Low-loss plasmonic metamaterials based on multiple epitaxial layers

• Project/Area Number: 25390100
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Multi-year Fund
• Section: 一般
• Research Field: Optical engineering, Photon science
• Research Institution: Tohoku Institute of Technology
• Principal Investigator: Uchino Takashi 東北工業大学, 工学部, 教授 (40614970)
• Project Period (FY): 2013-04-01 – 2016-03-31
• Project Status: Completed (Fiscal Year 2015)
• Budget Amount: ¥5,200,000 (Direct Cost: ¥4,000,000、Indirect Cost: ¥1,200,000); Fiscal Year 2015: ¥390,000 (Direct Cost: ¥300,000、Indirect Cost: ¥90,000); Fiscal Year 2014: ¥650,000 (Direct Cost: ¥500,000、Indirect Cost: ¥150,000); Fiscal Year 2013: ¥4,160,000 (Direct Cost: ¥3,200,000、Indirect Cost: ¥960,000)
• Keywords: メタマテリアル / プラズモニクス / 光電子デバイス / エピタキシャル成長 / プラズモニック材料 / 多層膜 / プラズモニック結晶 / グラフェン / 多層構造

Outline of Final Research Achievements

Plasmonic metamaterials exploit surface plasmons which exist at metal-dielectric interface. Films of noble metals such as silver and gold are traditionally employed in the plasmonic devices. Metamaterials are a class of artificial materials designed to interact with light in ways no natural materials can. The response of metamaterials is very sensitive to the presence of dissipative losses in the metallic resonators. Therefore employing single crystals of noble metals can make a major contribution to the reduction of plasmonic losses. We present a simple and robust crystal growth technique, which yields large area single-crystal films of silver ideally suited for fabricating high-finesse plasmonic metamaterials. The gold/silver films were epitaxially grown on LiF substrates around 500C by using a sputtering method. We confirmed the high quality of the epitaxial thin films by measuring the surface roughness using scanning probe microscope and the optical constants using ellipsometry.

Research Products

• [Int'l Joint Research] サウサンプトン大学ORC(英国)
• [Journal Article] カーボンナノ材料を用いた太陽電池の高効率化 (2015)
  • Author(s): 内野 俊
  • Journal Title: ケミカルエンジニアリング Volume: 60 Pages: 750-760
• [Journal Article] Electrical transport properties of isolated carbon nanotube/Si heterojunction Schottky diodes (2013)
  • Author(s): T. Uchino, F. Shimpo, T. Kawashima, G. Ayre, D. C. Smith C. H. de Groot, and P. Ashburn
  • Journal Title: Appl. Phys. Lett Volume: 103 Issue: 19 Pages: 193111-193111
  • DOI: 10.1063/1.4829155
  • Peer Reviewed
• [Presentation] エピタキシャルAu/Ag薄膜を用いたメタマテリアルの高性能化 (2016)
  • Author(s): 小岩 匡、V. A. Fedotov、J. Y. Ou、内野 俊
  • Organizer: 第63回応用物理学会春季学術講演会
  • Place of Presentation: 東京工業大学、東京
  • Year and Date: 2016-03-22
• [Presentation] Ultra-smooth epitaxial gold/silver thin films for low-loss plasmonic metamaterials (2015)
  • Author(s): T. Uchino, V. A. Fedotov, J. Y. Ou, and T. Koiwa
  • Organizer: 2015 MRS Fall Meeting
  • Place of Presentation: Boston, USA
  • Year and Date: 2015-12-01
  • Int'l Joint Research
• [Presentation] Single-crystal silver thin films for low-loss plasmonic metamaterials (2015)
  • Author(s): T. Koiwa, V. A. Fedotov, J. Y. Ou, and T. Uchino
  • Organizer: JSAP-OSA Joint Symposia 2015
  • Place of Presentation: Nagoya Congress Center, Nagoya
  • Year and Date: 2015-09-14
  • Int'l Joint Research
• [Presentation] 接触抵抗改善によるグラフェンFETの高性能化 (2015)
  • Author(s): 小岩 匡、 岡 謙吾、末光 哲也、 尾辻 泰一、内野 俊
  • Organizer: 応用物理学会春季学術講演会
  • Place of Presentation: 神奈川県, 東海大学
  • Year and Date: 2015-03-11
• [Presentation] グラフェンFETにおける接触抵抗の影響 (2015)
  • Author(s): 内野 俊、尾辻 泰一
  • Organizer: 東北大学電気通信研究所共同プロジェクト発表会
  • Place of Presentation: 宮城県, 東北大学
  • Year and Date: 2015-02-23
• [Presentation] カーボンナノ材料を用いた光電子デバイスとCMOSの融合化技術の研究
  • Author(s): 内野 俊
  • Organizer: STARCワークショップ2013
  • Place of Presentation: 横浜
• [Presentation] カーボンナノ材料を用いた光電子デバイスの研究
  • Author(s): 内野 俊
  • Organizer: 東北大学電気通信研究所共同プロジェクト発表会
  • Place of Presentation: 仙台