Multiphysics simulation of electron beam nanoprocess

• Project/Area Number: 25249052
• Research Category: Grant-in-Aid for Scientific Research (A)
• Allocation Type: Single-year Grants
• Section: 一般
• Research Field: Electron device/Electronic equipment
• Research Institution: Osaka Prefecture University
• Principal Investigator: YASUDA Masaaki 大阪府立大学, 工学(系)研究科(研究院), 准教授 (30264807)
• Co-Investigator(Kenkyū-buntansha): KOTERA MASATOSHI 大阪工業大学, 工学部, 教授 (40170279) ; TADA KAZUHIRO 富山高等専門学校, 電気制御システム工学科, 准教授 (90579731)
• Project Period (FY): 2013-05-31 – 2016-03-31
• Project Status: Completed (Fiscal Year 2015)
• Budget Amount: ¥45,630,000 (Direct Cost: ¥35,100,000、Indirect Cost: ¥10,530,000); Fiscal Year 2015: ¥8,450,000 (Direct Cost: ¥6,500,000、Indirect Cost: ¥1,950,000); Fiscal Year 2014: ¥11,830,000 (Direct Cost: ¥9,100,000、Indirect Cost: ¥2,730,000); Fiscal Year 2013: ¥25,350,000 (Direct Cost: ¥19,500,000、Indirect Cost: ¥5,850,000)
• Keywords: 電子ビーム / ナノプロセス / マルチフィジックス / 分子動力学 / モンテカルロ法 / 計算物理 / 分子動力学法

Outline of Final Research Achievements

Multiphysics simulations are performed to study various physical phenomena in electron beam nanoprocesses. The simulations consist of a Monte Carlo simulation of electron scattering and molecular dynamics simulation. Some issues encountered in electron beam nanoprocesses such as electron irradiation defects, resist heating effects and charging effects are simultaneously analyzed using the simulations. The simulations revealed the correlations among those physical phenomena under electron irradiation and the effects of those phenomena on the electron beam fabrications and modifications.

Research Products

• [Int'l Joint Research] McGill University(Canada)
• [Journal Article] Molecular Dynamics Study of Line Edge Roughness and the Proximity Effect in Electron Beam Lithography (2015)
  • Author(s): S. Hitomi, K. Michishita, H. Kawata, Y. Hirai and M. Yasuda
  • Journal Title: Journal of Photopolymer Science and Technology Volume: 28 Issue: 5 Pages: 677-682
  • DOI: 10.2494/photopolymer.28.677
  • NAID: 130005104283
  • ISSN: 0914-9244, 1349-6336
  • Peer Reviewed / Open Access / Acknowledgement Compliant
• [Journal Article] Correlation between Electron-Irradiation Defects and Applied Stress in Graphene: A Molecular Dynamics Study (2015)
  • Author(s): S. Kida, M. Yamamoto, K. Tada, H. Kawata, Y. Hirai and M. Yasuda
  • Journal Title: Journal of Vacuum Science and Technology A Volume: 33 Issue: 5
  • DOI: 10.1116/1.4928414
  • Peer Reviewed / Acknowledgement Compliant
• [Journal Article] Multiscale simulation of resist pattern shrinkage during scanning electron microscope observations (2015)
  • Author(s): M. Yasuda, Y. Furukawa, H. Kawata and Y. Hirai
  • Journal Title: Journal of Vacuum Science and Technology B Volume: 33 Issue: 6
  • DOI: 10.1116/1.4935956
  • Peer Reviewed / Acknowledgement Compliant
• [Journal Article] Electron beam lithography simulation for sub-10 nm patterning (2014)
  • Author(s): K. Michishita, M. Yasuda, H. Kawata and Y. Hirai
  • Journal Title: Japanese Journal of Applied Physics Volume: 53 Issue: 6S Pages: 06JB02-06JB02
  • DOI: 10.7567/jjap.53.06jb02
  • NAID: 210000144069
  • Peer Reviewed / Acknowledgement Compliant
• [Journal Article] Defect formation and transformation in graphene under electron irradiation: A molecular dynamics study (2014)
  • Author(s): M. Yamamoto, Y. Asayama, M. Yasuda, H. Kawata and Y. Hirai
  • Journal Title: Journal of Vacuum Science and Technology B Volume: 32 Issue: 6
  • DOI: 10.1116/1.4897304
  • Peer Reviewed / Acknowledgement Compliant
