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Development of the miniaturized hydrocarbon sensor using the nanocarbon multilayers

Research Project

Project/Area Number 25600123
Research Category

Grant-in-Aid for Challenging Exploratory Research

Allocation TypeMulti-year Fund
Research Field Plasma electronics
Research InstitutionNagoya University

Principal Investigator

TAJIMA Satomi  名古屋大学, 工学(系)研究科(研究院), 准教授 (50537941)

Co-Investigator(Renkei-kenkyūsha) 近藤 博基  名古屋大学 (50345930)
Research Collaborator CVELVAR Uros  Jozef Stefan Institute
SLOBODIAN Petr  Tomas Beta University in Zlín
FAVIA Pietro  Università degli Studi di Bari Aldo Moro
GRISTINA Roberto  Institute of Inorganic Methods and Plasmas, Consiglio Nazionale delle Ricerche
Project Period (FY) 2013-04-01 – 2015-03-31
Project Status Completed (Fiscal Year 2014)
Budget Amount *help
¥4,030,000 (Direct Cost: ¥3,100,000、Indirect Cost: ¥930,000)
Fiscal Year 2014: ¥2,470,000 (Direct Cost: ¥1,900,000、Indirect Cost: ¥570,000)
Fiscal Year 2013: ¥1,560,000 (Direct Cost: ¥1,200,000、Indirect Cost: ¥360,000)
Keywords吸着 / カーボン膜 / PECVD / ばらつき制御 / 表面電位 / 炭化水素 / センサー / 国際研究者交流 スロベニア / PECVD / ガスセンサー / 大気圧プラズマ / CVD / 生体模倣材料 / 表面改質 / MEMS
Outline of Final Research Achievements

The purpose of this study is to fabricate the hydrocarbon (HC) gas sensor by biomimetic nanocarbon structures. The cuttlebone is known to control adsorption/desorption by the unique three dimensional (3-D) structure for maintaining the buoyancy. First, we evaluated why the cuttlebone is uniquely form 3-D structures. We modified two different human cells known to grow only two dimension by oxygen atmospheric-pressure plasma. The change in actin filament growth and termination induced by the indirect treatment of oxygen plasma would change the cell growth characteristics from two to three dimensions. Next, we fabricated nanocarbon structures with different grain sizes and spacing to evaluate the sensitivity of HC detection and the molecular weight differentiation. The sensitivity of HC detection was promoted by reducing the nanocarbon structure spacing but the repeatability of the gas sensor requires adequate spacing to promote desorption of the HC.

Report

(3 results)
  • 2014 Annual Research Report   Final Research Report ( PDF )
  • 2013 Research-status Report
  • Research Products

    (24 results)

All 2015 2014 2013 Other

All Journal Article (2 results) (of which Peer Reviewed: 2 results,  Open Access: 1 results,  Acknowledgement Compliant: 1 results) Presentation (19 results) (of which Invited: 8 results) Remarks (2 results) Patent(Industrial Property Rights) (1 results)

  • [Journal Article] Evaluation of the difference in the ratecoefficients of NOx(X = 1 or 2) + F2 -> F + FNOx by thestereochemical arrangement using the density functional theory2015

    • Author(s)
      Satomi Tajima, Toshio Hayashi, and Masaru Hori
    • Journal Title

      J. Phys. Chem. A

      Volume: 119 Issue: 8 Pages: 1381-1387

    • DOI

      10.1021/jp510886b

    • Related Report
      2014 Annual Research Report
    • Peer Reviewed / Open Access / Acknowledgement Compliant
  • [Journal Article] Formation of Nanoporous Features, Flat Surfaces, or Crystallographically Oriented Etched Profiles by the Si Chemical Dry Etching Using the Reaction of F2 + NOー>F + FNO at an Elevated Temperature2013

    • Author(s)
      S. Tajima, T. Hayashi, K. Ishikawa, M. Sekine, and M. Hori
    • Journal Title

      J. Phys. Chem. C

      Volume: 117 Issue: 40 Pages: 20810-20818

    • DOI

      10.1021/jp4084794

    • Related Report
      2013 Research-status Report
    • Peer Reviewed
  • [Presentation] Chemical dry etching of Si using F2 and NO2 gases at elevated temperature2015

