Process control of magnetic materials for thin film actuator
Project/Area Number |
24560859
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Research Category |
Grant-in-Aid for Scientific Research (C)
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Allocation Type | Multi-year Fund |
Section | 一般 |
Research Field |
Structural/Functional materials
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Research Institution | Tokai University |
Principal Investigator |
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Project Period (FY) |
2012-04-01 – 2015-03-31
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Project Status |
Completed (Fiscal Year 2014)
|
Budget Amount *help |
¥5,330,000 (Direct Cost: ¥4,100,000、Indirect Cost: ¥1,230,000)
Fiscal Year 2014: ¥1,170,000 (Direct Cost: ¥900,000、Indirect Cost: ¥270,000)
Fiscal Year 2013: ¥1,560,000 (Direct Cost: ¥1,200,000、Indirect Cost: ¥360,000)
Fiscal Year 2012: ¥2,600,000 (Direct Cost: ¥2,000,000、Indirect Cost: ¥600,000)
|
Keywords | アクチュエータ材料 / 薄膜 / プラズマ / 過剰エネルギー / イオン衝撃 / 内部応力 / スパッタリング / イオンプレーティング / 薄膜アクチュエータ / プラズマ計測 / 過飽和固溶体 / 熱応力 / 特性制御 / 磁歪材料 / スパッタ / 磁性材料 |
Outline of Final Research Achievements |
1. Development of new materials for thin film actuator; In this study, Fe-IIIB supersaturated thin film for new magnetrostrictive materials were prepared by ion plating process with dual vapor source. Then discuss the effects of excess energy on thin films nanostructure and solid solubility limit of various solid solution. Excess energy increased with the increase of impinging energy of evaporated particles by rising applied bias voltage and substrate bias voltage. Therefore, excess energy control of ion plating process could be helpful to control solid solubility limit of solid solution. 2. Property Control of thin film actuators; Momentum of ion bombardment in sputtering deposition process, which strongly depends on internal stress of thin films, has been evaluated regarding to a new parameter Pi.. The internal stress of Ni Film changed linearly with the ion bombardment parameter Pi. These results suggest to be useful to control the internal stress of sputtered thin film with the Pi.
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Report
(4 results)
Research Products
(57 results)
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[Journal Article] Ni薄膜に対するイオン衝撃の影響2014
Author(s)
豊田 椋一,宮田 俊平,橋本 真希,坂野 将太,飯島 貴朗,利根川 昭,松村 義人
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Journal Title
第26回「電磁力関連のダイナミクス」シンポジウム(SEAD26)講演論文集
Volume: 1
Pages: 180-183
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Acknowledgement Compliant
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[Presentation] 成膜時の薄膜に対する過剰エネルギーの影響2014
Author(s)
天野 真央,ニヨムワイタヤ チョンラウィット,松村 義人
Organizer
'14 SAS Intelligent Symposium(26th)
Place of Presentation
東海大学湘南校舎, 平塚市
Year and Date
2014-11-13 – 2014-11-14
Related Report
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[Presentation] 過飽和固溶体薄膜の作製における過剰エネルギーの影響2014
Author(s)
ニヨムワイタヤ チョンラウィット,天野 真央,大庭 勇輝,酒井 彰崇,松村 義人
Organizer
日本金属学会2014年秋期講演大会(第155回)
Place of Presentation
名古屋大学 東山キャンパス, 名古屋市
Year and Date
2014-09-24 – 2014-09-26
Related Report
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[Presentation] Ar, Kr, Xe Ion Bombardment Effects on Magnetostrictive Characteristics for Sputtered Thin Films2014
Author(s)
Ryoichi TOYODA,Chonlawich NIYOMUWAITAYA,Soichiro TOYA,Shumpei MIYATA,Maki Hashimoto,Shota SAKANO,Ami KOHRI,Yoshihito Matsumura
Organizer
14th Int.Conf. on New Actuators (ACTUATOR2014)
Place of Presentation
MESSE BREMEN, Bremen, Germany
Year and Date
2014-06-23 – 2014-06-25
Related Report
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[Presentation] Internal Stress Control for Thin Film Actuator2014
Author(s)
Ryoichi TOYODA,Soichiro TOYA,Shumpei MIYATA,Maki Hashimoto,Takaaki IIJIMA,Akira Tonegawa,Yoshihito Matsumura
Organizer
14th Int.Conf. on New Actuators (ACTUATOR2014)
Place of Presentation
MESSE BREMEN, Bremen, Germany
Year and Date
2014-06-23 – 2014-06-25
Related Report
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[Presentation] イオンプレーティング法を用いたFe-Ga薄膜の作製2014
Author(s)
天野 真央,ニヨムワイタヤ チョンラウィット,酒井 彰崇,飯島 貴朗,利根川 昭,松村 義人
Organizer
第26回「電磁力関連のダイナミクス」シンポジウム(SEAD26 in 盛岡)
Place of Presentation
盛岡市 アイーナ 岩手県民情報交流センター
Year and Date
2014-05-21 – 2014-05-23
Related Report
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[Presentation] Ni薄膜に対するイオン衝撃の影響2014
Author(s)
豊田 椋一,宮田 俊平,橋本 真希,坂野 将太,飯島 貴朗,利根川 昭,松村 義人
Organizer
26回「電磁力関連のダイナミクス」シンポジウム(SEAD26 in 盛岡)
Place of Presentation
盛岡市 アイーナ 岩手県民情報交流センター
Year and Date
2014-05-21 – 2014-05-23
Related Report
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