| Budget Amount *help |
¥4,420,000 (Direct Cost: ¥3,400,000、Indirect Cost: ¥1,020,000)
Fiscal Year 2014: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000)
Fiscal Year 2013: ¥910,000 (Direct Cost: ¥700,000、Indirect Cost: ¥210,000)
Fiscal Year 2012: ¥2,210,000 (Direct Cost: ¥1,700,000、Indirect Cost: ¥510,000)
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| Outline of Final Research Achievements |
In order to enhance the capabilities of micro optical element or biosensor and so on, researches in connection with sub-wavelength structure have been conducted. On the other hand, glass is a superior material in optical property or low self-fluorescent. So glass imprinting that forms sub-wavelength structure on glass surface is drawn attention to. In this study, we studied the method of preparing essential mold for glass imprinting. Resin master was made by electron beam lithography using negative photoresist. Flat Ni-W electroforming was developed by suppression of nodule. And a prototype of alloy electroformed mold in 480 nm pitch for glass nano imprinting was built.
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