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Development of electronic application on amorphous carbon films by electronic defect reduction by deuterium

Research Project

Project/Area Number 24760254
Research Category

Grant-in-Aid for Young Scientists (B)

Allocation TypeMulti-year Fund
Research Field Electronic materials/Electric materials
Research InstitutionTokyo Institute of Technology

Principal Investigator

AKASAKA HIROKI  東京工業大学, 理工学研究科, 准教授 (80500983)

Project Period (FY) 2012-04-01 – 2014-03-31
Project Status Completed (Fiscal Year 2013)
Budget Amount *help
¥4,550,000 (Direct Cost: ¥3,500,000、Indirect Cost: ¥1,050,000)
Fiscal Year 2013: ¥3,380,000 (Direct Cost: ¥2,600,000、Indirect Cost: ¥780,000)
Fiscal Year 2012: ¥1,170,000 (Direct Cost: ¥900,000、Indirect Cost: ¥270,000)
Keywordsアモルファス炭素系膜 / 重水素 / 同位体効果 / 電子欠陥密度低減 / アモルファス炭素膜
Research Abstract

To reduce the electronic defect density on the amorphous carbon films, the deuterium was used for its isotope effect. Two types of amorphous carbon films were synthesized from normal methane and deuteration methane to compare their electronic defect density. Although these films were deposited same deposition condition and indicated similar structures such as the sp2/sp3 carbon ratio,
the electronic defect densities on the obtained films were different. Electronic defect density on the deuterated amorphous carbon film was lower approximately one digit than 10**18 /cm3 and a hydrogenated amorphous carbon film. These results indicated that the deuteration for amorphous carbon film have effects on the electronic defect density reduction on amorphous carbon film.

Report

(3 results)
  • 2013 Annual Research Report   Final Research Report ( PDF )
  • 2012 Research-status Report
  • Research Products

    (12 results)

All 2014 2013

All Presentation (12 results)

  • [Presentation] Isotopic influence on amorphous carbon films2014

    • Author(s)
      Yutaro Suzuki, Tsuneo Suzuki, Kazuhiro Kanda, Naoto Ohtake, Hiroki Akasaka
    • Organizer
      The 15th International Union of Materials Research Societies, International Conference in Asia
    • Place of Presentation
      福岡大学
    • Related Report
      2013 Final Research Report
  • [Presentation] 物理気相成長法によるアモルファス同位体炭素膜の作製2014

    • Author(s)
      鈴木裕太郎, 藤井瞭, 大竹尚登, 赤坂大樹
    • Organizer
      第61回応用物理学会春季学術講演会
    • Place of Presentation
      青山学院大学
    • Related Report
      2013 Final Research Report
  • [Presentation] 物理気相成長法によるアモルファス同位体炭素膜の作製2014

    • Author(s)
      鈴木裕太郎,藤井 瞭,大竹尚登,赤坂大樹
    • Organizer
      第61回応用物理学会春季学術講演会(
    • Place of Presentation
      青山学院大学
    • Related Report
      2013 Annual Research Report
  • [Presentation] Isotopic influence on amorphous carbon films2014

    • Author(s)
      Yutaro Suzuki, Tsuneo Suzuki, Kazuhiro Kanda, Naoto Ohtake1, Hiroki Akasaka
    • Organizer
      IUMRS-ICA2014
    • Place of Presentation
      Fukuoka Univ., Japan
    • Related Report
      2013 Annual Research Report
  • [Presentation] ^<13>Cターゲットからのアモルファス炭素膜の作製2013

    • Author(s)
      鈴木裕太郎, 藤井瞭, 斎藤啓, 大竹尚登, 赤坂大樹
    • Organizer
      第27回ダイヤモンドシンポジウム
    • Place of Presentation
      日本工業大学
    • Related Report
      2013 Final Research Report
  • [Presentation] Deposition of stable isotopic amorphous carbon films from isotopic methane gases2013

    • Author(s)
      Yutaro Suzuki, Tsuneo Suzuki, Naoto Ohtake, Hiroki Akasaka
    • Organizer
      21st International Symposium on Plasma Chemistry
    • Place of Presentation
      Cairns Convention Centre (Australia)
    • Related Report
      2013 Final Research Report
  • [Presentation] 同位体原料からのアモルファス炭素膜の作製2013

    • Author(s)
      鈴木裕太郎, 鈴木常生, 大竹尚登, 赤坂大樹
    • Organizer
      第60回応用物理学会春季学術講演会
    • Place of Presentation
      神奈川工科大学
    • Related Report
      2013 Final Research Report
  • [Presentation] 同位体メタン系ガスを用いたアモルファス炭素膜の作製2013

    • Author(s)
      鈴木裕太郎, 鈴木常生, 大竹尚登, 赤坂大樹
    • Organizer
      精密工学会2013年度春季大会
    • Place of Presentation
      東京工業大学
    • Related Report
      2013 Final Research Report
  • [Presentation] Deposition of stable isotopic amorphous carbon films from isotopic methane gases2013

    • Author(s)
      Yutaro Suzuki, Tsuneo Suzuki, Naoto Ohtake1, Hiroki Akasaka
    • Organizer
      21st International Symposium on Plasma Chemistry (ISPC 21)
    • Place of Presentation
      Cairns Convention Centre, Queensland, Australia
    • Related Report
      2013 Annual Research Report
  • [Presentation] 13Cターゲットからのアモルファス炭素膜の作製2013

    • Author(s)
      鈴木裕太郎,藤井 瞭,斎藤 啓,大竹尚登,赤坂大樹
    • Organizer
      第27回ダイヤモンドシンポジウム
    • Place of Presentation
      日本工業大学
    • Related Report
      2013 Annual Research Report
  • [Presentation] 同位体メタン系ガスを用いたアモルファス炭素膜の作製2013

    • Author(s)
      鈴木裕太郎,鈴木常生,大竹尚登,赤坂大樹
    • Organizer
      精密工学会2013年度春季大会
    • Place of Presentation
      東京工業大学(東京都目黒区)
    • Related Report
      2012 Research-status Report
  • [Presentation] 同位体原料からのアモルファス炭素膜の作製2013

    • Author(s)
      鈴木 裕太郎,鈴木 常生,大竹 尚登,赤坂 大樹
    • Organizer
      2013年 第60回応用物理学会春季学術講演会
    • Place of Presentation
      神奈川工科大学(神奈川県厚木市)
    • Related Report
      2012 Research-status Report

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Published: 2013-05-31   Modified: 2019-07-29  

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