| Project/Area Number |
25630331
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| Research Category |
Grant-in-Aid for Challenging Exploratory Research
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| Allocation Type | Multi-year Fund |
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| Research Field |
Material processing/Microstructural control engineering
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| Research Institution | Tokyo Metropolitan University |
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Principal Investigator |
YANG Ming 首都大学東京, システムデザイン研究科, 教授 (90240142)
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| Co-Investigator(Kenkyū-buntansha) |
SHIMIZU Tetsuhide 首都大学東京, システムデザイン研究科, 助教 (70614543)
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| Project Period (FY) |
2013-04-01 – 2015-03-31
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| Project Status |
Completed (Fiscal Year 2014)
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| Budget Amount *help |
¥4,030,000 (Direct Cost: ¥3,100,000、Indirect Cost: ¥930,000)
Fiscal Year 2014: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000)
Fiscal Year 2013: ¥2,730,000 (Direct Cost: ¥2,100,000、Indirect Cost: ¥630,000)
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| Keywords | スケール横断加工 / プレス成形 / 転写プリンティング / 選択的CVD / 真空プレス装置 / ナノ触媒 / 高真空プレス装置 / 金属箔材 / 表面転写 |
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| Outline of Final Research Achievements |
An atmosphere controlled precise press-forming equipment which installed a small vacuum chamber in the desktop type servo press has been developed. It is possible to perform a heat assisted press-forming of metallic material and form a function film on the structure surface by transfer printing or CVD processes simultaneously with reducing oxidation during the processes.
As multi-scale compound forming processes, a transfer printing by using pressure during the press-forming and a selective CVD of functional film to cracks of oxide film on the thin Ti material surface generated due to its plastic deformation during the precise press-forming were developed. In particular, selective CVD to the cracks of an oxidation film can generate the function film with certain patterns, and could be applied to the patterned functional surface generation in the micro devices.
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