Imaging Properties of High Magnification Soft X-ray Objective with Reduced Fresnel Number
Project/Area Number |
25390088
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Research Category |
Grant-in-Aid for Scientific Research (C)
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Allocation Type | Multi-year Fund |
Section | 一般 |
Research Field |
Optical engineering, Photon science
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Research Institution | Tohoku University |
Principal Investigator |
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Project Period (FY) |
2013-04-01 – 2016-03-31
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Project Status |
Completed (Fiscal Year 2015)
|
Budget Amount *help |
¥5,070,000 (Direct Cost: ¥3,900,000、Indirect Cost: ¥1,170,000)
Fiscal Year 2015: ¥1,560,000 (Direct Cost: ¥1,200,000、Indirect Cost: ¥360,000)
Fiscal Year 2014: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000)
Fiscal Year 2013: ¥2,210,000 (Direct Cost: ¥1,700,000、Indirect Cost: ¥510,000)
|
Keywords | 極紫外 / 軟X線 / 顕微鏡 / フーリエ結像論 / 多層膜ミラー / 結像論 / 軟X線顕微鏡 / フレネル数 |
Outline of Final Research Achievements |
When we apply soft X-rays, which have wavelengths in the range of 1 to 10 nm, to optical microscopy, high-spatial resolution of a few tens of nanometers can be expected in diffraction-limited imaging. To realize soft X-ray imaging with high-spatial resolution, high magnification of over x1000 should be required for an imaging objective of the microscope. As a result of increasing magnification, numerical aperture of this objective on an image plane, which is inversely proportional to magnification, should be reduced to be fairly small value. In this study, firstly, we experimentally confirm imaging properties of the high-magnification objective with a greatly reduced numerical aperture on an image plane. Then we formalize the imaging properties of the objective by using these experimental results. We also discuss the effect of increasing the magnification on the imaging properties.
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Report
(4 results)
Research Products
(13 results)
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[Journal Article] Observation of Residual-Type Thin Absorber Defect on Extreme Ultraviolet Lithography Mask Using an Extreme Ultraviolet Microscope2013
Author(s)
Tsuyoshi Amano, Susumu Iida, Ryoichi Hirano, Tsuneo Terasawa, Hidehiro Watanabe, Kenjiro Yamasoe, Mitsunori Toyoda, Akifumi Tokimasa, Tetsuo Harada, Takeo Watanabe, Hiroo Kinoshita
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Journal Title
Appl. Phys. Express
Volume: 6
Issue: 4
Pages: 046501-046501
DOI
NAID
Related Report
Peer Reviewed
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[Presentation] Ir レプリカX線反射鏡製作とNi トップレイヤーの性能評価2015
Author(s)
吉川駿, 田村啓輔, 松本浩典, 田原譲, 山下広順, 宮澤拓也, 三石郁之, 佐治重孝, 小林洋明, 松本竜弦, 豊田光紀, 柳原美広
Organizer
日本天文学会2015年秋季年会
Place of Presentation
甲南大学(神戸市)
Year and Date
2015-09-09
Related Report
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[Presentation] Design, fabrication, and test of an EUV mask imaging microscope for lithography generations with sub-16 nm half pitch2013
Author(s)
M. Toyoda, K. Yamasoe, M. Yanagihara, T. Amano, T. Terasawa, A. Tokimasa, T. Harada, T. Watanabe, H. Kinoshita
Organizer
2013 International Symposium on Extreme Ultraviolet Lithography
Place of Presentation
Toyama, Japan
Related Report