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Intrinsic-stress-induced elastic instability of microscopic patterned materials and their morphology control

Research Project

Project/Area Number 25630006
Research Category

Grant-in-Aid for Challenging Exploratory Research

Allocation TypeMulti-year Fund
Research Field Materials/Mechanics of materials
Research InstitutionThe University of Tokyo

Principal Investigator

TANAKA Hiro  東京大学, 工学(系)研究科(研究院), 助教 (70550143)

Co-Investigator(Kenkyū-buntansha) IZUMI Satoshi  東京大学, 大学院工学系研究科, 教授 (30322069)
Project Period (FY) 2013-04-01 – 2015-03-31
Project Status Completed (Fiscal Year 2014)
Budget Amount *help
¥3,900,000 (Direct Cost: ¥3,000,000、Indirect Cost: ¥900,000)
Fiscal Year 2014: ¥1,950,000 (Direct Cost: ¥1,500,000、Indirect Cost: ¥450,000)
Fiscal Year 2013: ¥1,950,000 (Direct Cost: ¥1,500,000、Indirect Cost: ¥450,000)
Keywords半導体 / 微細パターン材 / 真性応力 / 板理論 / 座屈 / ドライエッチング / 分子動力学法 / プラズマエッチング
Outline of Final Research Achievements

The intrinsic stress at hetero interface is one of key factors to cause the structural instability of micropatterning in semiconductor devices and, in the field of engineering, it is essential to quantitatively predict the instability attributed to the intrinsic stress from the viewpoints of atomic and continuum scale. In this study, applying the plate theory, we first developed the prediction model for the lateral undulation buckling of micropatterning during dry etching and showed the validity of modeling to compare with the measurement data. Using a molecular dynamics method, we next constructed the atomic model of the dry etching and revealed that the compressive stress inside the oxidized film exceeds 1 GPa by simulating the oxidized film formation. We thus established the procedure of estimating buckling of micropatterning in terms of both the continuum and atomistic models.

Report

(3 results)
  • 2014 Annual Research Report   Final Research Report ( PDF )
  • 2013 Research-status Report
  • Research Products

    (4 results)

All 2015 2014

All Journal Article (1 results) (of which Peer Reviewed: 1 results,  Acknowledgement Compliant: 1 results) Presentation (3 results)

  • [Journal Article] Onset of Wiggling in a Microscopic Patterned Structure Induced by Intrinsic Stress During the Dry Etching Process2014

    • Author(s)
      H. Tanaka, T. Hidaka, S. Izumi, S. Sakai
    • Journal Title

      ASME Journal of Applied Mechanics

      Volume: 81 Issue: 9 Pages: 091009-091009

    • DOI

      10.1115/1.4027914

    • Related Report
      2014 Annual Research Report
    • Peer Reviewed / Acknowledgement Compliant
  • [Presentation] Lateral Buckling of Micropatterned Structures for Semiconductor Devices During Dry Etching2015

    • Author(s)
      H. Tanaka, M. Inoue, S. Izumi, S. Sakai
    • Organizer
      9th European Solid Mechanics Conference (ESMC2015)
    • Place of Presentation
      Madrid, Spain
    • Year and Date
      2015-07-06 – 2015-07-10
    • Related Report
      2014 Annual Research Report
  • [Presentation] 分子動力学法によるアモルファスシリコン酸化膜の真性応力評価2015

    • Author(s)
      井上 優,田中 展,泉 聡志,酒井 信介
    • Organizer
      日本材料学会第20回分子動力学シンポジウム
    • Place of Presentation
      山形大学工学部
    • Year and Date
      2015-05-22
    • Related Report
      2014 Annual Research Report
  • [Presentation] ドライエッチング中における真性応力に起因する微細パターン構造のうねり座屈予測2014

    • Author(s)
      田中 展,日高 貴弘,井 上 優,泉 聡志,酒井 信介
    • Organizer
      日本機械学会第27回計算力学講演会
    • Place of Presentation
      岩手大学工学部
    • Year and Date
      2014-11-22 – 2014-11-24
    • Related Report
      2014 Annual Research Report

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Published: 2014-07-25   Modified: 2019-07-29  

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