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Depth profiling of surface chemical states in nanometer region

Research Project

Project/Area Number 25410160
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeMulti-year Fund
Section一般
Research Field Analytical chemistry
Research InstitutionJapan Atomic Energy Agency

Principal Investigator

ESAKA Fumitaka  国立研究開発法人日本原子力研究開発機構, 安全研究・防災支援部門・安全研究センター, 研究主幹 (40354865)

Co-Investigator(Kenkyū-buntansha) YAMAMOTO Hiroyuki  国立研究開発法人日本原子力研究開発機構, 原子力科学研究部門・量子ビーム応用研究センター, 研究主席 (30354822)
笹瀬 雅人  公益財団法人若狭湾エネルギー研究センター, 研究開発部, 主任研究員 (60359239)
Project Period (FY) 2013-04-01 – 2016-03-31
Project Status Completed (Fiscal Year 2015)
Budget Amount *help
¥5,200,000 (Direct Cost: ¥4,000,000、Indirect Cost: ¥1,200,000)
Fiscal Year 2015: ¥650,000 (Direct Cost: ¥500,000、Indirect Cost: ¥150,000)
Fiscal Year 2014: ¥2,080,000 (Direct Cost: ¥1,600,000、Indirect Cost: ¥480,000)
Fiscal Year 2013: ¥2,470,000 (Direct Cost: ¥1,900,000、Indirect Cost: ¥570,000)
KeywordsX線分析 / 深さ方向分析 / 光電子 / シリサイド / X線光電子分光 / X線吸収分光 / X線吸収分光法 / X線光電子分光法 / 表面 / 光電子分光 / 吸収分光
Outline of Final Research Achievements

X-ray photoelectron spectroscopy (XPS) using energy tunable X-rays and X-ray absorption spectroscopy (XAS) using partial electron yields were utilized for depth profiling of surface chemical states in solid samples. The analytical results of a Si(100) crystal, Au thin films on Si(100) crystals and the surface oxide layers on a magnesium silicide crystal confirmed that the combination of XPS with XAS is a powerful tool to perform non-destructive depth profiling of surface chemical states in solid samples in nanometer region.

Report

(4 results)
  • 2015 Annual Research Report   Final Research Report ( PDF )
  • 2014 Research-status Report
  • 2013 Research-status Report
  • Research Products

    (4 results)

All 2016 2015 2014

All Journal Article (1 results) (of which Peer Reviewed: 1 results,  Acknowledgement Compliant: 1 results) Presentation (3 results) (of which Int'l Joint Research: 2 results)

  • [Journal Article] Non-destructive depth analysis of the surface oxide layer on Mg2Si with XPS and XAS2016

    • Author(s)
      江坂文孝、野島健大、鵜殿治彦、間柄正明、山本博之
    • Journal Title

      Surface and Interface Analysis

      Volume: 印刷中 Issue: 7 Pages: 432-435

    • DOI

      10.1002/sia.5939

    • Related Report
      2015 Annual Research Report
    • Peer Reviewed / Acknowledgement Compliant
  • [Presentation] Non-destructive depth analysis of the surface oxide layer on Mg2Si crystals with XPS and XAS2015

    • Author(s)
      江坂文孝、野島健大、鵜殿治彦、間柄正明、山本博之
    • Organizer
      16th European Conference on Application of Surface and Interface Analysis
    • Place of Presentation
      グラナダ会議展示場(スペイングラナダ)
    • Year and Date
      2015-09-28
    • Related Report
      2015 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Non-destructive chemical depth profiling with X-ray absorption spectroscopy2015

    • Author(s)
      山本博之、野島健大、江坂文孝
    • Organizer
      15th International Congress of Radiation Research
    • Place of Presentation
      京都国際会議場(京都府京都市)
    • Year and Date
      2015-05-25
    • Related Report
      2015 Annual Research Report
    • Int'l Joint Research
  • [Presentation] X線吸収分光法における電子エネルギー選択による固体表面の非破壊深さ方向分析2014

    • Author(s)
      野島健大、江坂文孝、山本博之
    • Organizer
      日本分析化学会第63年会
    • Place of Presentation
      広島大学
    • Year and Date
      2014-09-17 – 2014-09-19
    • Related Report
      2014 Research-status Report

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Published: 2014-07-25   Modified: 2019-07-29  

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