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Detail evaluation of electron velocity in GaN HEMTs

Research Project

Project/Area Number 24560392
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeMulti-year Fund
Section一般
Research Field Electron device/Electronic equipment
Research InstitutionTohoku University

Principal Investigator

SUEMITSU Tetsuya  東北大学, 電気通信研究所, 准教授 (90447186)

Project Period (FY) 2012-04-01 – 2015-03-31
Project Status Completed (Fiscal Year 2014)
Budget Amount *help
¥5,330,000 (Direct Cost: ¥4,100,000、Indirect Cost: ¥1,230,000)
Fiscal Year 2014: ¥1,690,000 (Direct Cost: ¥1,300,000、Indirect Cost: ¥390,000)
Fiscal Year 2013: ¥1,950,000 (Direct Cost: ¥1,500,000、Indirect Cost: ¥450,000)
Fiscal Year 2012: ¥1,690,000 (Direct Cost: ¥1,300,000、Indirect Cost: ¥390,000)
Keywords窒化物半導体 / 電界効果トランジスタ / マイクロ波・ミリ波 / 窒化物トランジスタ / GaN / トランジスタ
Outline of Final Research Achievements

The electron velocity in gallium nitride (GaN) high electron mobility transistors (HEMTs), which is one of important parameters to estimate the high-frequency characteristics of the transistors, is evaluated by means of the gate delay time analysis in the samples with different gate/field plate structures. The drain depletion region is clearly separated from the gate depletion region through the gate delay time analysis of these samples. The result suggests an electron velocity of 1.21-1.27 x 10^7 cm/s in 180-nm-gate GaN HEMTs.

Report

(4 results)
  • 2014 Annual Research Report   Final Research Report ( PDF )
  • 2013 Research-status Report
  • 2012 Research-status Report
  • Research Products

    (14 results)

All 2015 2014 2013 Other

All Journal Article (3 results) (of which Peer Reviewed: 3 results) Presentation (11 results) (of which Invited: 1 results)

  • [Journal Article] Current collapse suppression in AlGaN/GaN HEMTs by means of slant field plates fabricated by multi-layer SiCN2014

    • Author(s)
      Kengo Kobayashi, Shinya Hatakeyama, Tomohiro Yoshida, Daniel Piedra, Tomás Palacios, Taiichi Otsuji, Tetsuya Suemitsu
    • Journal Title

      Solid State Electron

      Volume: 101 Pages: 63-69

    • DOI

      10.1016/j.sse.2014.06.022

    • Related Report
      2014 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Improved breakdown voltage and RF characteristics in AlGaN/GaN high electron mobility transistors achieved by slant field plates2014

    • Author(s)
      Kengo Kobayashi, Shinya Hatakeyama, Tomohiro Yoshida, Yuhei Yabe, Daniel Piedra, Tomás Palacios, Taiichi Otsuji, Tetsuya Suemitsu
    • Journal Title

      Appl. Phys. Express

      Volume: 7 Issue: 9 Pages: 096501-096501

    • DOI

      10.7567/apex.7.096501

    • NAID

      210000137238

    • Related Report
      2014 Annual Research Report
    • Peer Reviewed
  • [Journal Article] AlGaN/GaN MIS-gate HEMTs with SiCN gate stacks2013

    • Author(s)
      K. Kobayashi, M. Kano, T. Yoshida, R. Katayama, T. Matsuoka, T. Otsuji, T. Suemitsu
    • Journal Title

      Physica Status Solidi (c)

      Volume: 10 Issue: 5 Pages: 790-793

    • DOI

      10.1002/pssc.201200609

    • NAID

      110009728022

    • Related Report
      2012 Research-status Report
    • Peer Reviewed
  • [Presentation] Drain depletion length in InAlN/GaN MIS-HEMTs with slant field plates2015

    • Author(s)
      N. Yasukawa, S. Hatakeyama, T. Yoshida, T. Kimura, T. Matsuoka, T. Otsuji, and T. Suemitsu
    • Organizer
      42nd International Symposium on Compound Semiconductors
    • Place of Presentation
      アメリカ・サンタバーバラ
    • Year and Date
      2015-06-28 – 2015-07-02
    • Related Report
      2014 Annual Research Report
  • [Presentation] A new process approach for slant field plates in GaN-based HEMTs2015

