Development of innovative application of graphene nanoribbon with advanced plasma processing
| Project/Area Number |
25706028
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| Research Category |
Grant-in-Aid for Young Scientists (A)
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| Allocation Type | Partial Multi-year Fund |
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| Research Field |
Plasma electronics
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| Research Institution | Tohoku University |
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Principal Investigator |
Kato Toshiaki 東北大学, 工学(系)研究科(研究院), 講師 (20502082)
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| Project Period (FY) |
2013-04-01 – 2016-03-31
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| Project Status |
Completed (Fiscal Year 2015)
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| Budget Amount *help |
¥24,960,000 (Direct Cost: ¥19,200,000、Indirect Cost: ¥5,760,000)
Fiscal Year 2015: ¥3,900,000 (Direct Cost: ¥3,000,000、Indirect Cost: ¥900,000)
Fiscal Year 2014: ¥5,590,000 (Direct Cost: ¥4,300,000、Indirect Cost: ¥1,290,000)
Fiscal Year 2013: ¥15,470,000 (Direct Cost: ¥11,900,000、Indirect Cost: ¥3,570,000)
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| Keywords | グラフェンナノリボン / プラズマCVD / 大面積合成 / 合成機構 / トランジスタ / 集積化 |
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| Outline of Final Research Achievements |
Wafer-scale, high-yield synthesis of suspended graphene nanoribbon arrays using a bottom-up approach is demonstrated and a promising growth model of suspended graphene nanoribbons is also established through a comprehensive study that combined experiments, molecular dynamics simulations and theoretical calculations with a phase-diagram analysis. Since the suspended graphene nanoribbon includes unique electrical and mechanical structures, our results can contribute to developing a novel application of graphene nanoribbon.
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Report
(4 results)
Research Products
(116 results)