• [Journal Article] トップダウンナノ加工のシミュレーションとナノ空間創生 (2014)
  • Author(s): 安田雅昭、多田和広、平井義彦
  • Journal Title: 機能材料 Volume: 34 Pages: 41-49
• [Journal Article] Correlation between Electron Irradiation Defects and Applied Stress in Carbon Nanotubes: A Molecular Dynamics Study (2013)
  • Author(s): M. Yasuda, Y. Chihara, K. Tada, H. Kawata and Y. Hirai
  • Journal Title: Journal of Vacuum Science & Technology B Volume: 31 Issue: 6 Pages: 06FF06-06FF06
  • DOI: 10.1116/1.4823760
  • Peer Reviewed
• [Presentation] Multiphysics Simulation of Nanopatterning in Electron Beam Lithography (2016)
  • Author(s): M. Yasuda, K. Tada and M. Kotera
  • Organizer: 33rd International Conference of Photopolymer Science and Technology
  • Place of Presentation: Makuhari Messe, Chiba, Japan
  • Year and Date: 2016-06-24
  • Int'l Joint Research / Invited
• [Presentation] Simulation of Three-dimensional Electron Charge distribution of PMMA film on Si substrate by electron beam irradiation (2016)
  • Author(s): A. Fukuzawa and M. Kotera
  • Organizer: The 23rd Symposium on Photomask and NGL Mask Technology
  • Place of Presentation: Pacifico Yokohama, Yokohama, Japan
  • Year and Date: 2016-04-07
  • Int'l Joint Research
• [Presentation] Dependence of the working distance and the applied bias on the surface potential distribution of insulating specimen irradiated by electron beam (2016)
  • Author(s): M. Toukai, T. Kawamoto and M. Kotera
  • Organizer: The 23rd Symposium on Photomask and NGL Mask Technology
  • Place of Presentation: Pacifico Yokohama, Yokohama, Japan
  • Year and Date: 2016-04-07
  • Int'l Joint Research
• [Presentation] Measurement of fogging electrons in scanning electron microscope (2016)
  • Author(s): Y. Hagiwara, T. Noda, M. Kotera and R. Gauvin
  • Organizer: The 23rd Symposium on Photomask and NGL Mask Technology
  • Place of Presentation: Pacifico Yokohama, Yokohama, Japan
  • Year and Date: 2016-04-07
  • Int'l Joint Research
• [Presentation] Multiscale Simulation of Pattern Formation in Electron Beam Lithography (2016)
  • Author(s): S. Hitomi, H. Kawata, Y. Hirai and M. Yasuda
  • Organizer: The 23rd Symposium on Photomask and NGL Mask Technology
  • Place of Presentation: Pacifico Yokohama, Yokohama, Japan
  • Year and Date: 2016-04-07
  • Int'l Joint Research
• [Presentation] 電子ビーム照射された絶縁体試料表面電位分布のワーキングディスタンスと印加バイアス依存性 (2016)
  • Author(s): 東海昌司，河本拓也，小寺正敏
  • Organizer: 第63回応用物理学会春季学術講演会
  • Place of Presentation: 東京工業大学（東京都目黒区）
  • Year and Date: 2016-03-21
• [Presentation] 走査電子顕微鏡内のフォギング電子電流の測定 (2016)
  • Author(s): 野田拓，萩原佳史，小寺正敏，Raynald Gauvin
  • Organizer: 第63回応用物理学会春季学術講演会
  • Place of Presentation: 東京工業大学（東京都目黒区）
  • Year and Date: 2016-03-21
• [Presentation] 二次元原子層材料の電子ビームナノ加工解析 (2016)
  • Author(s): 多田和広，中川力哉，鎌仲章，安田雅昭
  • Organizer: 第63回応用物理学会春季学術講演会
  • Place of Presentation: 東京工業大学（東京都目黒区）
  • Year and Date: 2016-03-20
• [Presentation] SEM観察における有機高分子レジスト収縮の理論解析 (2016)
  • Author(s): 香山真範, 古川雄基，川田博昭，平井義彦, 安田雅昭
  • Organizer: 第63回応用物理学会春季学術講演会
  • Place of Presentation: 東京工業大学（東京都目黒区）
  • Year and Date: 2016-03-19
• [Presentation] Simulation of charging process of PMMA film on Si substrate under electron beam irradiation (2015)
  • Author(s): A. Fukuzawa, K. Terada and M. Kotera
  • Organizer: 28th International Microprocesses and Nanotechnology Conference
  • Place of Presentation: Toyama International Conference Center, Toyama, Japan
  • Year and Date: 2015-11-12
  • Int'l Joint Research
• [Presentation] Dependence of charging of insulator film by electron beam irradiation on the bias-voltage (2015)
  • Author(s): Y. Handa, M. Toukai, T. Kawamoto and M. Kotera
