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Understand the mechanism and development of metal composite DLC films for high heat resistance utilizing dual-plasma

Research Project

Project/Area Number 25820014
Research Category

Grant-in-Aid for Young Scientists (B)

Allocation TypeMulti-year Fund
Research Field Materials/Mechanics of materials
Research InstitutionKanazawa Institute of Technology

Principal Investigator

IKENAGA NORIAKI  金沢工業大学, 工学部, 講師 (30512371)

Project Period (FY) 2013-04-01 – 2015-03-31
Project Status Completed (Fiscal Year 2014)
Budget Amount *help
¥4,290,000 (Direct Cost: ¥3,300,000、Indirect Cost: ¥990,000)
Fiscal Year 2014: ¥2,470,000 (Direct Cost: ¥1,900,000、Indirect Cost: ¥570,000)
Fiscal Year 2013: ¥1,820,000 (Direct Cost: ¥1,400,000、Indirect Cost: ¥420,000)
Keywords高耐熱性 / DLC膜 / 摩擦係数 / 膜硬度 / Si添加率 / 高耐熱薄膜 / 耐熱性DLC薄膜 / 金属添加DLC薄膜 / 微細構造
Outline of Final Research Achievements

The heat-resistance of a DLC film was about 400 oC, and it was been pointing out lower than the temperature of the other hard coating films. Therefore the application field was restricted by the temperature even though a DLC films has excellent mechanical properties. On the other hand, an author has found that a heat-resistance can be improved by adding Si to a DLC film. In this study, the Si added DLC films which can maintain at conventional mechanical properties of DLC film under condition of temperature at 650 oC or above is developed. As a results, an author clarified that the Si addition DLC films can be realized of high heat-resistance of 600 oC by addition of a small amount of Si, and that the heat-resistance can be shown only at a range of 10-12.5 at.% of Si dopant ratio.

Report

(3 results)
  • 2014 Annual Research Report   Final Research Report ( PDF )
  • 2013 Research-status Report
  • Research Products

    (8 results)

All 2014 2013

All Journal Article (3 results) (of which Peer Reviewed: 3 results) Presentation (5 results)

  • [Journal Article] Improvement of chip evacuation in drilling of lead-free brass using micro drill2014

    • Author(s)
      H.Kato, S.Nakata, N.Ikenaga, H.Hiroaki
    • Journal Title

      International Journal of Automation Technology

      Volume: 8 Pages: 874-879

    • NAID

      130007673888

    • Related Report
      2014 Annual Research Report
    • Peer Reviewed
  • [Journal Article] イオン照射とスパッタリングの同時プロセスを利用したTiNi合金薄膜の低温合成技術の開発2013

    • Author(s)
      池永訓昭,作道訓之
    • Journal Title

      電気学会論文誌E(センサ・マイクロマシン部門誌)

      Volume: 133

    • Related Report
      2013 Research-status Report
    • Peer Reviewed
  • [Journal Article] In situ crystallization of sputter-deposited TiNi by ion irradiation2013

    • Author(s)
      N. Ikenaga, Y. Kishi, Z. Yajima and N. Sakudo
    • Journal Title

      Journal of Alloys and Compounds

      Volume: 5775

    • Related Report
      2013 Research-status Report
    • Peer Reviewed
  • [Presentation] 赤外センサ用光学材料の耐雨滴性能向上を目的としたカーボン系保護膜の開発2014

    • Author(s)
      池永訓昭,松井康浩,斉藤博嗣,杉本康弘,佐野雅彦
    • Organizer
      電気学会フィジカルセンサ研究会
    • Place of Presentation
      金沢工業大学,石川県
    • Year and Date
      2014-12-19
    • Related Report
      2014 Annual Research Report
  • [Presentation] Friction characteristics of a-C:H films deposited by plasma immersion ion implantation using pulsed-DC plasma2014

    • Author(s)
      N. Ikenaga, N. Sakudo
    • Organizer
      19th International Conference on Ion Beam Modification of Materials (IBMM2014)
    • Place of Presentation
      Leuven, Belgium
    • Year and Date
      2014-09-16 – 2014-09-17
    • Related Report
      2014 Annual Research Report
  • [Presentation] パルスバイアスプラズマによるDLC-Si膜の作製2013

    • Author(s)
      立花裕也,池永訓昭,花岡良一,作道訓之
    • Organizer
      第74回応用物理学会学術講演会
    • Place of Presentation
      同志社大学 京都
    • Related Report
      2013 Research-status Report
  • [Presentation] パルスバイアスプラズマで作製したDLC-Si膜の摩擦特性2013

    • Author(s)
      立花裕也,池永訓昭,花岡良一,作道訓之
    • Organizer
      2013年電気化学会北陸支部秋季大会 表面技術協会中部支部講演会 合同大会
    • Place of Presentation
      金沢工業大学 石川
    • Related Report
      2013 Research-status Report
  • [Presentation] Crystallization of sputter-deposited film by plasma-based ion implantation2013

    • Author(s)
      N. Sakudo, N. Ikenaga, N. Sakumoto, Y. Kishi, and Z. Yajima
    • Organizer
      18th International Conference on Surface Modification of Materials by Ion Beams (SMMIB2013)
    • Place of Presentation
      Turkey Kusadasi
    • Related Report
      2013 Research-status Report

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Published: 2014-07-25   Modified: 2019-07-29  

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