| Project/Area Number |
24760602
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| Research Category |
Grant-in-Aid for Young Scientists (B)
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| Allocation Type | Multi-year Fund |
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| Research Field |
Material processing/treatments
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| Research Institution | Sophia University |
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Principal Investigator |
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| Project Period (FY) |
2012-04-01 – 2014-03-31
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| Project Status |
Completed (Fiscal Year 2013)
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| Budget Amount *help |
¥3,900,000 (Direct Cost: ¥3,000,000、Indirect Cost: ¥900,000)
Fiscal Year 2013: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000)
Fiscal Year 2012: ¥2,860,000 (Direct Cost: ¥2,200,000、Indirect Cost: ¥660,000)
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| Keywords | 薄膜堆積 / 金属酸化物 / 超臨界流体 / 二酸化炭素 / 薄膜材料 / 超臨界流体堆積 / 材料加工・処理 / 薄膜プロセス / 無機材料 |
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| Research Abstract |
The purpose of this research is to consider the reaction condition for forming metal-oxide deposition from metal-organic precursors under the field of supercritical CO2 fluid (scCO2), as well as its application for processing of thin-film materials.
This research revealed that (i) decomposition reaction of the precursors (metal alkoxides or beta-diketonate complexes) could be promoted by simply raising the temperature of scCO2 and/or adding some promoting agents (oxidizers, catalysts, etc.), (b) the solubility of the precursors in scCO2 could be dependent on their ligand structures, and (iii) the film-deposition process under scCO2 condition enabled low-temperature deposition under 300 degree C that yielded metal-oxide thin films such as SiO2, ZrO2, and TiO2 applicable for constructing dielectric capacitors.
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