan, Padraig Dunne, Paddy Hayden, Bowen Li, Ragava Lokasani, Elaine Long, Hayato Ohashi, Fergal O’Reilly, John Sheil, Emma Sokell, Chihiro Suzuki, Elgiva White, and Takeshi Higashiguchi
Organizer
2014 International Workshop on EUV and Soft X-Ray Sources
Place of Presentation
University College Dublin
Year and Date
2014-11-05
Related Report
Invited
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[Presentation] Characteristics of soft x-ray emission from optically thin high-Z plasmas in Large Helical Device2014
Author(s)
Hayato Ohashi, Takeshi Higashiguchi, Yuhei Suzuki, Goki Arai, Bowen Li, Padraig Dunne, Gerry O’Sullivan, Hiroyuki A. Sakaue, Daiji Kato, Izumi Murakami, Naoki Tamura, Shigeru Sudo, Fumihiro Koike, and Chihiro Suzuki
Organizer
2014 International Workshop on EUV and Soft X-Ray Sources
Place of Presentation
University College Dublin
Year and Date
2014-11-04
Related Report
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[Presentation] Systematic observation of EUV spectra from heavy ions in optically thin and thick plasmas2014
Author(s)
Chihiro Suzuki, Fumihiro Koike, Takeshi Higashiguchi, Izumi Murakami, Naoki Tamura, Shigeru Sudo, Elgiva White, John Sheil, Elaine Long, Fergal O’Reilly, Emma Sokell, Padraig Dunne, and Gerard O’Sullivan
Organizer
9th International Conference on Atomic and Molecular Data and Their Applications (ICAMDATA)
Place of Presentation
University of Jena
Year and Date
2014-09-22
Related Report
Invited
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[Presentation] Sources for beyond extreme ultraviolet lithography and water window imaging2014
Author(s)
Gerry O'Sullivan, Padraig Dunne, Paddy Hayden, Bowen Li, Ragava Lokasania, Elaine Long, Hayato Ohashi, Fergal O'Reilly, John Sheil, Emma Sokell, Chihiro Suzuki, Elgiva White, and Takeshi Higashiguchi
Organizer
9th International Conference on Atomic and Molecular Data and Their Applications (ICAMDATA)
Place of Presentation
University of Jena
Year and Date
2014-09-22
Related Report
Invited
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[Presentation] Recent progress in source development in the extreme ultraviolet for lithography and water window imaging2013
Author(s)
Gerry O’Sullivan, Padraig Dunne, Takeshi Higashiguchi, Takamitsu Otsuka, Bowen Li, Imam Kambali, Akira Endo, Fergal O’Reilly, and Deirdre Kilbane
Organizer
11th EUROPEAN CONFERENCE ON ATOMS, MOLECULES AND PHOTONS (ECAMP11)
Place of Presentation
Aarhus University, Aarhus, Denmark
Related Report
Invited
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[Presentation] EUV spectroscopy of highly charged high Z ions in the Large Helical Device plasmas2013
Author(s)
C. Suzuki, F. Koike, I. Murakami, N. Tamura, S. Sudo, H. A. Sakaue, N. Nakamura, S. Morita, M. Goto, D. Kato, T. Nakano, T. Higashiguchi, C. S. Harte, G. O’Sullivan
Organizer
11th International Colloquium on Atomic Spectra and Oscillator Strengths for Astrophysical and Laboratory Plasmas (ASOS-11)
Place of Presentation
University of Mons, Mons, Belgium
Related Report
Invited
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[Presentation] Fundamental Property of 6.X-nm EUV Emission2012
Author(s)
Takeshi Higashiguchi, Takamitsu Otsuka, Noboru Yugami, Thomas Cummins, Colm O’Gorman, Bowen Li, Deirdre Kilbane, Padraig Dunne, Gerry O’Sullivan, Weihua Jiang, and Akira Endo
Organizer
2012 International Workshop on EUV Lithography
Place of Presentation
Sheraton Maui Resort
Related Report
Invited
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[Presentation] Investigating the Effects of Laser Power Density, Pulse Duration and Viewing Angle on a 6.7nm BEUV Source2012
Author(s)
