The study of electroforming mold for glass thermal imprinting
Project/Area Number |
24760112
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Research Category |
Grant-in-Aid for Young Scientists (B)
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Allocation Type | Multi-year Fund |
Research Field |
Production engineering/Processing studies
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Research Institution | Kanagawa Industrial Technology Center |
Principal Investigator |
YASUI Manabu 神奈川県産業技術センター, その他部局等, 研究員 (80426361)
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Project Period (FY) |
2012-04-01 – 2015-03-31
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Project Status |
Completed (Fiscal Year 2014)
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Budget Amount *help |
¥4,420,000 (Direct Cost: ¥3,400,000、Indirect Cost: ¥1,020,000)
Fiscal Year 2014: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000)
Fiscal Year 2013: ¥910,000 (Direct Cost: ¥700,000、Indirect Cost: ¥210,000)
Fiscal Year 2012: ¥2,210,000 (Direct Cost: ¥1,700,000、Indirect Cost: ¥510,000)
|
Keywords | マイクロ・ナノ加工 / 電鋳金型 / Ni-Wめっき / 電子線描画 / 電鋳 / ナノパターン / Ni-W / ガラス / ネガ型レジスト / Ni-W電鋳 / 残渣 / サブミクロンパターン / エポキシ樹脂 |
Outline of Final Research Achievements |
In order to enhance the capabilities of micro optical element or biosensor and so on, researches in connection with sub-wavelength structure have been conducted. On the other hand, glass is a superior material in optical property or low self-fluorescent. So glass imprinting that forms sub-wavelength structure on glass surface is drawn attention to. In this study, we studied the method of preparing essential mold for glass imprinting. Resin master was made by electron beam lithography using negative photoresist. Flat Ni-W electroforming was developed by suppression of nodule. And a prototype of alloy electroformed mold in 480 nm pitch for glass nano imprinting was built.
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Report
(4 results)
Research Products
(13 results)
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[Journal Article] Preparation of Diamond-Like Carbon on Ti Film with Tetramethylsilane Buffer Layer2013
Author(s)
S. Kaneko, T. Horiuchi, T. Ito, S. Takagi, M. Yasui, M. Saitoh, T. Matsunaga, K. Ikenaga, S. Yasuhara, K. Mihirogi,M. Kobayashi, M. Kumagai, E. Shimodaira, and R. Sudo
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Journal Title
Japanese Journal of Applied Physics
Volume: 52
Issue: 11S
Pages: 11NA02-11NA02
DOI
NAID
Related Report
Peer Reviewed
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[Presentation] Expansion of Lattice Constants of Aluminum Nitride Thin Film Prepared on Sapphire Substrate by ECR Plasma Sputtering Method2014
Author(s)
S. Kaneko, T. Ito, M. Yasui, M. Kurouchi, H. Torii, T. Amazawa, A. Fukushima, T. Tokumasu, S. Lee, S. Park, M. Yoshimoto
Organizer
ISPlasma 2014
Place of Presentation
名城大学
Related Report
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