What should we do for fabrication of silicon nano structures using soft lithography techniques ?
Project/Area Number |
24560861
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Research Category |
Grant-in-Aid for Scientific Research (C)
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Allocation Type | Multi-year Fund |
Section | 一般 |
Research Field |
Structural/Functional materials
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Research Institution | Toyo University |
Principal Investigator |
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Co-Investigator(Kenkyū-buntansha) |
MAEKAWA Toru 東洋大学, 理工学部, 教授 (40165634)
NAKAJIMA Yoshikata 東洋大学, 学際・融合科学研究科, 准教授 (40408993)
MIZUKI Toru 東洋大学, 学際・融合科学研究科, 准教授 (80408997)
HIGASHI Toshiaki 東洋大学, バイオ・ナノエレクトロニクス研究センター, 研究助手 (90624742)
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Project Period (FY) |
2012-04-01 – 2015-03-31
|
Project Status |
Completed (Fiscal Year 2014)
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Budget Amount *help |
¥5,200,000 (Direct Cost: ¥4,000,000、Indirect Cost: ¥1,200,000)
Fiscal Year 2014: ¥1,560,000 (Direct Cost: ¥1,200,000、Indirect Cost: ¥360,000)
Fiscal Year 2013: ¥1,820,000 (Direct Cost: ¥1,400,000、Indirect Cost: ¥420,000)
Fiscal Year 2012: ¥1,820,000 (Direct Cost: ¥1,400,000、Indirect Cost: ¥420,000)
|
Keywords | SPM / μ-TAS / SOQ / SOI / GO / rGO / ECM / MPC / PCR / GO / シリコンナノ粒子 / MPC / μ‐TAS |
Outline of Final Research Achievements |
We established some techniques critical for design and fabrication bio-nano fusion systems by using soft lithography. We succeeded in developing a high-performance SPM for soft lithography. This SPM has atomic spatial resolution, and it has advantages for next-generation ultra fine patterning. We proposed that PDMS, grapheme and related materials should be helpful for ultra fine patterning of Si wires to develop novel devices for bio-nano fusion systems. We characterized fundamental properties of the advanced materials, and optimized their coating conditions for soft lithography. Finally, we proposed that SOI(Silicon On Insulator) wafers or SOQ (Silicon On Quartz) wafers should be favorable for platforms of bio-nano fusion systems, and we succeeded in analyzing the behaviors of electric fields in quarts layers of SOI wafers or SOQ wafers by formulating models using conformal transformation technique.
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Report
(4 results)
Research Products
(29 results)
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[Journal Article] Patterning: N2-Plasma-Assisted One-Step Alignment and Patterning of Graphene Oxide on a SiO2/Si Substrate Via the Langmuir-Blodgett Technique2015
Author(s)
N. Chauhan,, V, Palaninathan, S. Raveendran, AC Poulose, Y .Nakajima, T. Hasumura, T. Uchida, T. Hanajiri, T .Maekawa and DS.Kumar
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Journal Title
ADVANCED MATERIALS INTERFACES
Volume: 2
Issue: 5
DOI
Related Report
Peer Reviewed / Acknowledgement Compliant
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[Journal Article] Quantitative Extraction of Electric Flux in the Buried-Oxide Layer and Investigation of Its Effects on MOSFET Characteristics2013
Author(s)
Yamada, Tatsuya, Abe, Shumpei, Nakajima, Yoshikata, Hanajiri, Tatsuro, Toyabe, Toru, Sugano, Takuo
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Journal Title
IEEE TRANSACTIONS ON ELECTRON DEVICES
Volume: 60
Issue: 12
Pages: 3996-4001
DOI
Related Report
Peer Reviewed
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[Journal Article] Ecofriendly Route for the Synthesis of Highly Conductive Graphene Using Extremophiles for Green Electronics and Bioscience2013
Author(s)
S. Raveendran, N. Chauhan, Y. Nakajima, H. Toshiaki, S. Kurosu, Y. Tanizawa, R. Tero, Y. Yoshida, T. Hanajiri, T. Maekawa, P. M. Ajayan, A. Sandhu and D. S. Kumar
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Journal Title
Part. Part. Syst. Charact
Volume: 30
Issue: 7
Pages: 573-578
DOI
Related Report
Peer Reviewed
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