| Budget Amount *help |
¥18,850,000 (Direct Cost: ¥14,500,000、Indirect Cost: ¥4,350,000)
Fiscal Year 2015: ¥3,250,000 (Direct Cost: ¥2,500,000、Indirect Cost: ¥750,000)
Fiscal Year 2014: ¥3,250,000 (Direct Cost: ¥2,500,000、Indirect Cost: ¥750,000)
Fiscal Year 2013: ¥12,350,000 (Direct Cost: ¥9,500,000、Indirect Cost: ¥2,850,000)
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| Outline of Final Research Achievements |
Gold nanostructures have attracted increasing attention because of their size-dependent properties including Localized surface plasmon resonance. Localized surface plasmon resonance is, for example, important for surface enhanced Raman spectroscopy and sensors. Tailoring the size, the shape, and the integrated structure of gold nanostructures is necessary to utilize such properties efficiently. We demonstrated that gold nanostructures selectively grow on focused ion beam (FIB)-irradiated areas of a silicon substrate when the substrate is exposed to pure HAuCl4 solution. We revealed the mail mechanism of this new area-selective electroless deposition. We also combined the area-selective deposition with the inkjet technology to further control the growth of gold.
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