Development of 1X nm EUV Resist with high sensitivity and Low LWR
Project/Area Number |
25289106
|
Research Category |
Grant-in-Aid for Scientific Research (B)
|
Allocation Type | Partial Multi-year Fund |
Section | 一般 |
Research Field |
Electron device/Electronic equipment
|
Research Institution | University of Hyogo |
Principal Investigator |
Watanabe Takeo 兵庫県立大学, 高度産業科学技術研究所, 教授 (70285336)
|
Co-Investigator(Kenkyū-buntansha) |
HARADA Tetsuo 兵庫県立大学, 高度産業科学技術研究所, 助教 (30451636)
KINOSHITA Hiroo 兵庫県立大学, 高度産業科学技術研究所, 特任教授 (50285334)
|
Research Collaborator |
MUTO Masao
TSUNO Katsushige
|
Project Period (FY) |
2013-04-01 – 2016-03-31
|
Project Status |
Completed (Fiscal Year 2015)
|
Budget Amount *help |
¥18,070,000 (Direct Cost: ¥13,900,000、Indirect Cost: ¥4,170,000)
Fiscal Year 2015: ¥2,730,000 (Direct Cost: ¥2,100,000、Indirect Cost: ¥630,000)
Fiscal Year 2014: ¥2,470,000 (Direct Cost: ¥1,900,000、Indirect Cost: ¥570,000)
Fiscal Year 2013: ¥12,870,000 (Direct Cost: ¥9,900,000、Indirect Cost: ¥2,970,000)
|
Keywords | 半導体微細加工 / 極端紫外線リソグラフィ / EUVレジスト / 感度 / 解像度 / LWR / アウトガス / 軟X線光電子分光 / 非化学増幅系レジスト / 化学増幅系レジスト / 金属レジスト / EUVリソグラフィ / レジスト / 高感度 / 軟X線吸収分光 |
Outline of Final Research Achievements |
EUV lithography is the most promissing advanced lithographic technology for semiconductor device manufacturing. One of the significant technical issue is the EUV resist development with high sensitivity and low line-edge-roughness. Thus the chemical reaction analysis using EUV light, and increaing the quantum efficiency of the chemical reaction in EUV light are significant. Therefore, desing of EUV resist, development of the analysis of the chemical reaction, and development of EUV interference lithographic technology for 1X nm were carried out to achieve the required specificatioj of the EUV resist. In the near future, on the basis of the those results, EUV metal resist will be evaluated and developed.
|
Report
(4 results)
Research Products
(37 results)
-
-
-
-
[Journal Article] (169)EUV Resist Chemical Analysis by Soft X-ray Absorption Spectroscopy for High Sensitivity Achievement2014
Author(s)
Kazuya Emura, Takeo Watanabe, Masato Yamaguchi, Hirohito Tanino,Tsubasa Fukui, Daiju Shiono, Yuichi Haruyama, Yasuji Muramatsu, Katsumi Ohmori, Kazufumi Sato, Tetsuo Harada, and Hiroo Kinoshita
-
Journal Title
J. Photopolym. Sci. Technol.
Volume: 27
Pages: 631-638
Related Report
Peer Reviewed / Open Access / Acknowledgement Compliant
-
[Journal Article] Development of Tool for Contamination Layer Thickness Measurement Using High Power Extreme Ultraviolet Light and in Situ Ellipsometer2013
Author(s)
Takeo Watanabe, Yukiko Kikuchi, Toshiya Takahashi, Kazuhiro Katayama, Isamu Takagi, Norihiko Sugie, Hiroyuki Tanaka, Eishi Shiobara, Soichi Inoue, Tetsuo Harada, and Hiroo Kinoshita
-
Journal Title
Jpn. J. Appl. Phys.
Volume: 52
Issue: 5R
Pages: 056701-056701
DOI
NAID
Related Report
Peer Reviewed
-
-
-
-
-
-
-
-
-
-
-
-
[Presentation] 微細加工用レジスト2015
Author(s)
渡邊健夫
Organizer
フォトポリマー講習会
Place of Presentation
東京理科大学森戸記念館(東京都新宿区)
Year and Date
2015-08-19
Related Report
Invited
-
-
-
-
-
-
-
-
[Presentation] EUV Resist Chemical Reaction Analysis by Soft X-ray Absorption Spectroscopy for High Sensitivity Achievement2014
Author(s)
Kazuya Emura, Takeo Watanabe, Daiju Shiono, Masato Yamaguchi, Hirohito Tanino, TsubasaFukui, Yuichi Haruyama, Yasuji Muramatsu, Katsumi Ohmori, Kazufumi Sato, Tetsuo Harada,and Hiroo Kinoshita
Organizer
The 31st International Conference of Photopolymer Science and Technology
Place of Presentation
San Jose, California, USA
Year and Date
2014-07-08 – 2014-07-11
Related Report
-
[Presentation] Contribution of EUV resist components to the noncleanable contaminations2014
Author(s)
Eishi Shiobara, Toshiya Takahashi, Norihiko Sugie, Yukiko Kikuchi, Isamu Takagi, Kazuhiro Katayama, Hiroyuki Tanaka, Soichi Inoue, Tetsuro Harada, Takeo Watanabe, and Hiroo Kinoshita
Organizer
SPIE Advanced Lithography 2014
Place of Presentation
San Jose, California, USA
Related Report
-
-
-
-
[Presentation] EUV Resist Chemical Reaction Analysis using SR2013
Author(s)
Takeo Watanabe, Kazuya Emura, Daiji Shiono, Yuichi Haruyama, Yasuji Muramatsu, Katsumi Ohmori, Kazufumi Sato, Tetsuo Harada and Hiroo Kinoshita
Organizer
The 30th International Conference of Photopolymer Science and Technology
Place of Presentation
千葉大学西千葉キャンパス(千葉県千葉市稲毛区)
Related Report
-
[Presentation] Comparison of Resist Family Outgassing Characterization2013
Author(s)
Isamu Takagi, Toshiya Takahashi, Kazuhiro Katayama, Norihiko Sugie, Yukiko Kikuchi, Eishi Shiobara, Hiroyuki Tanaka, Soichi Inoue, Takeo Watanabe, Tetsuo Harada, and Hiroo Kinoshita
Organizer
The 30th International Conference of Photopolymer Science and Technology
Place of Presentation
千葉大学西千葉キャンパス(千葉県千葉市稲毛区)
Related Report
-
-
-
-
[Presentation] Resist outgassing characterization of PAG-blended and PAG-bound systems2013
Author(s)
Kazuhiro Katayama, Toshiya Takahashi, Norihiko Sugie, Isamu Takagi, Yukiko Kikuchi, Eishi Shiobara, Hiroyuki Tanaka, Soichi Inoue, Takeo Watanabe, Tetsuo Harada, Hiroo Kinoshita
Organizer
2013 Internationa Symposium on Extreme Ultraviolet Lithography
Place of Presentation
富山国際会議場(富山県富山市)
Related Report
-
[Presentation] Study of the relation between Resist components and outgassing contamination species2013
Author(s)
Yukiko Kikuchi, Toshiya Takahashi, Norihiko Sugie, Isamu Takagi, Kazuhiro Katayama, Eishi Shiobara, Hiroyuki Tanaka, Soichi Inoue, Takeo Watanabe, Tetsuo Harada, Hiroo Kinoshit
Organizer
2013 Internationa Symposium on Extreme Ultraviolet Lithography
Place of Presentation
富山国際会議場(富山県富山市)
Related Report
-