Low-loss plasmonic metamaterials based on multiple epitaxial layers
Project/Area Number |
25390100
|
Research Category |
Grant-in-Aid for Scientific Research (C)
|
Allocation Type | Multi-year Fund |
Section | 一般 |
Research Field |
Optical engineering, Photon science
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Research Institution | Tohoku Institute of Technology |
Principal Investigator |
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Project Period (FY) |
2013-04-01 – 2016-03-31
|
Project Status |
Completed (Fiscal Year 2015)
|
Budget Amount *help |
¥5,200,000 (Direct Cost: ¥4,000,000、Indirect Cost: ¥1,200,000)
Fiscal Year 2015: ¥390,000 (Direct Cost: ¥300,000、Indirect Cost: ¥90,000)
Fiscal Year 2014: ¥650,000 (Direct Cost: ¥500,000、Indirect Cost: ¥150,000)
Fiscal Year 2013: ¥4,160,000 (Direct Cost: ¥3,200,000、Indirect Cost: ¥960,000)
|
Keywords | メタマテリアル / プラズモニクス / 光電子デバイス / エピタキシャル成長 / プラズモニック材料 / 多層膜 / プラズモニック結晶 / グラフェン / 多層構造 |
Outline of Final Research Achievements |
Plasmonic metamaterials exploit surface plasmons which exist at metal-dielectric interface. Films of noble metals such as silver and gold are traditionally employed in the plasmonic devices. Metamaterials are a class of artificial materials designed to interact with light in ways no natural materials can. The response of metamaterials is very sensitive to the presence of dissipative losses in the metallic resonators. Therefore employing single crystals of noble metals can make a major contribution to the reduction of plasmonic losses. We present a simple and robust crystal growth technique, which yields large area single-crystal films of silver ideally suited for fabricating high-finesse plasmonic metamaterials. The gold/silver films were epitaxially grown on LiF substrates around 500C by using a sputtering method. We confirmed the high quality of the epitaxial thin films by measuring the surface roughness using scanning probe microscope and the optical constants using ellipsometry.
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Report
(4 results)
Research Products
(10 results)