| Budget Amount *help |
¥4,810,000 (Direct Cost: ¥3,700,000、Indirect Cost: ¥1,110,000)
Fiscal Year 2015: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000)
Fiscal Year 2014: ¥1,430,000 (Direct Cost: ¥1,100,000、Indirect Cost: ¥330,000)
Fiscal Year 2013: ¥2,340,000 (Direct Cost: ¥1,800,000、Indirect Cost: ¥540,000)
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| Outline of Final Research Achievements |
This study aims to generate nano or micro-textured surfaces by using epitaxial growth process with low growth rate. Molecular Beam Epitaxy (MBE), one of the highly-developed epitaxial growth methods, was carried out on mono crystal Si substrate with pre-patterns by photolithography and etching under property conditions. The pre-patterns consist of concavo-convex line and space, circle, square and so on with micro or nano meter size. On the flat surface during MBE, some regular micro or nano meter size shapes are generated randomly. On the other hand, the pre-patterns can be controlled the size and position of these shapes on the surface. Therefore, it is possible to generate nano-micro textured surfaces with regular alignment shapes by MBE. It was investigated that how generating patterns can align the position and size by some kinds of pre-patterns.
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