  • Organizer: 28th International Microprocesses and Nanotechnology Conference
  • Place of Presentation: Toyama International Conference Center, Toyama, Japan
  • Year and Date: 2015-11-12
  • Int'l Joint Research
• [Presentation] Measurement and simulation of electric potential distribution at an insulator surface irradiated by electron beam (2015)
  • Author(s): M. Kotera
  • Organizer: Electron Beam Scattering Simulation Workshop
  • Place of Presentation: Aranvert Hotel Kyoto, Kyoto, Japan
  • Year and Date: 2015-11-09
  • Invited
• [Presentation] Molecular dynamics simulation of pattern formation in electron beam lithography (2015)
  • Author(s): M. Yasuda
  • Organizer: Electron Beam Scattering Simulation Workshop
  • Place of Presentation: Aranvert Hotel Kyoto, Kyoto, Japan
  • Year and Date: 2015-11-09
  • Invited
• [Presentation] Molecular Dynamics Study of 2D SiC Monolayer and 2D Silica Bilayers under Electron Irradiation (2015)
  • Author(s): K. Tada, A. Kamanaka, R. Nakagawa and M. Yasuda
  • Organizer: 10th Int. Symp. on Atomic Level Characterizations for New Materials and Devices ’15
  • Place of Presentation: Kunibiki Messe, Matsue, Japan
  • Year and Date: 2015-10-28
  • Int'l Joint Research
• [Presentation] Structural Changes of Polymer Materials under Electron Irradiation: Molecular Dynamics Study (2015)
  • Author(s): M. Yasuda, S. Hitomi, Y. Furukawa, H. Kawata and Y. Hirai
  • Organizer: 10th Int. Symp. on Atomic Level Characterizations for New Materials and Devices ’15
  • Place of Presentation: Kunibiki Messe, Matsue, Japan
  • Year and Date: 2015-10-27
  • Int'l Joint Research
• [Presentation] Simulation of Fogging Electron Trajectories in Scanning Electron Microscope and Its Comparison with Experiment (2015)
  • Author(s): T. Nishino, T. Noda and M. Kotera
  • Organizer: 10th Int. Symp. on Atomic Level Characterizations for New Materials and Devices ’15
  • Place of Presentation: Kunibiki Messe, Matsue, Japan
  • Year and Date: 2015-10-27
  • Int'l Joint Research
• [Presentation] Surface Potential Distribution of Insulating Film on a Conductive Substrate Irradiated by Electron Beam with an Application of the Bias-Voltage (Student Award受賞) (2015)
  • Author(s): Y. Handa, M. Tokai, T. Kawamoto and M. Kotera
  • Organizer: 10th Int. Symp. on Atomic Level Characterizations for New Materials and Devices ’15
  • Place of Presentation: Kunibiki Messe, Matsue, Japan
  • Year and Date: 2015-10-27
  • Int'l Joint Research
• [Presentation] Simulation of Time-Dependent Charging of PMMA Film on Si Substrate under Electron Beam Irradiation (2015)
  • Author(s): A. Fukuzawa, M. Tokai, K. Terada and M. Kotera
  • Organizer: 10th Int. Symp. on Atomic Level Characterizations for New Materials and Devices ’15
  • Place of Presentation: Kunibiki Messe, Matsue, Japan
  • Year and Date: 2015-10-27
  • Int'l Joint Research
• [Presentation] 電子ビーム照射による試料表面電位形成過程のシミュレーション (2015)
  • Author(s): 福澤諒大，小寺正敏
  • Organizer: 第76回応用物理学会秋季学術講演会
  • Place of Presentation: 名古屋国際会議場、名古屋
  • Year and Date: 2015-09-15
• [Presentation] 電子ビーム露光によるフォギング電子のバイアス電圧依存性 (2015)
  • Author(s): 東海昌司，半田勇希，河本拓也，小寺正敏
  • Organizer: 第76回応用物理学会秋季学術講演会
  • Place of Presentation: 名古屋国際会議場、名古屋
  • Year and Date: 2015-09-15
• [Presentation] 走査電子顕微鏡におけるフォギング電子軌跡のシミュレーション (2015)
  • Author(s): 西野大輝，小寺正敏
  • Organizer: 第76回応用物理学会秋季学術講演会
  • Place of Presentation: 名古屋国際会議場、名古屋
  • Year and Date: 2015-09-15
• [Presentation] 試料表面のフォギング電子電流のバイアス電圧依存性 (2015)
  • Author(s): 野田拓，萩原佳史，小寺正敏，Raynald Gauvin
  • Organizer: 第76回応用物理学会秋季学術講演会
  • Place of Presentation: 名古屋国際会議場、名古屋
  • Year and Date: 2015-09-15
