Development of conductive scanning probe microscopy system for highly sensitive current-voltage measurement at nanoscale

Research Project

Project/Area Number	25630168
Research Category	Grant-in-Aid for Challenging Exploratory Research
Allocation Type	Multi-year Fund
Research Field	Measurement engineering
Research Institution	University of Tsukuba
Principal Investigator	Murakami Katsuhisa 筑波大学, 数理物質系, 助教 (20403123)
Project Period (FY)	2013-04-01 – 2016-03-31
Project Status	Completed (Fiscal Year 2015)
Budget Amount *help	¥4,030,000 (Direct Cost: ¥3,100,000、Indirect Cost: ¥930,000) Fiscal Year 2015: ¥780,000 (Direct Cost: ¥600,000、Indirect Cost: ¥180,000) Fiscal Year 2014: ¥780,000 (Direct Cost: ¥600,000、Indirect Cost: ¥180,000) Fiscal Year 2013: ¥2,470,000 (Direct Cost: ¥1,900,000、Indirect Cost: ¥570,000)
Keywords	導電性プローブ顕微鏡 / AFM / CAFM
Outline of Final Research Achievements	Fabrication of coaxial conductive probes and suppression of displacement current using electro static shields were investigated for highly sensitive current-voltage measurement at nanoscale using a conductive atomic-force microscopy (CAFM). The coaxial conductive probes with a probe hole of a diameter of around 10 um were successfully fabricated by focused ion beam processes. In addition, the stray capacitance of CAFM were found to be reduced up to 95 % by using the electro static shields. This result indicates that the sensitivity of current-voltage measurement of CAFM can be improved 10 times using the electro static shields.

Report

(4 results)