| Budget Amount *help |
¥13,260,000 (Direct Cost: ¥10,200,000、Indirect Cost: ¥3,060,000)
Fiscal Year 2015: ¥4,420,000 (Direct Cost: ¥3,400,000、Indirect Cost: ¥1,020,000)
Fiscal Year 2014: ¥3,250,000 (Direct Cost: ¥2,500,000、Indirect Cost: ¥750,000)
Fiscal Year 2013: ¥5,590,000 (Direct Cost: ¥4,300,000、Indirect Cost: ¥1,290,000)
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| Outline of Final Research Achievements |
Advanced lithography such as double exposure techniques, self-aligned processes realizes a tiny circuit pattern on a wafer but requires various physical design technologies to realize high performance integrated circuits efficiently. In this research, various physical design technologies for advanced lithography such as pattern decomposition algorithm, shortest path algorithm with turn prohibition constraints, and intensity distribution estimation algorithm are developed.
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