Research Project
Grant-in-Aid for Young Scientists (B)
The technology for the production of a large-scale atmospheric pressure plasma jet is realized using microstrip line and an array configuration. The developed plasma jet provides a low-temperature plasma with high uniformity even at atmospheric pressure and has advanced discharge characteristics as a plasma source for CVD applications. Also, the high-pressure CVD system for the synthesis of graphene films was developed using the plasma jet.
All 2015 2014 2013
All Journal Article (2 results) (of which Peer Reviewed: 2 results, Open Access: 1 results) Presentation (16 results) (of which Invited: 5 results) Patent(Industrial Property Rights) (2 results) (of which Overseas: 1 results)
JAPANESE JOURNAL OF APPLIED PHYSICS 54
Volume: - Issue: 1S Pages: 1-4
10.7567/jjap.54.01aa02
210000144719
Japanese of Journal Applied Physics
Volume: 印刷中