Development of an innovative atmospheric-pressure CVD method for the synthesis of graphene films
Project/Area Number |
25800309
|
Research Category |
Grant-in-Aid for Young Scientists (B)
|
Allocation Type | Multi-year Fund |
Research Field |
Plasma science
|
Research Institution | National Institute of Advanced Industrial Science and Technology |
Principal Investigator |
KIM JAEHO 独立行政法人産業技術総合研究所, 電子光技術研究部門, 主任研究員 (30376595)
|
Project Period (FY) |
2013-04-01 – 2015-03-31
|
Project Status |
Completed (Fiscal Year 2014)
|
Budget Amount *help |
¥4,160,000 (Direct Cost: ¥3,200,000、Indirect Cost: ¥960,000)
Fiscal Year 2014: ¥1,430,000 (Direct Cost: ¥1,100,000、Indirect Cost: ¥330,000)
Fiscal Year 2013: ¥2,730,000 (Direct Cost: ¥2,100,000、Indirect Cost: ¥630,000)
|
Keywords | グラフェン / ナノカーボン材料 / 大気圧プラズマ / プラズマCVD / マイクロ波プラズマ / カーボンナノ材料 / 透明導電膜 |
Outline of Final Research Achievements |
The technology for the production of a large-scale atmospheric pressure plasma jet is realized using microstrip line and an array configuration. The developed plasma jet provides a low-temperature plasma with high uniformity even at atmospheric pressure and has advanced discharge characteristics as a plasma source for CVD applications. Also, the high-pressure CVD system for the synthesis of graphene films was developed using the plasma jet.
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Report
(3 results)
Research Products
(20 results)