| Project/Area Number |
24651157
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| Research Category |
Grant-in-Aid for Challenging Exploratory Research
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| Allocation Type | Single-year Grants |
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| Research Field |
Microdevices/Nanodevices
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| Research Institution | Tohoku University |
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Principal Investigator |
KUWANO Hiroki 東北大学, 工学(系)研究科(研究院), 教授 (50361118)
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| Co-Investigator(Kenkyū-buntansha) |
HARA Motoaki 東北大学, 大学院工学研究科, 准教授 (00417966)
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| Project Period (FY) |
2012-04-01 – 2014-03-31
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| Project Status |
Completed (Fiscal Year 2013)
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| Budget Amount *help |
¥4,030,000 (Direct Cost: ¥3,100,000、Indirect Cost: ¥930,000)
Fiscal Year 2013: ¥780,000 (Direct Cost: ¥600,000、Indirect Cost: ¥180,000)
Fiscal Year 2012: ¥3,250,000 (Direct Cost: ¥2,500,000、Indirect Cost: ¥750,000)
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| Keywords | マイクロファブリケーション / MEMS / FIB / イオン液体 / 集束イオンビーム / マイクロイオン源アレイ |
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| Research Abstract |
We succeeded a fabrication of focused micro ion source array using micromachining technologies. Our micro ion source has below than 50 nm in tip radius, 50 um in emitter radius, and 150 um in emitter height. Twenty five (5x5) micro ion sources were fabricated by butch processing in the area 4 mm2. Micro ion beam of ion liquid (EMIM-BF4) was confirmed. By using Quadra pole mass spectroscopy, it is shown that our micro ion beam etches Si substrate reactively.
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