• [Presentation] Dependence of fogging electron current at a specimen surface on the bias-voltage (2015)
  • Author(s): T. Noda, Y. Hagiwara, M. Kotera and R. Gauvin
  • Organizer: 31st European Conference on Surface Science
  • Place of Presentation: International Convention Center of Barcelona, Barcelona, Spain
  • Year and Date: 2015-08-31
  • Int'l Joint Research
• [Presentation] Dependence of charging of insulator film by electron beam irradiation on the bias-voltage (2015)
  • Author(s): M. Tokai, Y. Handa and M. Kotera
  • Organizer: 31st European Conference on Surface Science
  • Place of Presentation: International Convention Center of Barcelona, Barcelona, Spain
  • Year and Date: 2015-08-31
  • Int'l Joint Research
• [Presentation] Simulation of charging process of PMMA film on Si substrate under electron beam irradiation (2015)
  • Author(s): A. Fukuzawa and M. Kotera
  • Organizer: 31st European Conference on Surface Science
  • Place of Presentation: International Convention Center of Barcelona, Barcelona, Spain
  • Year and Date: 2015-08-31
  • Int'l Joint Research
• [Presentation] Simulation of fogging electron trajectories in Scanning Electron Microscope (2015)
  • Author(s): T. Nishino and M. Kotera
  • Organizer: 31st European Conference on Surface Science
  • Place of Presentation: International Convention Center of Barcelona, Barcelona, Spain
  • Year and Date: 2015-08-31
  • Int'l Joint Research
• [Presentation] 電子線リソグラフィにおけるSub-10nmパターン形成の分子動力学解析 (2015)
  • Author(s): 安田雅昭
  • Organizer: 次世代リソグラフィワークショップ2015
  • Place of Presentation: 東京工業大学（東京都目黒区）
  • Year and Date: 2015-07-07
  • Invited
• [Presentation] Molecular Dynamics Study of Line Edge Roughness and the Proximity Effects in Electron Beam Lithography (2015)
  • Author(s): S. Hitomi, K. Michishita, H. Kawata, Y. Hirai and M. Yasuda
  • Organizer: 32nd International Conference of Photopolymer Science and Technology
  • Place of Presentation: Makuhari Messe, Chiba, Japan
  • Year and Date: 2015-06-26
  • Int'l Joint Research
• [Presentation] Computational Study of Resist Pattern Shrinkage under CD-SEM Observation (2015)
  • Author(s): Y. Furukawa, M. Yasuda, H. Kawata and Y. Hirai
  • Organizer: 59th Int. Conf. on Electron, Ion and Photon Beam Technology and Nanofabrication
  • Place of Presentation: Manchester Grand Hyatt, San Diego, USA
  • Year and Date: 2015-05-27
  • Int'l Joint Research
• [Presentation] 反射電子像における結晶方位コントラストの情報深さのモンテカルロ解析 (2015)
  • Author(s): 安田雅昭
  • Organizer: 日本顕微鏡学会第71回学術講演会
  • Place of Presentation: 京都国際会館、京都
  • Year and Date: 2015-05-14
• [Presentation] SEM観察における有機高分子試料変形の理論解析（２） (2015)
  • Author(s): 古川雄基，安田雅昭，川田博昭，平井義彦
  • Organizer: 日本顕微鏡学会第71回学術講演会
  • Place of Presentation: 京都国際会館、京都
  • Year and Date: 2015-05-14
• [Presentation] 電子ビーム照射による絶縁体薄膜帯電のバイアス電圧依存性 (2015)
  • Author(s): 東海昌司，半田勇希，小寺正敏
  • Organizer: 日本顕微鏡学会第71回学術講演会
  • Place of Presentation: 京都国際会館、京都
  • Year and Date: 2015-05-14
• [Presentation] 走査電子顕微鏡におけるフォギング電子軌跡のシミュレーション (2015)
  • Author(s): 西野大輝，小寺正敏
  • Organizer: 日本顕微鏡学会第71回学術講演会
  • Place of Presentation: 京都国際会館、京都
  • Year and Date: 2015-05-14
• [Presentation] 電子ビーム照射による試料表面電位形成過程のシミュレーション (2015)
  • Author(s): 福澤諒大，小寺正敏
  • Organizer: 日本顕微鏡学会第71回学術講演会
  • Place of Presentation: 京都国際会館、京都
  • Year and Date: 2015-05-14
• [Presentation] Measurement of fogging electron current at a specimen surface in scanning electron microscope (2015)
  • Author(s): T. Noda, M. Toukai, M. Kotera and R. Gauvin
  • Organizer: The 22nd Symposium on Photomask and NGL Mask Technology
  • Place of Presentation: Pacifico Yokohama, Yokohama, Japan
  • Year and Date: 2015-04-21
