| Budget Amount *help |
¥5,200,000 (Direct Cost: ¥4,000,000、Indirect Cost: ¥1,200,000)
Fiscal Year 2015: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000)
Fiscal Year 2014: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000)
Fiscal Year 2013: ¥3,120,000 (Direct Cost: ¥2,400,000、Indirect Cost: ¥720,000)
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| Outline of Final Research Achievements |
To gain insight into the mechanisms of PVA roller brush cleaning in semiconductor device fabrication, we measure the shear force between PVA brushes and several surfaces. PVA brushes have a sponge-like structure and contain a large amount of water. The contact state between the brush and surface is very complex because of the soft nature of the brush, the asperities on the brush surfaces, and the porous structure of the brush surface. The shear force between the brush and surface is affected by the surface wettability, and the COF is found to decrease and approach 0.5 as the brush rotation speed increases. These results imply that the brush directly makes contact with the surface and that the real contact area of the PVA brush increases with the contact time. Furthermore, we developed a cleaning sample with particles that have optimal adhesive force with the aim of evaluating wet cleaning. Finally, the cleaning performance of PVA brush cleaning was demonstrated.
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