    • Author(s)
      S. Tajima, H. Hayashi, K. Ishikawa, M. Sekine, and M. Hori
    • Organizer
      7th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/8th International Conference on Plasma-Nano Technology & Science (ISPlasma2015/IC-PLANTS2015)
    • Place of Presentation
      名古屋大学
    • Year and Date
      2015-03-30
    • Related Report
      2014 Annual Research Report
    • Invited
  • [Presentation] Surface reaction during the slow Si etching using F2 and NO22015

    • Author(s)
      S. Tajima, H. Hayashi, K. Ishikawa, M. Sekine, and M. Hori
    • Organizer
      The 62nd Japan Society of Applied Physics (JSAP) Spring Meeting
    • Place of Presentation
      東海大学
    • Year and Date
      2015-03-12
    • Related Report
      2014 Annual Research Report
  • [Presentation] Development of a atmospheric-pressure plasma chemical vapor deposition system for the reduction of the process variability2015

    • Author(s)
      S. Tajima, K. Yamada, K. Nanki, T. Nakajima, H. Yasuda, H. Kurita, K. Takashima, and A. Mizuno
    • Organizer
      Symposium for the promotion of the female science and engineering researcher
    • Place of Presentation
      豊橋技術科学大学
    • Year and Date
      2015-03-10 – 2015-03-15
    • Related Report
      2014 Annual Research Report
  • [Presentation] Difference in chemical dry etching of Si related materials using NO and NO22015

    • Author(s)
      S. Tajima, H. Hayashi, and M. Hori
    • Organizer
      The 20th Workshop on Advanced Plasma Processes and Diagnostics & The 7th Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials
    • Place of Presentation
      北海道大学
    • Year and Date
      2015-01-27 – 2015-01-28
    • Related Report
      2014 Annual Research Report
    • Invited
  • [Presentation] The challenges and issues of plasma-assisted adhesion improvement2015

    • Author(s)
      S. Tajima
    • Organizer
      68th Advisory Committee on Ultra Precision Workshop
    • Place of Presentation
      メルパルク大阪
    • Year and Date
      2015-01-23
    • Related Report
      2014 Annual Research Report
    • Invited
  • [Presentation] The change in growth, differentiation, and adhesion characteristics of plasma-treated A549 and Saos-2 cells2014

    • Author(s)
      S. Tajima
    • Organizer
      Central Japan Medical and Bio seeds research academia-industry matching workshop
    • Place of Presentation
      ウインク愛知、名古屋市
    • Year and Date
      2014-12-10
    • Related Report
      2014 Annual Research Report
  • [Presentation] Anisotropic chemical dry silicon wafer etching using F2 + NO  F + FNO reaction2014

    • Author(s)
      S. Tajima, T. Hayashi, K. Yamakawa, M. Sasaki, K. Ishikawa, M. Sekine, M. Hori
    • Organizer
      36th International Symposium on Dry Process
    • Place of Presentation
      PACIFICO Convention Plaza、横浜市
    • Year and Date
      2014-11-28
    • Related Report
      2014 Annual Research Report
  • [Presentation] Intoroduction of the plasma material surface treatment2014

    • Author(s)
      S. Tajima
    • Organizer
      Sumitomo Seika Chemicals, Co., Ltd. Beppu Factory Workshop
    • Place of Presentation
      住友精化株式会社 別府工場
    • Year and Date
      2014-11-05
    • Related Report
      2014 Annual Research Report
    • Invited
  • [Presentation] Analysis of F loss during the chemical dry etching of Si using NO and F2 gases (II)2014

    • Author(s)
      S. Tajima, T. Hayashi, K. Ishikawa, M. Sekine, M. Sasaki, K. Yamakawa, and M. Hori
    • Organizer
      The 75th Japan Society of Applied Physics (JSAP) Autumn Meeting
    • Place of Presentation
      北海道大学
    • Year and Date
      2014-09-19
    • Related Report
      2014 Annual Research Report
  • [Presentation] Designing the material process chamber2014

    • Author(s)
      S. Tajima
    • Organizer
      Female junior and high school students science and technology major promotion seminar
    • Place of Presentation
      名古屋大学
    • Year and Date
      2014-08-06
    • Related Report
      2014 Annual Research Report
    • Invited
  • [Presentation] The reaction between the etched product and the Si (100) surface during the chemical dry etching in F2 and NO gases2014