  • Int'l Joint Research
• [Presentation] Dependence of charging of insulator film by electron beam irradiation on the bias-voltage (2015)
  • Author(s): Y. Handa, M. Toukai and M. Kotera
  • Organizer: The 22nd Symposium on Photomask and NGL Mask Technology
  • Place of Presentation: Pacifico Yokohama, Yokohama, Japan
  • Year and Date: 2015-04-21
  • Int'l Joint Research
• [Presentation] 電子ビーム照射下の単層二次元SiCのダイナミクス解析 (2015)
  • Author(s): 多田和広，和泉遼，安田雅昭
  • Organizer: 第62回応用物理学会関係連合講演会
  • Place of Presentation: 東海大学、神奈川県、平塚
  • Year and Date: 2015-03-13
• [Presentation] 電子線リソグラフィの分子シミュレーション（３） (2015)
  • Author(s): 人見洋，道下勝司，安田雅昭，川田博昭，平井義彦
  • Organizer: 第62回応用物理学会関係連合講演会
  • Place of Presentation: 東海大学、神奈川県、平塚
  • Year and Date: 2015-03-12
• [Presentation] 電子ビーム照射による絶縁体薄膜帯電のバイアス電圧依存性 (2015)
  • Author(s): 半田勇希，東海昌司，小寺正敏
  • Organizer: 第62回応用物理学会関係連合講演会
  • Place of Presentation: 東海大学、神奈川県、平塚
  • Year and Date: 2015-03-12
• [Presentation] ナノカーボン材料の電子ビーム加工の分子シミュレーション(Ⅸ) (2015)
  • Author(s): 木田昌吾，山本真也，安田雅昭，多田和広，川田博昭，平井義彦
  • Organizer: 第62回応用物理学会関係連合講演会
  • Place of Presentation: 東海大学、神奈川県、平塚
  • Year and Date: 2015-03-11
• [Presentation] グラフェンの電子照射効果における試料固定条件依存性の分子動力学解析 (2014)
  • Author(s): 山本真也，安田雅昭，川田博昭，平井義彦
  • Organizer: 第55回真空に関する連合講演会
  • Place of Presentation: 大阪府立大学 I-siteなんば、大阪府、大阪市
  • Year and Date: 2014-11-19
• [Presentation] 電子線リソグラフィのマルチフィジックスシミュレーション (2014)
  • Author(s): 道下勝司，安田雅昭，川田博昭，平井義彦
  • Organizer: 第55回真空に関する連合講演会
  • Place of Presentation: 大阪府立大学 I-siteなんば、大阪府、大阪市
  • Year and Date: 2014-11-19
• [Presentation] SEM観察におけるレジストパターン収縮の理論解析 (2014)
  • Author(s): 古川雄基，安田雅昭，川田博昭，平井義彦
  • Organizer: 第55回真空に関する連合講演会
  • Place of Presentation: 大阪府立大学 I-siteなんば、大阪府、大阪市
  • Year and Date: 2014-11-19
• [Presentation] 電子ビーム照射下の二分子層シリカのダイナミクス解析 (2014)
  • Author(s): 和泉遼，石田淳，安田雅昭，多田和広
  • Organizer: 平成26年度応用物理学会 北陸・信越支部学術講演会
  • Place of Presentation: 富山大学 工学部、富山県、富山
  • Year and Date: 2014-11-07
• [Presentation] Molecular Dynamics Study on Proximity Effects in Electron Beam Lithography (2014)
  • Author(s): K. Michishita, S. Hitomi, M. Yasuda, H. Kawata and Y. Hirai
  • Organizer: 2014 Int. Microprocesses and Nanotechnology Conf.
  • Place of Presentation: Hilton Fukuoka Sea Hawk, Fukuoka, Japan
  • Year and Date: 2014-11-06
• [Presentation] Computational Study on Electron Beam Lithography (2014)
  • Author(s): M. Yasuda
  • Organizer: 2014 Int. Microprocesses and Nanotechnology Conf.
  • Place of Presentation: Hilton Fukuoka Sea Hawk, Fukuoka, Japan
  • Year and Date: 2014-11-05
  • Invited
• [Presentation] 電子線リソグラフィにおけるパターン形成過程の分子シミュレーション (2014)
  • Author(s): 安田雅昭
  • Organizer: 日本学術振興会 荷電粒子ビームの工業への応用第132委員会 第212回研究会
  • Place of Presentation: 東京理科大学 森戸記念館、東京都、新宿区
  • Year and Date: 2014-10-03
  • Invited
• [Presentation] Simulation of fogging electrons in a scanning electron microscope (2014)
  • Author(s): S. Hosoi, K. Kumagai, Y. Handa, M. Kotera
  • Organizer: 40th Int. Conf. on Micro- and Nano-Engineering 2014
  • Place of Presentation: Lausanne, Switzerland
  • Year and Date: 2014-09-25
• [Presentation] Electron beam irradiation time dependence on a surface potential distribution at a resist film on a conductive substrate (2014)
  • Author(s): K. Kumagai, Y. Handa, S. Hosoi, M. Kotera
  • Organizer: 40th Int. Conf. on Micro- and Nano-Engineering 2014
  • Place of Presentation: Lausanne, Switzerland
  • Year and Date: 2014-09-24
• [Presentation] Reduction of multiple backscattering events of electrons by attaching a graphite plate to the objective lens in a scanning electron microscope (2014)
  • Author(s): Y. Handa, K. Kumagai, S. Hosoi, M. Kotera
