Making device functions on microtrench sidewall through three-dimensional photolithograpy
| Project/Area Number |
24656066
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| Research Category |
Grant-in-Aid for Challenging Exploratory Research
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| Allocation Type | Single-year Grants |
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| Research Field |
Applied physics, general
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| Research Institution | Toyota Technological Institute |
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Principal Investigator |
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| Co-Investigator(Renkei-kenkyūsha) |
SASAKI Minoru 豊田工業大学, 工学部, 教授 (70282100)
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| Project Period (FY) |
2012-04-01 – 2014-03-31
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| Project Status |
Completed (Fiscal Year 2013)
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| Budget Amount *help |
¥2,210,000 (Direct Cost: ¥1,700,000、Indirect Cost: ¥510,000)
Fiscal Year 2013: ¥1,170,000 (Direct Cost: ¥900,000、Indirect Cost: ¥270,000)
Fiscal Year 2012: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000)
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| Keywords | マイクロマシン / マイクロ流路デバイス / マイクロ・ナノデバイス / 流れ解析 / マイクロ流体デバイス |
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| Research Abstract |
A novel micro-electro-mechanical systems (MEMS) device was fabricated through three-dimensional (3D) photolithography. The MEMS device in the present study was a particle sorter. The sorter uses electrostatic force and fluid flow for separating particles in a liquid. To enhance the electrostatic force, the working electrodes were designed on the microtrench sidewall. Since the sidewalls have not been used to exhibit device functions, the approach here would be a great step to expand the possibility of MEMS devices. The 3D photolithography consists of photoresist spray-coating for uniform photoresist deposition on the microtrench and angled exposure for patterning the trench sidewall. Through the numerical simulation, the uniformity of spray-coated photoresist film was improved. The numerical simulation was also applied to designing the microfluidics channels. With the careful device design and the 3D photolithography, the particle sorter devices were fabricated on a glass substrate.
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Report
(3 results)
Research Products
(10 results)
