Magnet-free microwave sputter deposition with uniform target utilization

• Project/Area Number: 24654189
• Research Category: Grant-in-Aid for Challenging Exploratory Research
• Allocation Type: Single-year Grants
• Research Field: Plasma science
• Research Institution: Nagoya University
• Principal Investigator: TOYODA Hirotaka 名古屋大学, 工学(系)研究科(研究院), 教授 (70207653)
• Project Period (FY): 2012-04-01 – 2014-03-31
• Project Status: Completed (Fiscal Year 2013)
• Budget Amount: ¥3,770,000 (Direct Cost: ¥2,900,000、Indirect Cost: ¥870,000); Fiscal Year 2013: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000); Fiscal Year 2012: ¥2,730,000 (Direct Cost: ¥2,100,000、Indirect Cost: ¥630,000)
• Keywords: マイクロ波 / スパッタ / 表面波 / 均一プラズマ

Research Abstract

The purpose of this research is to obtain guideline for the development of two-dimensionally-uniform sputtering system using mirowave plasma production. Through this research, low pressure plasma production using microwave power is successfully realized. Furthermore, by applying RF power to the microwave plasma, uniform dielectric sputtering is realized with 10 cm square area. This is innovative result that cannot be realized by conventional sputtering system that utilize magnetic field. The result obtained by this project can be applied to various electronic device manufacturing.

Research Products

• [Journal Article] 酸化物ターゲットを用いたRFマグネトロンプラズマにおける高エネルギー粒子の挙動 (2014)
  • Author(s): 豊田浩孝
  • Journal Title: Journal of Vacuum Society of Japan Volume: Vol. 57No.3 Pages: 80-83
  • NAID: 130003394506
• [Journal Article] 酸化物ターゲットを用いたRFマグネトロンプラズマにおける高エネルギー粒子の挙動 (2014)
  • Author(s): 豊田 浩孝
  • Journal Title: Journal of the Vacuum Society of Japan Volume: 57, No.3 Pages: 80-83
  • NAID: 130003394506
  • Peer Reviewed
• [Presentation] Development of Magnet-Free Uniform Sputtering System by RF and Microwave Power Superposition (2014)
  • Author(s): Hagihara, T. Noda and H. Toyoda
  • Organizer: 8^<th> Int. Conf. on Reactive Plasmas
  • Place of Presentation: Fukuoka, Japan
• [Presentation] Magnet-Free Sputtering System Using Surface Wave Plasma (2014)
  • Author(s): T. Hagihara, T. Noda and H. Toyoda
  • Organizer: 2014 Int. Sympo. on Plasma and Its Application to Nitride and Nanomaterials
  • Place of Presentation: Nagoya, Japan
• [Presentation] Development of Magnet-Free Sputtering System for Dielectric Film Deposition (2013)
  • Author(s): T. Noda and H. Toyoda
  • Organizer: 35^<th> Int. Sympo. Dry Process
  • Place of Presentation: Jeju, Korea
• [Presentation] Development of Magnet-Free Sputtering System for Dielectric Film Deposition with Surface-wave Excited Plasma (2013)
  • Author(s): Noda and H. Toyoda
  • Organizer: 66^<th> Gaseous Electronics Conference
  • Place of Presentation: Princeton, USA
• [Presentation] Development of Magnet-Free Uniform Sputtering System for Dielectric Film Deposition
  • Author(s): Tomonori Noda, and Hirotaka Toyoda
  • Organizer: 35th International Symposium on Dry Process
  • Place of Presentation: Ramada Plaza Jeju Hotel （Jeju, Korea）
• [Presentation] Development of Magnet-Free Sputtering System for Dielectric Film Deposition with Surface-Wave Excited Plasma
  • Author(s): T. Noda,T. Hagihara, H. Toyoda
  • Organizer: 66th Annual Gaseous Electronics Conference
  • Place of Presentation: Westin Hotel ( Princeton, New Jersey, USA)
• [Presentation] Development of Magnet-Free Uniform Sputtering System by RF and Microwave Power Superposition
  • Author(s): Toshiya Hagihara, Tomonori Noda, Hirotaka Toyoda
  • Organizer: ICRP-8/SPP-3
  • Place of Presentation: Fukuoka Convention Center (Fukuoka, Japan)
• [Presentation] Magnet-Free Sputtering System Using Surface Wave Plasma
  • Author(s): Toshiya Hagihara, Tomonori Noda and Hirotaka Toyoda
  • Organizer: ISPlasma2014/IC-PLANTS2014
  • Place of Presentation: Meijo University (Nagoya, Japan)
• [Presentation] 低圧環境下における高密度マイクロ波プラズマの生成
  • Author(s): 野田 智紀，中坊 将人，豊田 浩孝
  • Organizer: 平成24年度電気関係学会東海支部連合大会
  • Place of Presentation: 豊橋技術科学大学（愛知県）
• [Presentation] Production of Surface-Wave Excited Plasma in Low Pressures
  • Author(s): T.Noda, M. Nakabo and H. Toyoda
  • Organizer: 5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials
  • Place of Presentation: 名古屋大学（愛知県）
• [Presentation] Surface-Wave Excited Plasma Produced in Low Pressures
  • Author(s): T. Noda, M. Nakabo and H. Toyoda
  • Organizer: 6ｔｈ International Conference on Plasma-Nano Technology & Science
  • Place of Presentation: 下呂交流会館（岐阜県）
• [Presentation] 低圧環境下における無磁場マイクロ波プラズマ生成と応用
  • Author(s): 野田 智紀，中坊 将人，豊田 浩孝
  • Organizer: 第60回応用物理学関係連合講演会
  • Place of Presentation: 神奈川工科大学
• [Patent(Industrial Property Rights)] スパッタ成膜装置 (2013)
  • Inventor(s): 笹井建典、豊田浩孝
  • Industrial Property Rights Holder: 東海ゴム工業株式会社、名古屋大学
  • Industrial Property Rights Type: 特許
  • Industrial Property Number: 2013-015453
  • Filing Date: 2013-01-30