  • Organizer: 40th Int. Conf. on Micro- and Nano-Engineering 2014
  • Place of Presentation: Lausanne, Switzerland
  • Year and Date: 2014-09-24
• [Presentation] 絶縁体薄膜表面電位分布の電子ビーム露光時間依存性 (2014)
  • Author(s): 熊谷健太朗，細井創介，半田勇希，小寺正敏
  • Organizer: 第75回応用物理学会秋季学術講演会
  • Place of Presentation: 北海道大学、北海道、札幌
  • Year and Date: 2014-09-19
• [Presentation] 走査電子顕微鏡におけるフォギング電子シミュレーション (2014)
  • Author(s): 細井創介，熊谷健太朗，半田勇希，小寺正敏
  • Organizer: 第75回応用物理学会秋季学術講演会
  • Place of Presentation: 北海道大学、北海道、札幌
  • Year and Date: 2014-09-19
• [Presentation] ナノカーボン材料の電子ビーム加工の分子シミュレーション(Ⅷ) (2014)
  • Author(s): 山本真也，朝山良樹，安田雅昭，川田博昭，平井義彦
  • Organizer: 第75回応用物理学会秋季学術講演会
  • Place of Presentation: 北海道大学、北海道、札幌
  • Year and Date: 2014-09-18
• [Presentation] Computational Study on Structural Changes of Carbon Nanomaterials under Electron Irradiation (2014)
  • Author(s): M. Yasuda, M. Yamamoto, H. Kawata and Y. Hirai
  • Organizer: 18th Int. Microscopy Congress
  • Place of Presentation: Prague, Czech Republic
  • Year and Date: 2014-09-10 – 2014-09-11
• [Presentation] Computational Study of Electron Irradiation Effects on Vibrational Properties of Carbon Nanotube Cantilevers (2014)
  • Author(s): K. Tada, R. Taneda and M. Yasuda
  • Organizer: 58th Int. Conf. on Electron, Ion and Photon Beam Technology and Nanofabrication
  • Place of Presentation: Washington DC, USA
  • Year and Date: 2014-05-30
• [Presentation] Structural Change of Graphene during Electron Beam Process: Molecular Dynamics Study (2014)
  • Author(s): Y. Asayama, M. Yamamoto, M. Yasuda, H. Kawata and Y. Hirai
  • Organizer: 58th Int. Conf. on Electron, Ion and Photon Beam Technology and Nanofabrication
  • Place of Presentation: Washington DC, USA
  • Year and Date: 2014-05-29
• [Presentation] Molecular Dynamics Study of Line Edge Roughness in Electron Beam Lithography (2014)
  • Author(s): K. Michishita, M. Yasuda, H. Kawata and Y. Hirai
  • Organizer: 58th Int. Conf. on Electron, Ion and Photon Beam Technology and Nanofabrication
  • Place of Presentation: Washington DC, USA
  • Year and Date: 2014-05-29
• [Presentation] SEM観察における有機高分子試料変形の理論解析 (2014)
  • Author(s): 安田雅昭，古川雄基，川田博昭，平井義彦
  • Organizer: 日本顕微鏡学会第70回学術講演会
  • Place of Presentation: 幕張メッセ、千葉県、幕張
  • Year and Date: 2014-05-13
• [Presentation] 対物レンズへの炭素板設置による走査電子顕微鏡内多重反射電子の低減 (2014)
  • Author(s): 半田勇希，熊谷健太朗，細井創介，小寺正敏
  • Organizer: 日本顕微鏡学会第70回学術講演会
  • Place of Presentation: 幕張メッセ、千葉県、幕張
  • Year and Date: 2014-05-11
• [Presentation] 走査電子顕微鏡内の絶縁体薄膜表面電位分布のビーム電流依存性 (2014)
  • Author(s): 熊谷健太朗，半田勇希，細井創介，小寺正敏
  • Organizer: 日本顕微鏡学会第70回学術講演会
  • Place of Presentation: 幕張メッセ、千葉県、幕張
  • Year and Date: 2014-05-11
• [Presentation] Interaction Volume of Electron Beam in Carbon Nanomaterials: A molecular Dynamics Study (2014)
  • Author(s): M. Yasuda, S. Wakuda, Y. Asayama, H. Kawata and Y. Hirai
  • Organizer: 2014 MRS Spring Meeting & Exhibit
  • Place of Presentation: San Francisco, USA
  • Year and Date: 2014-04-23
• [Presentation] Molecular Dynamics Study of Electron Irradiation Effects on Vibrational Properties of Carbon Nanotubes (2014)
  • Author(s): K. Tada, R. Taneda and M. Yasuda
  • Organizer: 2014 MRS Spring Meeting & Exhibit
  • Place of Presentation: San Francisco, USA
  • Year and Date: 2014-04-23
• [Presentation] Reduction of multiple re-backscattered electrons in scanning electron microscope by attaching a graphite plate to objective lens (2014)
  • Author(s): Y. Handa, K. Kumagai, S. Hosoi, M. Kotera
  • Organizer: 21st Symposium on Photomask and NGL Mask Technology
  • Place of Presentation: Pacifico Yokohama, Yokohama, Japan
  • Year and Date: 2014-04-15
