Development of production process of high gas barrier films by plasma chemical vapor deposition

• Project/Area Number: 25630357
• Research Category: Grant-in-Aid for Challenging Exploratory Research
• Allocation Type: Multi-year Fund
• Research Field: Reaction engineering/Process system
• Research Institution: Kyoto University
• Principal Investigator: KAWASE MOTOAKI 京都大学, 工学(系)研究科(研究院), 教授 (60231271)
• Co-Investigator(Kenkyū-buntansha): INOUE GEN 京都大学, 大学院工学研究科, 助教 (40336003)
• Project Period (FY): 2013-04-01 – 2016-03-31
• Project Status: Completed (Fiscal Year 2015)
• Budget Amount: ¥4,160,000 (Direct Cost: ¥3,200,000、Indirect Cost: ¥960,000); Fiscal Year 2015: ¥1,430,000 (Direct Cost: ¥1,100,000、Indirect Cost: ¥330,000); Fiscal Year 2014: ¥1,430,000 (Direct Cost: ¥1,100,000、Indirect Cost: ¥330,000); Fiscal Year 2013: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000)
• Keywords: プラズマCVD / シリカ膜 / ヘキサメチルジシロキサン / キャリアガス / 膜組成 / 膜特性 / ガスバリア / 積層膜 / PENフィルム / ガス透過セル / 成膜前駆体 / 膜密度 / 成膜速度 / 原料組成比 / 雰囲気ガス / 膜構造

Outline of Final Research Achievements

Silica films were produced by plasma chemical vapor deposition (PCVD) which posesses advantages of low deposition temperature, high gas barrier property and good adhesion. The Silica films were produced on PEN film from hexamethyldisiloxane (HMDSO). O2 and H2 were chosen as additive gas, and the effects of additive gas and depositing condition on the properties of the films were investigated.
The permeation cell with eliminating air leakage was designed, and a method for measuring gas permeability through the high gas barrier film was developed.
O2 permeability through polyethylene naphthalate (PEN) film and silica-based thin films was measured successfully.

Research Products

• [Presentation] プラズマCVD 法で製膜したシリカ膜の膜応力 (2016)
  • Author(s): 脇坂知樹･竹田依加･河瀬元明
  • Organizer: 第18回化学工学会学生発表会(福岡大会)
  • Place of Presentation: 福岡大学 七隈キャンパス
  • Year and Date: 2016-03-05
• [Presentation] Measurement of gas permeability of silica-based gas barrier thin films prepared by plasma chemical vapor deposition (2015)
  • Author(s): Hiroyuki Ohtsu, Erika Takeda, Motoaki Kawase
  • Organizer: The 28th International Symposium on Chemical Engineering (ISChE 2015)
  • Place of Presentation: Ramada Plaza Jeju, Korea
  • Year and Date: 2015-12-04
  • Int'l Joint Research
• [Presentation] Effects of hydrogen addition on the chemical structure of silica film prepared by plasma CVD (2015)
  • Author(s): Erika Takeda, Toshiki Deguchi, Hiroyuki Otsu and Motoaki Kawase
  • Organizer: Asian Pacific Confederation of Chemical Engineering 2015
  • Place of Presentation: The Melbourne Convention and Exhibition Centre (MCEC), Melbourne, Australia
  • Year and Date: 2015-09-27
  • Int'l Joint Research
• [Presentation] プラズマCVD法で作製したシリカ膜の化学構造と膜特性 (2015)
  • Author(s): 竹田依加 ・出口利樹 ・大津啓幸 ・河瀬元明
  • Organizer: 化学工学会 第47回秋季大会
  • Place of Presentation: 北海道大学 札幌キャンパス
  • Year and Date: 2015-09-09
• [Presentation] プラズマＣＶＤ法を用いたシリカ系ガスバリア膜の作製とガス透過速度の測定 (2015)
  • Author(s): 大津啓幸・竹田依加・河瀬元明
  • Organizer: 化学工学会 第47回秋季大会
  • Place of Presentation: 北海道大学 札幌キャンパス
  • Year and Date: 2015-09-09
• [Presentation] プラズマCVD法によるシリカ成膜へのH2添加の影響 (2015)
  • Author(s): 竹田依加・出口利樹・河瀬元明
  • Organizer: 化学工学会 第80年会
  • Place of Presentation: 芝浦工業大学 豊洲キャンパス
  • Year and Date: 2015-03-19 – 2015-03-21
• [Presentation] Effects of feed gas composition on the properties of silica film prepared by plasma CVD (2014)
  • Author(s): Erika Takeda, Toshiki Deguchi, Motoaki Kawase
  • Organizer: The 27th International Symposium on Chemical Engineering (ISChE 2014)
  • Place of Presentation: PWTC, Kuala Lumpur, Malaysia
  • Year and Date: 2014-12-05 – 2014-12-07
• [Presentation] プラズマCVD法で作製したシリカ膜構造へのキャリアガスの影響 (2014)
  • Author(s): 竹田依加・出口利樹・河瀬元明
  • Organizer: 化学工学会 第46回秋季大会
  • Place of Presentation: 九州大学 伊都キャンパス
  • Year and Date: 2014-09-17 – 2014-09-19
• [Presentation] プラズマCVD法を用いたシリカ成膜反応における雰囲気ガスの影響 (2014)
  • Author(s): 出口 利樹・ 竹田 依加・ 河瀬 元明
  • Organizer: 第16回化学工学会学生発表会（堺大会）
  • Place of Presentation: 大阪府立大学 中百舌鳥キャンパス
• [Presentation] CVD OF SILICA FILM FROM HEXAMETHYLDISILOXANE AND OXYGEN (2013)
  • Author(s): Erika Takeda, Ryo Takahashi, Sho Nagaya, Motoaki Kawase
  • Organizer: the 9th World Congress of Chemical Engineering (WCCE9) , the 15th Asian Pacific Confederation of Chemical Engineering Congress (APCChE2013)
  • Place of Presentation: Seoul, Korea
• [Presentation] プラズマCVD法によるヘキサメチルジシロキサンと酸素からのシリカ成膜 (2013)
  • Author(s): 竹田 依加・ 永冶 渉・ 高橋 諒・ 河瀬 元明
  • Organizer: 化学工学会第45回秋季大会
  • Place of Presentation: 岡山大学 津島東キャンパス