Development of conductive scanning probe microscopy system for highly sensitive current-voltage measurement at nanoscale
| Project/Area Number |
25630168
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| Research Category |
Grant-in-Aid for Challenging Exploratory Research
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| Allocation Type | Multi-year Fund |
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| Research Field |
Measurement engineering
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| Research Institution | University of Tsukuba |
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Principal Investigator |
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| Project Period (FY) |
2013-04-01 – 2016-03-31
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| Project Status |
Completed (Fiscal Year 2015)
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| Budget Amount *help |
¥4,030,000 (Direct Cost: ¥3,100,000、Indirect Cost: ¥930,000)
Fiscal Year 2015: ¥780,000 (Direct Cost: ¥600,000、Indirect Cost: ¥180,000)
Fiscal Year 2014: ¥780,000 (Direct Cost: ¥600,000、Indirect Cost: ¥180,000)
Fiscal Year 2013: ¥2,470,000 (Direct Cost: ¥1,900,000、Indirect Cost: ¥570,000)
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| Keywords | 導電性プローブ顕微鏡 / AFM / CAFM |
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| Outline of Final Research Achievements |
Fabrication of coaxial conductive probes and suppression of displacement current using electro static shields were investigated for highly sensitive current-voltage measurement at nanoscale using a conductive atomic-force microscopy (CAFM). The coaxial conductive probes with a probe hole of a diameter of around 10 um were successfully fabricated by focused ion beam processes. In addition, the stray capacitance of CAFM were found to be reduced up to 95 % by using the electro static shields. This result indicates that the sensitivity of current-voltage measurement of CAFM can be improved 10 times using the electro static shields.
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Report
(4 results)
Research Products
(1 results)