• [Presentation] Electron beam current dependence on a surface potential distribution at a resist film on a conductive substrate (2014)
  • Author(s): K. Kumagai, S. Hosoi, Y. Handa, M. Kotera
  • Organizer: 21st Symposium on Photomask and NGL Mask Technology
  • Place of Presentation: Pacifico Yokohama, Yokohama, Japan
  • Year and Date: 2014-04-15
• [Presentation] Molecular Dynamics Study on Resist Pattern Structure in Electron Beam Lithography (2014)
  • Author(s): K. Michishita, M. Yasuda, H. Kawata and Y. Hirai
  • Organizer: 21st Symposium on Photomask and NGL Mask Technology
  • Place of Presentation: Pacifico Yokohama, Yokohama, Japan
  • Year and Date: 2014-04-15
• [Presentation] Molecular simulation of resist pattern shrinkage under CD-SEM observation (2014)
  • Author(s): Y. Furukawa, M. Yasuda, H. Kawata and Y. Hirai
  • Organizer: 21st Symposium on Photomask and NGL Mask Technology
  • Place of Presentation: Pacifico Yokohama, Yokohama, Japan
  • Year and Date: 2014-04-15
• [Presentation] 走査電子顕微鏡内における絶縁体薄膜の表面電位分布測定
  • Author(s): 小寺正敏
  • Organizer: ナノテスティング学会 電子線応用技術研究会
  • Place of Presentation: 大阪府、吹田市
• [Presentation] Measurement and simulation of fogging electrons in a scanning electron microscope
  • Author(s): Sosuke Hosoi, Msasaru Otani, Kentaro Kumagai, Masatoshi Kotera
  • Organizer: Microscopy Conference 2013
  • Place of Presentation: Regensburg, Germany
• [Presentation] Measurements of surface potential distribution at FEP resist film on a conductive substrate irradiated by electron beam
  • Author(s): Kentaro Kumagai, Msasaru Otani, Sosuke Hosoi, Masatoshi Kotera
  • Organizer: Microscopy Conference 2013
  • Place of Presentation: Regensburg, Germany
• [Presentation] Charging process simulation of PMMA film on Si substrate irradiated by electron beam
  • Author(s): Masatoshi Kotera, Msasaru Otani, Sosuke Hosoi, Kentaro Kumagai
  • Organizer: Microscopy Conference 2013
  • Place of Presentation: Regensburg, Germany
• [Presentation] Electron Irradiation Effects on Atomic Scale Mechanics of Carbon Nanotubes: Molecular Dynamics Study
  • Author(s): Kazuhiro Tada, Masaaki Yasuda, Hiroaki Kawata and Yoshihiko Hirai
  • Organizer: 19th Int. Vacuum Congress & Int. Conf. on Nanosci. and Technol. 2013
  • Place of Presentation: Paris, France
• [Presentation] ナノカーボン材料の電子ビーム加工の分子シミュレーション(VII)
  • Author(s): 朝山良樹，安田雅昭，川田博昭，平井義彦
  • Organizer: 第74回応用物理学会秋季学術講演会
  • Place of Presentation: 京都府、京田辺
• [Presentation] 走査電子顕微鏡におけるフォギング電子軌跡のシミュレーション
  • Author(s): 細井創介，熊谷健太朗，小寺正敏
  • Organizer: 第74回応用物理学会秋季学術講演会
  • Place of Presentation: 京都府、京田辺
• [Presentation] 電子ビーム照射を受けた導電性基板上絶縁体薄膜の二次元電位分布測定
  • Author(s): 熊谷健太朗，細井創介，大谷優，小寺正敏
  • Organizer: 第74回応用物理学会秋季学術講演会
  • Place of Presentation: 京都府、京田辺
• [Presentation] Molecular Dynamics Dtudy on Interaction Volume in Electron-Irradiated Carbon Nanomaterials
  • Author(s): Masaaki Yasuda, Shinya Wakuda, Yoshiki Asayama, Hiroaki Kawata and Yoshihiko Hirai
  • Organizer: 39th Int. Conf. on Micro- and Nano-Engineering 2013
  • Place of Presentation: London, England
• [Presentation] Molecular Dynamics Study of Electron Irradiation Effects on Nanomechanical Properties of Graphene
  • Author(s): Kazuhiro Tada, Masaaki Yasuda, Ryosuke Taneda, Hiroaki Kawata and Yoshihiko Hirai
  • Organizer: 39th Int. Conf. on Micro- and Nano-Engineering 2013
  • Place of Presentation: London, England
• [Presentation] Electron Beam Lithography Simulation for Nanometer-scale Patterning
  • Author(s): Katsushi Michishita, Masaaki Yasuda, Hiroaki Kawata and Yoshihiko Hirai
  • Organizer: 2013 Int. Microprocesses and Nanotechnology Conf.
