| Budget Amount *help |
¥4,420,000 (Direct Cost: ¥3,400,000、Indirect Cost: ¥1,020,000)
Fiscal Year 2015: ¥650,000 (Direct Cost: ¥500,000、Indirect Cost: ¥150,000)
Fiscal Year 2014: ¥1,170,000 (Direct Cost: ¥900,000、Indirect Cost: ¥270,000)
Fiscal Year 2013: ¥2,600,000 (Direct Cost: ¥2,000,000、Indirect Cost: ¥600,000)
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| Outline of Final Research Achievements |
An approach of natural polysaccharide to green resist polymers in extreme-ultraviolet (EUV) and electron beam (EB) lithography has successfully achieved for the use of pure water in the developable process, instead of conventionally used tetramethylammonium hydroxide and organic solvents. The green resist material with adjusted weight-average molecular weight and hydroxyl groups as a water-developable property was found to have the acceptable properties such as spin-coating properties on 200 mm wafer, prediction sensitivities of EUV at the wavelength of 6.7 and 13.5 nm, a high contrast of water dissolution rate before and after EB irradiation, and pillar patterns with 100-400 nm in high EB sensitivity of 7 µC/cm2.
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