Deposition of Cu nanoparticles produced by plasmas in liquid to fine stracture
Project/Area Number |
25600126
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Research Category |
Grant-in-Aid for Challenging Exploratory Research
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Allocation Type | Multi-year Fund |
Research Field |
Plasma electronics
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Research Institution | Kyushu University |
Principal Investigator |
KOGA Kazunori 九州大学, システム情報科学研究科(研究院, 准教授 (90315127)
|
Project Period (FY) |
2013-04-01 – 2015-03-31
|
Project Status |
Completed (Fiscal Year 2014)
|
Budget Amount *help |
¥4,030,000 (Direct Cost: ¥3,100,000、Indirect Cost: ¥930,000)
Fiscal Year 2014: ¥2,080,000 (Direct Cost: ¥1,600,000、Indirect Cost: ¥480,000)
Fiscal Year 2013: ¥1,950,000 (Direct Cost: ¥1,500,000、Indirect Cost: ¥450,000)
|
Keywords | ナノ粒子 / 異方性製膜 / 液中プラズマ / 微細構造 / 埋め込み |
Outline of Final Research Achievements |
High speed deposition of metal in fine structure is an important issue for Cu interconnects in semiconductor fabrication. In this study we have studied process kinetics of plasma anisotropic CVD, which is a key process to establish Cu deposition in fine structure, and produced metal nanoparticles using plasmas in liquid. For plasma anisotropic CVD, we have found process pressure, distance between a discharge electrode and substrates, and energy of ions impinging to substrates to deposit high density films at high deposition rate. For nanoparticle fabrication using plasmas in liquid, we have succeeded in generating In, Cu, Au, and Pt nanoparticles using 7.6 kHz pulsed discharges of 15.2 kV in discharge voltage. Production yield was quite high of 42 mg/min for In nanoparticles.
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Report
(3 results)
Research Products
(13 results)
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[Presentation] Deposition of carbon films on PMMA using H-assisted plasma CVD
Author(s)
X. Dong, R. Torigoe, K. Koga, G. Uchida, M. Shiratani, Y. Setsuhara, K. Takenaka, M. Sekine, M. Hori
Organizer
The 12th Asia Pacific Physics Conference (APPC12)
Place of Presentation
Makuhari, Chiba, Japan
Related Report
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[Presentation] Pressure dependence of carbon film deposition using H-assisted plasma CVD
Author(s)
X. Dong, K. Koga, D. Yamashita, H. Seo, N. Itagaki, M. Shiratani, K. Takenaka, Y. Setsuhara, M. Sekine, M. Hori
Organizer
8th International Conference on Reactive Plasmas and 31st Symposium on Plasma Processing
Place of Presentation
Fukuoka International Congress Center, Japan
Related Report
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