  • Place of Presentation: Sapporo, Japan
• [Presentation] Surface potential distribution of a resist film irradiated by electron beam
  • Author(s): Kentaro Kumagai, Msasaru Otani, Sosuke Hosoi, Masatoshi Kotera
  • Organizer: 2013 Int. Microprocesses and Nanotechnology Conf.
  • Place of Presentation: Sapporo, Japan
• [Presentation] Measurement and simulation of fogging electron distribution in a scanning electron microscope
  • Author(s): Sosuke Hosoi, Msasaru Otani, Kentaro Kumagai, Masatoshi Kotera
  • Organizer: 2013 Int. Microprocesses and Nanotechnology Conf.
  • Place of Presentation: Sapporo, Japan
• [Presentation] Molecular Simulation of Structural Changes of Organic Polymer Materials under Electron Irradiation
  • Author(s): Katsushi Michishita, Yuki Furukawa, Masaaki Yasuda, Hiroaki Kawata and Yoshihiko Hirai
  • Organizer: 9th Int. Symp. on Atomic Level Characterizations for New Materials and Devices ’13
  • Place of Presentation: Hawaii, USA
• [Presentation] Simulation of Charging Process of PMMA Film on Si Substrate under Electron Beam Irradiation
  • Author(s): Sosuke Hosoi, Kentaro Kumagai, Masatoshi Kotera
  • Organizer: 9th Int. Symp. on Atomic Level Characterizations for New Materials and Devices ’13
  • Place of Presentation: Hawaii, USA
• [Presentation] Measurement of Surface Potential Distribution at Resist Film on Conductive Substrate Irradiated by Electron Beam
  • Author(s): Kentaro Kumagai, Sosuke Hosoi, Masatoshi Kotera
  • Organizer: 9th Int. Symp. on Atomic Level Characterizations for New Materials and Devices ’13
  • Place of Presentation: Hawaii, USA
• [Presentation] Molecular Dynamics Study of Electron-Irradiation Effects in Graphene
  • Author(s): Yoshiki Asayama, Masaaki Yasuda, Hiroaki Kawata and Yoshihiko Hirai
  • Organizer: 9th Int. Symp. on Atomic Level Characterizations for New Materials and Devices ’13
  • Place of Presentation: Hawaii, USA
• [Presentation] Computational Study of Electron Irradiation Effects on Carbon Nanotubes: Nanomechanical Properties
  • Author(s): Kazuhiro Tada and Masaaki Yasuda
  • Organizer: 9th Int. Symp. on Atomic Level Characterizations for New Materials and Devices ’13
  • Place of Presentation: Hawaii, USA
• [Presentation] Electron irradiation effects on nanomechnical properties of graphene: Molecular dynamics study
  • Author(s): Kazuhiro Tada, Takuya Hashimoto and Masaaki Yasuda
  • Organizer: 4th Workshop on Theory, Modeling and Computational Methods for Semiconductor Materials and Nanostructures
  • Place of Presentation: Manchester, England
• [Presentation] カーボンナノチューブ片持ち梁の振動特性への電子線照射効果に関する分子動力学解析
  • Author(s): 多田和広，種田涼佑，安田雅昭
  • Organizer: 第60回応用物理学会関係連合講演会
  • Place of Presentation: 神奈川県、相模原
• [Presentation] 走査電子顕微鏡内の絶縁体薄膜表面電位分布のビーム電流依存性
  • Author(s): 熊谷健太朗，半田勇希，細井創介，小寺正敏
  • Organizer: 第60回応用物理学会関係連合講演会
  • Place of Presentation: 神奈川県、相模原
• [Presentation] 対物レンズへの炭素板設置による走査電子顕微鏡内多重後方散乱電子の低減
  • Author(s): 半田勇希，熊谷健太朗，細井創介，小寺正敏
  • Organizer: 第60回応用物理学会関係連合講演会
  • Place of Presentation: 神奈川県、相模原
• [Presentation] 磁界を考慮した走査電子顕微鏡におけるフォギング電子シミュレーション
  • Author(s): 細井創介，熊谷健太朗，半田勇希，小寺正敏
  • Organizer: 第60回応用物理学会関係連合講演会
  • Place of Presentation: 神奈川県、相模原
• [Presentation] 電子線リソグラフィの分子シミュレーション（２）
  • Author(s): 道下勝司, 安田雅昭，川田博昭，平井義彦
  • Organizer: 第60回応用物理学会関係連合講演会
  • Place of Presentation: 神奈川県、相模原
• [Book] Computational Chemistry: Theories, Methods and Applications, Chapter 4: Molecular Simulation of Electron Beam Nanofabrication (2014)
  • Author(s): M. Yasuda and K. Tada
  • Total Pages: 22
  • Publisher: Nova Science Publishers