Colm O'Gorman, Thomas Cummins, Takamitsu Otsuka, Noboru Yugami, Weihua Jiang, Akira Endo, Bowen Li, Padraig Dunne, Emma Sokell, Gerry O'Sullivan, and Takeshi Higashiguchi
Organizer
2012 International Workshop on EUV Lithography
Place of Presentation
Sheraton Maui Resort
Related Report
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[Presentation] Progress in Laser-Plasma Sources - 13.5 nm & Beyond
Author(s)
Padraig Dunne, Takeshi Higashiguchi, Takamitsu Otsuka, Weihua Jiang, Akira Endo, Bowen Li, Colm O’Gorman, Thomas Cummings, Patrick Hayden, Tony Donnelly, Fergal O’Reilly, and Gerry O’Sullivan
Organizer
2013 International Workshop on EUV Lithography
Place of Presentation
Makena Beach Golf Resort, Maui, Hawaii
Related Report
Invited
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[Presentation] Beyond Extreme Ultra Violet (BEUV) Radiation from Spherically symmetrical High-Z plasmas
Author(s)
Kensuke Yoshida, Shinsuke Fujioka, Takeshi Higashiguchi, Teruyuki Ugomori, Nozomi Tanaka, Masato Kawasaki, Yuhei Suzuki, Chihiro Suzuki, Kentaro Tomita, Ryouichi Hirose, Takeo Ejima, Hayato Ohashi, Masaharu Nishikino, Enda Scally, Hiroaki Nshimura, Hiroshi Azechi, and Gerard O’Sullivan
Organizer
The Eighth International Conference on Inertial Fusion Sciences and Applications (IFSA2013)
Place of Presentation
Nara Prefectural New PublicHall, Japan
Related Report
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[Presentation] Characteristics of extreme ultraviolet emission from high-Z plasmas
Author(s)
Takeshi Higashiguchi, Yuhei Suzuki, Masato Kawasaki, Chihiro Suzuki, Kentaro Tomita, Masaharu Nishikino, Shinsuke Fujioka, Akira Endo, Bowen Li, Takamitsu Otsuka, Padraig Dunne, and Gerry O’Sullivan
Organizer
The Eighth International Conference on Inertial Fusion Sciences and Applications (IFSA2013)
Place of Presentation
Nara Prefectural New PublicHall, Japan
Related Report
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[Presentation] Characteristics of 6.X-nm Beyond EUV sources
Author(s)
Takeshi Higashiguchi, Takamitsu Otsuka, Thomas Cummins, Colm O’Gorman, Bowen Li, Deirdre Kilbane, Padraig Dunne, Gerry O'Sullivan, Weihua Jiang, and Akira Endo
Organizer
2013 International Symposium on Extreme Ultraviolet Lithography
Place of Presentation
Toyama International Conference Center
Related Report
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[Presentation] Fundamental properties of the beyond EUV source
Author(s)
Takeshi Higashiguchi, Hayato Ohashi, Yuhei Suzuki, Masato Kawasaki, Bowen Li, Deirdre Kilbane, Padraig Dunne, Gerry O’Sullivan, Weihua Jiang, and Akira Endo
Organizer
2013 International Symposium on Extreme Ultraviolet Lithography
Place of Presentation
Toyama International Conference Center
Related Report
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[Presentation] Microplasma high-brightness EUV source at 13.5 nm
Author(s)
Takeshi Higashiguchi, Yoichi Hirose, Hayato Ohashi, Yuhei Suzuki, Masato Kawasaki, Hiroyuki Hara, Atsushi Sunahara, Akira Endo, Padraig Dunne, and Gerry O’Sullivan
Organizer
2013 International Symposium on Extreme Ultraviolet Lithography
Place of Presentation
Toyama International Conference Center
Related Report
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[Presentation] Optimising emission from EUV sources
Author(s)
Gerry O’Sullivan, Bowen Li, Takeshi Higashiguchi, Thomas Cummins, Padraig Dunne, Paddy Hayden, Deirdre Kilbane, Imam Kambali, Colm O’Gorman, Hayato Ohashi, Takamitsu Otsuka, Chihiro Suzuki, Emma Sokell, Noboru Yugami, Sergey Zakharov, Vasily Zakharov
Organizer
レーザー学会,第450回研究会
Place of Presentation
早稲田大学西早稲田キャンパス
Related Report
Invited
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