| Budget Amount *help |
¥4,550,000 (Direct Cost: ¥3,500,000、Indirect Cost: ¥1,050,000)
Fiscal Year 2014: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000)
Fiscal Year 2013: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000)
Fiscal Year 2012: ¥2,470,000 (Direct Cost: ¥1,900,000、Indirect Cost: ¥570,000)
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| Outline of Final Research Achievements |
As a clean technique, micro ice jets generated from air and water used by the Laval nozzle were utilized in the semiconductor manufacturing process. The removal tests for the organic chemical film were conducted in order to investigate the peeling performance of micro ice jets operated at the air total pressure of 1.4MPa in combination with the measurement of the particle velocity by a phase Doppler particle analyzer. As the results, the depth of the shape peeled by micro ice jets was the longest at the nozzle length L of 250mm, although the particle velocity at the center of the nozzle exit was the largest at L=200mm. These results indicate that the removal performance of micro ice jets was strongly affected by the both the particle velocity and the production amount of ice.
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