Measurements of mechanical properties of group III-nitride films by in situ transmission electron microscope nanoindentation
Project/Area Number |
25820320
|
Research Category |
Grant-in-Aid for Young Scientists (B)
|
Allocation Type | Multi-year Fund |
Research Field |
Physical properties of metals/Metal-base materials
|
Research Institution | The University of Tokyo |
Principal Investigator |
Tokumoto Yuki 東京大学, 生産技術研究所, 講師 (20546866)
|
Project Period (FY) |
2013-04-01 – 2016-03-31
|
Project Status |
Completed (Fiscal Year 2015)
|
Budget Amount *help |
¥4,290,000 (Direct Cost: ¥3,300,000、Indirect Cost: ¥990,000)
Fiscal Year 2014: ¥1,690,000 (Direct Cost: ¥1,300,000、Indirect Cost: ¥390,000)
Fiscal Year 2013: ¥2,600,000 (Direct Cost: ¥2,000,000、Indirect Cost: ¥600,000)
|
Keywords | 転位 / 窒化物半導体薄膜 / 超微小硬さ試験 / ひずみ |
Outline of Final Research Achievements |
In order to accurately evaluate mechanical properties of group III-nitride thin films, nanoindentaion was performed. Then, in situ transmission electron microscope nanoindentation was performed to elucidate dislocation generation and propagation processes in group III-nitride thin films. By combining ex situ and in situ nanoindentation, the relationship between macroscopic mechanical properties and nanoscopic dislocation dynamics was revealed.
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Report
(4 results)
Research Products
(11 results)