| Budget Amount *help |
¥5,460,000 (Direct Cost: ¥4,200,000、Indirect Cost: ¥1,260,000)
Fiscal Year 2014: ¥1,690,000 (Direct Cost: ¥1,300,000、Indirect Cost: ¥390,000)
Fiscal Year 2013: ¥1,950,000 (Direct Cost: ¥1,500,000、Indirect Cost: ¥450,000)
Fiscal Year 2012: ¥1,820,000 (Direct Cost: ¥1,400,000、Indirect Cost: ¥420,000)
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| Outline of Final Research Achievements |
In order to increase the uniaxial magnetocrystalline anisotropy constant (Ku) of CoPt-oxide granular film by sputtering, the columnar CoPt-oxide granular films with perfect hcp and compositional modulated atomic layers were investigated. About the increasing Ku of CoPt alloy, the maximum Ku value reached around 10 times larger by Pt atoms in the Co50Pt50 films were replaced by Rh atoms and Co80Pt20 films with perfect hcp and compositional modulated atomic layers. About the process technology to formed CoPt-oxide granular film, we revealed the impurity gases (H2O and so on) and the relation between film composition and the Ar gas pressure in sputtering. Furthermore, we developed the new type sputtering target, the oxygen composition in the granular film could be adjusted to be O/Si= 2.
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