Formation of Non-Destructive Reversible Electric Contact to nm-Thick Films

• Project/Area Number: 25420306
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Multi-year Fund
• Section: 一般
• Research Field: Electronic materials/Electric materials
• Research Institution: National Institute for Materials Science
• Principal Investigator: Yoshitake Michiko 国立研究開発法人物質・材料研究機構, ナノエレクトロニクス材料, MANA研究者 (70343837)
• Project Period (FY): 2013-04-01 – 2016-03-31
• Project Status: Completed (Fiscal Year 2015)
• Budget Amount: ¥5,200,000 (Direct Cost: ¥4,000,000、Indirect Cost: ¥1,200,000); Fiscal Year 2015: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000); Fiscal Year 2014: ¥2,210,000 (Direct Cost: ¥1,700,000、Indirect Cost: ¥510,000); Fiscal Year 2013: ¥1,690,000 (Direct Cost: ¥1,300,000、Indirect Cost: ¥390,000)
• Keywords: 電気特性 / 超薄膜 / 計測技術 / XPS / 電気コンタクト / 非破壊 / 電気測定 / プローブ / 二次元膜 / 可逆 / 極薄膜 / 電気測定プローブ / 可逆接触

Outline of Final Research Achievements

A simple probe that is applicable as an electric contact to nm-thick films and 2D films such as graphene and MoS2 without destroying the specimen has been developed. The concept of the development of the probe is based on the repulsive region used in atomic force microscopy technique but without any precise feedback. The robust electric contact with the probe has been demonstrated by biased XPS measurement of a MOS specimen and by resistivity measurement of a 5-layer graphene film on sapphire. It has also proved that there was no detectable damage or contaminations on the specimens after the measurements.

Research Products

• [Journal Article] Development of a Simple Probe for Non-Destructive Reversible Electric Contact to nm-Thick Films and 2D Films (2015)
  • Author(s): Michiko Yoshitake、Shinjiro Yagyu、Toyohiro Chikyow
  • Journal Title: e-Journal of Surface Science and Nanotechnology Volume: 13 Issue: 0 Pages: 307-311
  • DOI: 10.1380/ejssnt.2015.307
  • NAID: 130005078463
  • ISSN: 1348-0391
  • Peer Reviewed / Open Access / Acknowledgement Compliant
• [Journal Article] Development of a simple probe for non-destructive reversible electric contact to nm-thick films and 2D films (2015)
  • Author(s): Michiko Yoshitake, Shinjiro Yagyu, Toyohiro Chikyow
  • Journal Title: e-JSSNT Volume: -
  • NAID: 130005078463
  • Peer Reviewed / Open Access / Acknowledgement Compliant
• [Presentation] プローバー脱着可能な非破壊電気コンタクトプローブの開発 (2015)
  • Author(s): 吉武道子，柳生進二郎，知京豊裕
  • Organizer: 2015年真空・表面科学合同講演会
  • Place of Presentation: つくば国際会議場
  • Year and Date: 2015-12-01
• [Presentation] 二次元超薄膜への可逆的非破壊電気コンタクト (2015)
  • Author(s): 吉武道子，柳生進二郎，知京豊裕，渡辺英二郎
  • Organizer: 応用物理学会春季大会
  • Place of Presentation: 東海大学湘南キャンパス
  • Year and Date: 2015-03-11 – 2015-03-14
• [Presentation] 二次元超薄膜への可逆的非破壊・接触面積制御電気コンタクト (2014)
  • Author(s): 吉武道子，柳生進二郎，知京豊裕，渡辺英二郎
  • Organizer: 表面科学講演大会
  • Place of Presentation: くにびきメッセ
  • Year and Date: 2014-11-06 – 2014-11-08
• [Presentation] グラフェン膜を含むｎｍ厚電極膜への可逆的非破壊電気コンタクト (2013)
  • Author(s): 吉武道子、柳生進二郎、知京豊裕
  • Organizer: 第74回応用物理学会秋季学術講演会
  • Place of Presentation: 同志社大学京田辺キャンパス
• [Presentation] グラフェン膜を含むｎｍ厚電極膜への可逆的非破壊電気コンタクトの形成法 (2013)
  • Author(s): 吉武道子、柳生進二郎、知京豊裕
  • Organizer: 2013年真空・表面学術合同講演会
  • Place of Presentation: つくば国際会議場
• [Patent(Industrial Property Rights)] コンタクトプローブ及びその製造方法、非破壊的なコンタクト形成方法、多層膜の製造過程における測定方法並びにプローバー (2014)
  • Inventor(s): 吉武道子、柳生進二郎、知京豊裕
  • Industrial Property Rights Holder: 吉武道子、柳生進二郎、知京豊裕
  • Industrial Property Rights Type: 特許
  • Filing Date: 2014-06-05
• [Patent(Industrial Property Rights)] コンタクトプローブ及びその製造方法、非破壊なコンタクト形成方法、多層膜の製造過程における測定方法並びにプローバー (2013)
  • Inventor(s): 吉武道子、柳生進二郎、知京豊裕
  • Industrial Property Rights Holder: 吉武道子、柳生進二郎、知京豊裕
  • Industrial Property Rights Type: 特許
  • Industrial Property Number: 2013-120634
  • Filing Date: 2013-06-06