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Imaging Properties of High Magnification Soft X-ray Objective with Reduced Fresnel Number

Research Project

Project/Area Number 25390088
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeMulti-year Fund
Section一般
Research Field Optical engineering, Photon science
Research InstitutionTohoku University

Principal Investigator

TOYODA Mitsunori  東北大学, 多元物質科学研究所, 助教 (40375168)

Project Period (FY) 2013-04-01 – 2016-03-31
Project Status Completed (Fiscal Year 2015)
Budget Amount *help
¥5,070,000 (Direct Cost: ¥3,900,000、Indirect Cost: ¥1,170,000)
Fiscal Year 2015: ¥1,560,000 (Direct Cost: ¥1,200,000、Indirect Cost: ¥360,000)
Fiscal Year 2014: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000)
Fiscal Year 2013: ¥2,210,000 (Direct Cost: ¥1,700,000、Indirect Cost: ¥510,000)
Keywords極紫外 / 軟X線 / 顕微鏡 / フーリエ結像論 / 多層膜ミラー / 結像論 / 軟X線顕微鏡 / フレネル数
Outline of Final Research Achievements

When we apply soft X-rays, which have wavelengths in the range of 1 to 10 nm, to optical microscopy, high-spatial resolution of a few tens of nanometers can be expected in diffraction-limited imaging. To realize soft X-ray imaging with high-spatial resolution, high magnification of over x1000 should be required for an imaging objective of the microscope. As a result of increasing magnification, numerical aperture of this objective on an image plane, which is inversely proportional to magnification, should be reduced to be fairly small value.
In this study, firstly, we experimentally confirm imaging properties of the high-magnification objective with a greatly reduced numerical aperture on an image plane. Then we formalize the imaging properties of the objective by using these experimental results. We also discuss the effect of increasing the magnification on the imaging properties.

Report

(4 results)
  • 2015 Annual Research Report   Final Research Report ( PDF )
  • 2014 Research-status Report
  • 2013 Research-status Report
  • Research Products

    (13 results)

All 2015 2014 2013

All Journal Article (4 results) (of which Peer Reviewed: 4 results,  Acknowledgement Compliant: 2 results) Presentation (9 results) (of which Invited: 3 results)

  • [Journal Article] Flat-field anastigmatic mirror objective for highmagnification extreme ultraviolet microscopy2015

    • Author(s)
      Mitsunori Toyoda
    • Journal Title

      Advanced Optical Technologies

      Volume: 4 Issue: 4 Pages: 339-346

    • DOI

      10.1515/aot-2015-0020

    • Related Report
      2015 Annual Research Report
    • Peer Reviewed / Acknowledgement Compliant
  • [Journal Article] Demonstrating 30-nm spatial resolution of three-multilayer-mirror objective for extreme ultraviolet microscopy: Imaging test by observing lithography mask2014

    • Author(s)
      Mitsunori Toyoda,Kenjiro Yamasoe,Akifumi Tokimasa,Kentaro Uchida,Tetsuo Harada,Tsuneo Terasawa,Tsuyoshi Amano,Takeo Watanabe,Mihiro Yanagihara,Hiroo Kinoshita
    • Journal Title

      Applied Physics Express

      Volume: 7 Issue: 10 Pages: 102502-102502

    • DOI

      10.7567/apex.7.102502

    • NAID

      210000137252

    • Related Report
      2014 Research-status Report
    • Peer Reviewed / Acknowledgement Compliant
  • [Journal Article] Observation of Residual-Type Thin Absorber Defect on Extreme Ultraviolet Lithography Mask Using an Extreme Ultraviolet Microscope2013

    • Author(s)
      Tsuyoshi Amano, Susumu Iida, Ryoichi Hirano, Tsuneo Terasawa, Hidehiro Watanabe, Kenjiro Yamasoe, Mitsunori Toyoda, Akifumi Tokimasa, Tetsuo Harada, Takeo Watanabe, Hiroo Kinoshita
    • Journal Title

      Appl. Phys. Express

      Volume: 6 Issue: 4 Pages: 046501-046501

    • DOI

      10.7567/apex.6.046501

    • NAID

      10031166440

    • Related Report
      2013 Research-status Report
    • Peer Reviewed
  • [Journal Article] Simulation Analysis of the Characteristics of a High Magnification Imaging Optics for the Observation of Extreme Ultraviolet Lithography Mask to Predict Phase Defect Printability2013