    • Author(s)
      S. Tajima, T. Hayashi, K. Ishikawa, M. Sekine, M. Sasaki, K. Yamakawa, and M. Hori
    • Organizer
      Gorden Research Conference Plasma Processing Science
    • Place of Presentation
      Bryant Univ., Smithfield, RI, USA
    • Year and Date
      2014-07-27 – 2014-07-30
    • Related Report
      2014 Annual Research Report
  • [Presentation] Chemical Dry Etching of the Si Sacrificial Layer in MEMS Devices2014

    • Author(s)
      S. Tajima, T. Hayashi, M. Sasaki
    • Organizer
      International Nanotechnology Exhibition & Conference (nano tech 2014)
    • Place of Presentation
      Tokyo Big Sight, Tokyo, Japan
    • Related Report
      2013 Research-status Report
    • Invited
  • [Presentation] Fabricating the smooth chemically dry etched Si surface for MEMS devices2013

    • Author(s)
      S. Tajima, T. Hayashi, Minoru Sasaki, K. Ishikawa, M. Sekine, and M. Hori
    • Organizer
      The 35th International Symposium on Dry Process (DPS2013)
    • Place of Presentation
      Ramada Plaza Jeju Hotel, Jeju Island, Korea
    • Related Report
      2013 Research-status Report
  • [Presentation] Si chemical dry etching in NOx (x=1 or 2) / F2 gas mixture at an elevated temperature (II)2013

    • Author(s)
      S. Tajima, T. Hayashi, K. Ishikawa, M. Sekine, and M. Hori
    • Organizer
      第74回応用物理学会秋季学術講演会
    • Place of Presentation
      Doshisha University, Kyotanabe Campus, Kyotanabe, Kyoto, Japan
    • Related Report
      2013 Research-status Report
  • [Presentation] Modification of A549 mitochondria activity, cell shape, and cell cytoskeleton by an atomic oxygen radical source2013

    • Author(s)
      Satomi Tajima, Kenji Ishikawa, Keigo Takeda, and Masaru Hori
    • Organizer
      The 2013 JSAP-MRS symposia
    • Place of Presentation
      Doshisha University, Kyotanabe Campus, Kyotanabe, Kyoto, Japan
    • Related Report
      2013 Research-status Report
  • [Presentation] Effect of neutral species generated by the micro hollow-cathode discharge radical source on the modification of A549 cell viability2013

    • Author(s)
      S. Tajima, M. Hori
    • Organizer
      The 9th Asian-European International Conference on Plasma Surface Engineering (AEPSE2013)
    • Place of Presentation
      Ramada Plaza Jeju Hotel, Jeju Island, Korea
    • Related Report
      2013 Research-status Report
  • [Presentation] Indirect plasma treatment of SAOS-2 and NHDF cells by surface dielectric barrier discharge2013

    • Author(s)
      S. Tajima, R. Gristina, P. Ambrico, D. Pignatelli, K. Masur, K.-D. Weltmann, T. von Woedtke, H. Toyoda, M. Hori, P. Favia
    • Organizer
      The 21st International Symposium on Plasma Chemistry
    • Place of Presentation
      Cairns, QLD, Australia
    • Related Report
      2013 Research-status Report
  • [Presentation] 名古屋大学におけるプラズマの研究動向と最新のトピックス2013

    • Author(s)
      S. Tajima
    • Organizer
      平成25年度第1回かがわ健康関連製品開発地域技術討論会
    • Place of Presentation
      香川大学
    • Related Report
      2013 Research-status Report
    • Invited
  • [Presentation] Si chemical dry etching using the reaction of NO and F22013

    • Author(s)
      S. Tajima, T. Hayashi, K. Ishikawa, M. Sekine, and M. Hori
    • Organizer
      17th Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics
    • Place of Presentation
      SKKU, Suon, Korea
    • Related Report
      2013 Research-status Report
    • Invited
  • [Remarks] Research activity

    • URL

      https://researchmap.jp/readread/Research-activities/

    • Related Report
      2014 Annual Research Report
  • [Remarks] http://researchmap.jp/readread

    • Related Report
      2013 Research-status Report
  • [Patent(Industrial Property Rights)] Low-speed etching technique and etching equipment using F2 and NO2 gases2015

    • Inventor(s)
      田嶋聡美、林俊雄、堀勝
    • Industrial Property Rights Holder
      田嶋聡美、林俊雄、堀勝
    • Industrial Property Rights Type
      特許
    • Industrial Property Number
      2015-030105
    • Filing Date
      2015-02-25
    • Related Report
      2014 Annual Research Report

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Published: 2014-07-25   Modified: 2019-07-29  

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