Emergence of giant piezoelectric properties in non-perovskite zirconia-based ferroelectrics

• Project/Area Number: 25889024
• Research Category: Grant-in-Aid for Research Activity Start-up
• Allocation Type: Single-year Grants
• Research Field: Inorganic materials/Physical properties
• Research Institution: Tokyo Institute of Technology
• Principal Investigator: SHIMIZU Takao 東京工業大学, 元素戦略研究センター, 特任助教 (60707587)
• Project Period (FY): 2013-08-30 – 2015-03-31
• Project Status: Completed (Fiscal Year 2014)
• Budget Amount: ¥2,730,000 (Direct Cost: ¥2,100,000、Indirect Cost: ¥630,000); Fiscal Year 2014: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000); Fiscal Year 2013: ¥1,430,000 (Direct Cost: ¥1,100,000、Indirect Cost: ¥330,000)
• Keywords: 圧電 / 蛍石型酸化物 / 強弾性 / 強誘電性 / 強誘電体 / 蛍石型構造 / エピタキシャル薄膜 / 強弾性体 / 薄膜 / エピタキシャル成長

Outline of Final Research Achievements

The discovery of ferroelectricity in fluorite oxides materials indicates possibility to realize the giant electro-mechanism in the non-perovskite ferroelectric materials with high CMOS compatibility. As a results, it is found that generated phases can be changed by changing the crystallization condition. This means that the formation energy of the orthorhombic phase, which is considered to exhibit ferroelectricity, has similar value to that of the monoclinic and tetragonal phases. In addition, the comparison of the film crystalized under various atmosphere and measurement at low temperature were carried. The results imply that the ferroelectricity is not mediated by the mobile defect, such as oxygen vacancy. This means that the piezoelectricity can be expected because the ferroelectricity has structural origin.

Research Products

• [Journal Article] Contribution of oxygen vacancies to the ferroelectric behavior of Hf0.5Zr0.5O2 thin films (2015)
  • Author(s): Takao Shimizu, Tatsuhiko Yokouchi, Takahiro Oikawa, Takahisa Shiraishi, Takanori Kiguchi, Akihiro Akama, Toyohiko J. Konno, Alexei Gruverman, and Hiroshi Funakubo
  • Journal Title: Applied Physics Letters Volume: 106 Issue: 11
  • DOI: 10.1063/1.4915336
  • Peer Reviewed / Acknowledgement Compliant
• [Journal Article] Study on the effect of heat treatment conditions on metalorganic-chemical-vapor-deposited ferroelectric Hf0.5Zr0.5O2 thin film on Ir electrode (2014)
  • Author(s): Takao Shimizu, Tatsuhiko Yokouchi, Takahisa Shiraish, Takahiro Oikawa, P. S. Sankara Rama Krishnan, and Hiroshi Funakubo
  • Journal Title: Jpn. J. Appl. Phys Volume: 53 Issue: 9S Pages: 09PA04-09PA04
  • DOI: 10.7567/jjap.53.09pa04
  • NAID: 210000144473
  • Peer Reviewed / Acknowledgement Compliant
• [Presentation] HfO2基エピタキシャル薄膜の強誘電性 (2015)
  • Author(s): 清水荘雄、 片山きりは、舟窪浩
  • Organizer: 第62回応用物理学会春季学術講演会
  • Place of Presentation: 東海大学湘南キャンパス、平塚市
  • Year and Date: 2015-03-11 – 2015-03-14
• [Presentation] 斜方晶相を含むエピタキシャルHfO2基薄膜の結晶構造解析 (2015)
  • Author(s): 1154)片山きりは、清水荘雄、横内達彦、白石貴久、及川貴弘、木口賢紀、赤間章裕、今野豊彦、内田寛、舟窪浩
  • Organizer: 第62回応用物理学会春季学術講演会
  • Place of Presentation: 東海大学湘南キャンパス、平塚市
  • Year and Date: 2015-03-11 – 2015-03-14
• [Presentation] 斜方晶HfO2のエピタキシャル薄膜作製とその評価 (2015)
  • Author(s): 片山きりは、清水荘雄、横内達彦、白石貴久、及川貴弘、木口賢紀、赤間章裕、今野豊彦、内田寛、舟窪浩
  • Organizer: 第53回セラミックス基礎科学討論会
  • Place of Presentation: 京都テルサ、京都市
  • Year and Date: 2015-01-08 – 2015-01-09
• [Presentation] 斜方晶構造を持つエピタキシャルHfO2系薄膜の作製と評価 (2014)
  • Author(s): 清水荘雄、舟窪浩
  • Organizer: 第75回応用物理学会秋季学術講演会
  • Place of Presentation: 北海道大学札幌キャンパス、札幌市
  • Year and Date: 2014-09-17 – 2014-09-20
• [Presentation] HfO2系材料における強誘電体 (2014)
  • Author(s): 清水荘雄、横内達彦、白石貴久、及川貴弘、木口賢紀、今野豊彦、舟窪浩
  • Organizer: 日本セラミックス協会第27回秋季シンポジウム
  • Place of Presentation: 鹿児島大学郡元キャンパス、鹿児島市
  • Year and Date: 2014-09-09 – 2014-09-11
• [Presentation] Pt 電極上に堆積した(Hf,Zr)O2 薄膜の強誘電特性 (2014)
  • Author(s): 清水荘雄, 横内達彦, 白石貴久, 及川貴弘, 舟窪 浩
  • Organizer: 第31回強誘電体応用会議
  • Place of Presentation: コープイン京都、京都市
  • Year and Date: 2014-05-28 – 2014-05-31
• [Presentation] Ferroelectric Property in HfO2-ZrO2 Film with Various Metal Electrodes (2014)
  • Author(s): T. Shimizu, T. Yokouchi, T. Oikawa, T. Shiraishi, T. Kiguchi, A. Akama, T.J. Konno, D.J. Kim, A. Gruverman, and H. Funakubo
  • Organizer: 2014 Joint IEEE International Symposium on the Applications of Ferroelectrics, International Workshop on Acoustic Transduction Materials and Devices, Workshop on Piezoresponse Force Microscopy
  • Place of Presentation: Penn State University in State College, PA, USA
  • Year and Date: 2014-05-12 – 2014-05-16
• [Presentation] HfO2 ベース新規誘電体薄膜の特性の評価 (2014)
  • Author(s): 横内達彦、清水荘雄、及川貴弘、白石貴 久、舟窪浩
  • Organizer: 第52回セラミックス基礎科学討論会
  • Place of Presentation: ウインクあいち
• [Presentation] (Hf0.5Zr0.5)O2 薄膜の強誘電性評価 (2014)
  • Author(s): 横内 達彦、清水 荘雄、及川 貴弘、白石 貴久、木口賢紀 、赤間章裕、今野豊彦、Dong Jik Kim、Alexei Gruverman、舟窪 浩
  • Organizer: 第 61 回応用物理学会春季学術講演会
  • Place of Presentation: 青山学院大学相模原キャンパス
• [Presentation] Ferroelectric property in HfO2-ZrO2 film with various metal electordes (2014)
  • Author(s): Takao Shimizu, Tatsuhiko Yokouchi, Takahiro Oikawa, Takahisa Shiraishi, Takanori Kiguchi, Akihiro Akama, Toyohiko J. Konno, Dong Jik Kim, Alexei Gruverman and Hiroshi Funakubo
  • Organizer: 2014 Joint IEEE International Symposium on the Applications of Ferroelectric, International Workshop on Acoustic Transduction Materials and Devices & Workshop on Piezoresponse Force Microscopy
  • Place of Presentation: The Pennsylvania State University