    • Author(s)
      T. Suemitsu, K. Kobayashi, S. Hatakeyama, N. Yasukawa, T. Yoshida, T. Otsuji, D. Piedra, and T. Palacios
    • Organizer
      th International Symposium on Advanced Plasma Science and its Applications for Nitride and Nanomaterials
    • Place of Presentation
      名古屋
    • Year and Date
      2015-03-26 – 2015-03-31
    • Related Report
      2014 Annual Research Report
    • Invited
  • [Presentation] InAlN/GaN HEMTs における傾斜型フィールドプレトによるドレイン空乏領域長への影響2015

    • Author(s)
      安川奈那, 畠山信也, 吉田智洋, 尾辻泰一, 末光哲也
    • Organizer
      第62回応用物理学会春季学術講演会
    • Place of Presentation
      平塚
    • Year and Date
      2015-03-11 – 2015-03-14
    • Related Report
      2014 Annual Research Report
  • [Presentation] 傾斜型フィールドプレートを用いたAlGaN/GaN HEMTのRF特性2014

    • Author(s)
      畠山信也, 小林健悟, 吉田智洋, 尾辻泰一, 末光哲也
    • Organizer
      第75回応用物理学会秋季学術講演会
    • Place of Presentation
      札幌
    • Year and Date
      2014-09-16 – 2014-09-20
    • Related Report
      2014 Annual Research Report
  • [Presentation] RF characteristics of AlGaN/GaN HEMTs with slant field plates2014

    • Author(s)
      S. Hatakeyama, K. Kobayashi, T. Yoshida, T. Otsuji, and T. Suemitsu
    • Organizer
      41st International Symposium on Compound Semiconductors
    • Place of Presentation
      フランス・モンペリエ
    • Year and Date
      2014-05-11 – 2014-05-15
    • Related Report
      2014 Annual Research Report
  • [Presentation] 多層SiCNを用いて作製した傾斜型フィールドプレートによるAlGaN/GaN HEMTにおける電流コラプスの抑制2014

    • Author(s)
      小林健悟、畠山信也、吉田智洋、矢部裕平、D. Piedra、T. Palacios、尾辻泰一、末光哲也
    • Organizer
      第61回応用物理学会春季学術講演会
    • Place of Presentation
      神奈川県相模原市
    • Related Report
      2013 Research-status Report
  • [Presentation] InAlN/GaN HEMTsとAlGaN/GaN HEMTsにおける相互コンダクタンスの周波数分散2014

    • Author(s)
      畠山信也、小林健悟、吉田智洋、尾辻泰一、末光哲也
    • Organizer
      第61回応用物理学会春季学術講演会
    • Place of Presentation
      神奈川県相模原市
    • Related Report
      2013 Research-status Report
  • [Presentation] Fabrication of slant field plates for AlGaN/GaN HEMTs by multi-layer SiCN2013

    • Author(s)
      S. Hatakeyama, K. Kobayashi, T. Yoshida, T. Otsuji, T. Suemitsu
    • Organizer
      10th Topical Workshop on Heterostructure Microelectronics (TWHM)
    • Place of Presentation
      北海道函館市
    • Related Report
      2013 Research-status Report
  • [Presentation] Current collapse suppression in AlGaN/GaN HEMTs by means of slant field plates fabricated by multi-layer SiCN2013

    • Author(s)
      K. Kobayashi, S. Hatakeyama, T. Yoshida, D. Piedra, T. Palacios, T. Otsuji, T. Suemitsu
    • Organizer
      International Semiconductor Device Research Symposium (ISDRS)
    • Place of Presentation
      Bethesda, MD, USA
    • Related Report
      2013 Research-status Report
  • [Presentation] 多層SiCN絶縁膜によるAlGaN/GaN HEMT用傾斜フィールドプレートの形成2013

    • Author(s)
      小林健悟,吉田智洋,畠山信也,尾辻泰一,末光哲也
    • Organizer
      電子情報通信学会総合大会
    • Place of Presentation
      岐阜
    • Related Report
      2012 Research-status Report
  • [Presentation] SiCNゲート絶縁膜を用いたAlGaN/GaN MISゲートHEMT

    • Author(s)
      小林健悟,吉田智洋,尾辻泰一,片山竜二,松岡隆志,末光哲也
    • Organizer
      電子情報通信学会電子デバイス研究会
    • Place of Presentation
      東京
    • Related Report
      2012 Research-status Report

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Published: 2013-05-31   Modified: 2019-07-29  

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