    • Author(s)
      Tsuneo Terasawa, Yukiyasu Arisawa, Tsuyoshi Amano, Takeshi Yamane, Hidehiro Watanabe, Mitsunori Toyoda, Tetsuo Harada, Hiroo Kinoshita
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 52 Issue: 9R Pages: 096601-096601

    • DOI

      10.7567/jjap.52.096601

    • NAID

      210000142809

    • Related Report
      2013 Research-status Report
    • Peer Reviewed
  • [Presentation] 点回折干渉計による高倍率EUV顕微対物ミラーの1nm精度波面制御2015

    • Author(s)
      豊田光紀,砂山諒,柳原美広
    • Organizer
      The 13th Symposium on X-Ray Imaging Optics
    • Place of Presentation
      名古屋大学(名古屋市)
    • Year and Date
      2015-11-17
    • Related Report
      2015 Annual Research Report
    • Invited
  • [Presentation] 単一アト秒パルス用回折限界集光システムの開発22015

    • Author(s)
      田丸 裕基,森 哲,澤田 和寛,Fu Yuxi,高橋 栄治,須田 亮,神成 文彦,緑川 克美,豊田 光紀
    • Organizer
      第76回応用物理学会秋季学術講演会
    • Place of Presentation
      名古屋国際会議場(名古屋市)
    • Year and Date
      2015-09-13
    • Related Report
      2015 Annual Research Report
  • [Presentation] Ir レプリカX線反射鏡製作とNi トップレイヤーの性能評価2015

    • Author(s)
      吉川駿, 田村啓輔, 松本浩典, 田原譲, 山下広順, 宮澤拓也, 三石郁之, 佐治重孝, 小林洋明, 松本竜弦, 豊田光紀, 柳原美広
    • Organizer
      日本天文学会2015年秋季年会
    • Place of Presentation
      甲南大学(神戸市)
    • Year and Date
      2015-09-09
    • Related Report
      2015 Annual Research Report
  • [Presentation] 広視野を30nm解像するEUV顕微鏡の開発2015

    • Author(s)
      豊田光紀
    • Organizer
      分子研研究会(学協会連携)・放射光学会第8回若手研究会"軟X線イメージングの描く未来
    • Place of Presentation
      分子科学研究所(岡崎市)
    • Year and Date
      2015-09-07
    • Related Report
      2015 Annual Research Report
    • Invited
  • [Presentation] EUV結像系用点回折干渉計の波面測定精度の検証2014

    • Author(s)
      砂山諒, 豊田光紀, 近藤祐治, 山川清志, 柳原美廣
    • Organizer
      応用物理学会東北支部第69回学術講演会
    • Place of Presentation
      仙台
    • Year and Date
      2014-12-05
    • Related Report
      2014 Research-status Report
  • [Presentation] 多層膜ミラーによるEUV回折限界結像系の開発の現状と展開2014

    • Author(s)
      豊田光紀
    • Organizer
      レーザー学会第469回研究会
    • Place of Presentation
      喜多方市
    • Year and Date
      2014-12-05
    • Related Report
      2014 Research-status Report
  • [Presentation] 小型フォトニック結晶波長板による点回折干渉計の高精度化2014

    • Author(s)
      砂山諒, 豊田光紀, 近藤祐治, 山川清志, 柳原美廣
    • Organizer
      第75回応用物理学会秋季学術講演会
    • Place of Presentation
      札幌
    • Year and Date
      2014-09-18
    • Related Report
      2014 Research-status Report
  • [Presentation] Design, fabrication, and test of a novel wide field microscope objective for extreme ultraviolet multiscale imaging.2013

    • Author(s)
      Mitsunori Toyoda
    • Organizer
      The 12th Symposium on X-ray Imaging Optics
    • Place of Presentation
      Osaka, Japan
    • Related Report
      2013 Research-status Report
    • Invited
  • [Presentation] Design, fabrication, and test of an EUV mask imaging microscope for lithography generations with sub-16 nm half pitch2013

    • Author(s)
      M. Toyoda, K. Yamasoe, M. Yanagihara, T. Amano, T. Terasawa, A. Tokimasa, T. Harada, T. Watanabe, H. Kinoshita
    • Organizer
      2013 International Symposium on Extreme Ultraviolet Lithography
    • Place of Presentation
      Toyama, Japan
    • Related Report
      2013 Research-status Report

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Published: 2014-07-25   Modified: 2019-07-29  

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